3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation (Adv. Mater. Interfaces 10/2022) Article Swipe

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YOU? · · 2022 · Open Access · · DOI: https://doi.org/10.1002/admi.202270052

Fine-Tuning of Nanostructures via Helium Ion Implantation In article number 2101643, Xiaolei Wen, Renwei Mao, and Huan Hu invent an approach for producing 3D silicon nanostructures with super small roughness based on substrate swelling caused by implantation of focused helium ion beams. Furthermore, mimicking the leaning tower of Pisa, they implant on the bottom of the readily made nanostructures to fine-tune the distance into sub 5-nm as well as the tilting angles.

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Semiconductor Device Fabrication

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Materials science Nanolithography Nanostructure Silicon Helium Substrate (aquarium) Ion implantation Nanotechnology Ion Optoelectronics Atomic physics Fabrication Chemistry Geology Pathology Oceanography Medicine Alternative medicine Physics Organic chemistry

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Type: article
Language: en
Landing Page: https://doi.org/10.1002/admi.202270052
PDF: https://onlinelibrary.wiley.com/doi/pdfdirect/10.1002/admi.202270052
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DOI: https://doi.org/10.1002/admi.202270052

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Title: 3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation (Adv. Mater. Interfaces 10/2022)

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Type: article

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Language: en

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Publication year: 2022

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Publication date: 2022-04-01

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Authors: Xiaolei Wen, Renwei Mao, Huan Hu

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Landing page: https://doi.org/10.1002/admi.202270052

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Concepts: Materials science, Nanolithography, Nanostructure, Silicon, Helium, Substrate (aquarium), Ion implantation, Nanotechnology, Ion, Optoelectronics, Atomic physics, Fabrication, Chemistry, Geology, Pathology, Oceanography, Medicine, Alternative medicine, Physics, Organic chemistry

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