Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precision Article Swipe
Thanh-Hung Dinh
,
Nikita Medvedev
,
Masahiko Ishino
,
Toshiyuki Kitamura
,
Noboru Hasegawa
,
Tomohito Otobe
,
Takeshi Higashiguchi
,
Kazuyuki Sakaue
,
Masakazu Washio
,
Tadashi Hatano
,
Akira Kon
,
Yuya Kubota
,
Yuichi Inubushi
,
Shigeki Owada
,
Tatsunori Shibuya
,
Beata Ziaja
,
Masaharu Nishikino
·
YOU?
·
· 2019
· Open Access
·
· DOI: https://doi.org/10.1038/s42005-019-0253-2
YOU?
·
· 2019
· Open Access
·
· DOI: https://doi.org/10.1038/s42005-019-0253-2
Interaction of a solid material with focused, intense pulses of high-energy photons or other particles (such as electrons and ions) creates a strong electronic excitation state within an ultra-short time and on ultra-small spatial scales. This offers the possibility to control the response of a material on a spatial scale less than a nanometer—crucial for the next generation of nano-devices. Here we create craters on the surface of a silicon substrate by focusing single femtosecond extreme ultraviolet pulse from the SACLA free-electron laser. We investigate the resulting surface modification in the vicinity of damage thresholds, establishing a connection to microscopic theoretical approaches, and, with their help, illustrating physical mechanisms for damage creation. The cooling during ablation by means of rapid electron and energy transport can suppress undesired hydrodynamical motions, allowing the silicon material to be directly processed with a precision reaching the observable limitation of an atomic force microscope.
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- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.1038/s42005-019-0253-2
- https://www.nature.com/articles/s42005-019-0253-2.pdf
- OA Status
- gold
- Cited By
- 36
- References
- 56
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W2989906844
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
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https://openalex.org/W2989906844Canonical identifier for this work in OpenAlex
- DOI
-
https://doi.org/10.1038/s42005-019-0253-2Digital Object Identifier
- Title
-
Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precisionWork title
- Type
-
articleOpenAlex work type
- Language
-
enPrimary language
- Publication year
-
2019Year of publication
- Publication date
-
2019-11-28Full publication date if available
- Authors
-
Thanh-Hung Dinh, Nikita Medvedev, Masahiko Ishino, Toshiyuki Kitamura, Noboru Hasegawa, Tomohito Otobe, Takeshi Higashiguchi, Kazuyuki Sakaue, Masakazu Washio, Tadashi Hatano, Akira Kon, Yuya Kubota, Yuichi Inubushi, Shigeki Owada, Tatsunori Shibuya, Beata Ziaja, Masaharu NishikinoList of authors in order
- Landing page
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https://doi.org/10.1038/s42005-019-0253-2Publisher landing page
- PDF URL
-
https://www.nature.com/articles/s42005-019-0253-2.pdfDirect link to full text PDF
- Open access
-
YesWhether a free full text is available
- OA status
-
goldOpen access status per OpenAlex
- OA URL
-
https://www.nature.com/articles/s42005-019-0253-2.pdfDirect OA link when available
- Concepts
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Silicon, Femtosecond, Materials science, Nanometre, Excitation, Laser, Electron, Nanotechnology, Substrate (aquarium), Photon, Optoelectronics, Extreme ultraviolet, Optics, Physics, Geology, Oceanography, Quantum mechanics, Composite materialTop concepts (fields/topics) attached by OpenAlex
- Cited by
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36Total citation count in OpenAlex
- Citations by year (recent)
-
2025: 5, 2024: 4, 2023: 10, 2022: 6, 2021: 7Per-year citation counts (last 5 years)
- References (count)
-
56Number of works referenced by this work
