Application of Focused Helium Ion Beams for Direct-write Lithography of Superconducting Electronics Article Swipe
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· 2015
· Open Access
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· DOI: https://doi.org/10.1017/s1431927615012386
· OA: W2560697716
Journal Article Application of Focused Helium Ion Beams for Direct-write Lithography of Superconducting Electronics Get access Shane Cybart, Shane Cybart Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA Search for other works by this author on: Oxford Academic Google Scholar E Y Cho, E Y Cho Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA Search for other works by this author on: Oxford Academic Google Scholar B H Wehlin, B H Wehlin Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA Search for other works by this author on: Oxford Academic Google Scholar Meng Ma, Meng Ma Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA Search for other works by this author on: Oxford Academic Google Scholar T J Wong, T J Wong Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA Search for other works by this author on: Oxford Academic Google Scholar R C Dynes, R C Dynes Oxide Nano Electronics Laboratory, Department of Physics, University of California San Diego, USA Search for other works by this author on: Oxford Academic Google Scholar Chuong Huynh Chuong Huynh Carl Zeiss Microscopy, LLC., One Corporation Way, Peabody, MA, USA Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 21, Issue S3, 1 August 2015, Pages 2321–2322, https://doi.org/10.1017/S1431927615012386 Published: 23 September 2015
