A novel paradigm for the fabrication of highly uniform nanowire arrays using residual stress-induced patterning Article Swipe

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Zhi Zhao , Nan Wang , Hanqing Nan , Li Shen , Colm Durkan , Ximin He ·

YOU? · · 2016 · Open Access · · DOI: https://doi.org/10.1039/c6tc01653g

A residue-free, one-step method for the fabrication of 1-D materials with highly tunable geometric parameters.

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Semiconductor Device Fabrication

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Fabrication Materials science Residual stress Nanowire Nanotechnology Optoelectronics Composite material Medicine Pathology Alternative medicine

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Type: article
Language: en
Landing Page: https://doi.org/10.1039/c6tc01653g
OA Status: green
Cited By: 2
References: 50
Related Works: 10
OpenAlex ID: https://openalex.org/W2408415035

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DOI: https://doi.org/10.1039/c6tc01653g

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Title: A novel paradigm for the fabrication of highly uniform nanowire arrays using residual stress-induced patterning

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Type: article

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Language: en

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Publication year: 2016

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Publication date: 2016-01-01

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Authors: Zhi Zhao, Nan Wang, Hanqing Nan, Li Shen, Colm Durkan, Ximin He

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Landing page: https://doi.org/10.1039/c6tc01653g

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Open access: Yes

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OA status: green

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OA URL: https://www.repository.cam.ac.uk/handle/1810/256419

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Concepts: Fabrication, Materials science, Residual stress, Nanowire, Nanotechnology, Optoelectronics, Composite material, Medicine, Pathology, Alternative medicine

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Cited by: 2

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