- Related works (count)
-
10Other works algorithmically related by OpenAlex
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| abstract_inverted_index.offers | 37 |
| abstract_inverted_index.pulses | 9 |
| abstract_inverted_index.single | 74 |
| abstract_inverted_index.strong | 23 |
| abstract_inverted_index.within | 27 |
| abstract_inverted_index.control | 41 |
| abstract_inverted_index.cooling | 114 |
| abstract_inverted_index.craters | 64 |
| abstract_inverted_index.creates | 21 |
| abstract_inverted_index.extreme | 76 |
| abstract_inverted_index.intense | 8 |
| abstract_inverted_index.photons | 12 |
| abstract_inverted_index.scales. | 35 |
| abstract_inverted_index.silicon | 70, 132 |
| abstract_inverted_index.spatial | 34, 49 |
| abstract_inverted_index.surface | 67, 88 |
| abstract_inverted_index.Abstract | 0 |
| abstract_inverted_index.ablation | 116 |
| abstract_inverted_index.allowing | 130 |
| abstract_inverted_index.directly | 136 |
| abstract_inverted_index.electron | 121 |
| abstract_inverted_index.focused, | 7 |
| abstract_inverted_index.focusing | 73 |
| abstract_inverted_index.material | 5, 46, 133 |
| abstract_inverted_index.motions, | 129 |
| abstract_inverted_index.physical | 108 |
| abstract_inverted_index.reaching | 141 |
| abstract_inverted_index.response | 43 |
| abstract_inverted_index.suppress | 126 |
| abstract_inverted_index.vicinity | 92 |
| abstract_inverted_index.creation. | 112 |
| abstract_inverted_index.electrons | 18 |
| abstract_inverted_index.particles | 15 |
| abstract_inverted_index.precision | 140 |
| abstract_inverted_index.processed | 137 |
| abstract_inverted_index.resulting | 87 |
| abstract_inverted_index.substrate | 71 |
| abstract_inverted_index.transport | 124 |
| abstract_inverted_index.undesired | 127 |
| abstract_inverted_index.connection | 98 |
| abstract_inverted_index.electronic | 24 |
| abstract_inverted_index.excitation | 25 |
| abstract_inverted_index.generation | 58 |
| abstract_inverted_index.limitation | 144 |
| abstract_inverted_index.mechanisms | 109 |
| abstract_inverted_index.observable | 143 |
| abstract_inverted_index.Interaction | 1 |
| abstract_inverted_index.approaches, | 102 |
| abstract_inverted_index.femtosecond | 75 |
| abstract_inverted_index.high-energy | 11 |
| abstract_inverted_index.investigate | 85 |
| abstract_inverted_index.microscope. | 149 |
| abstract_inverted_index.microscopic | 100 |
| abstract_inverted_index.possibility | 39 |
| abstract_inverted_index.theoretical | 101 |
| abstract_inverted_index.thresholds, | 95 |
| abstract_inverted_index.ultra-short | 29 |
| abstract_inverted_index.ultra-small | 33 |
| abstract_inverted_index.ultraviolet | 77 |
| abstract_inverted_index.establishing | 96 |
| abstract_inverted_index.illustrating | 107 |
| abstract_inverted_index.modification | 89 |
| abstract_inverted_index.free-electron | 82 |
| abstract_inverted_index.nano-devices. | 60 |
| abstract_inverted_index.hydrodynamical | 128 |
| abstract_inverted_index.nanometer—crucial | 54 |
| cited_by_percentile_year.max | 99 |
| cited_by_percentile_year.min | 90 |
| corresponding_author_ids | https://openalex.org/A5062524741, https://openalex.org/A5084199480 |
| countries_distinct_count | 3 |
| institutions_distinct_count | 17 |
| corresponding_institution_ids | https://openalex.org/I4210114217, https://openalex.org/I4210122644 |
| sustainable_development_goals[0].id | https://metadata.un.org/sdg/7 |
| sustainable_development_goals[0].score | 0.7599999904632568 |
| sustainable_development_goals[0].display_name | Affordable and clean energy |
| citation_normalized_percentile.value | 0.87589513 |
| citation_normalized_percentile.is_in_top_1_percent | False |
| citation_normalized_percentile.is_in_top_10_percent | False |