Highly conductive and stable Co₉S₈ thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth Article Swipe

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Miika Mattinen , Timo Hatanpää , Kenichiro Mizohata , J. Räisänen , Markku Leskelä , Mikko Ritala ·

YOU? · · 2021 · Open Access · · DOI: https://doi.org/10.1039/d1dt02315b

A new ALD process using easily synthesized CoCl 2 (TMEDA) and H 2 S enables deposition of ultrathin, highly conductive and thermally stable Co 9 S 8 films selectively on SiO 2 without growth on Si–H.

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Atomic layer deposition Deposition (geology) Characterization (materials science) Electrical conductor Layer (electronics) Epitaxy Materials science Chemical engineering Nanotechnology Thin film Composite material Paleontology Sediment Biology Engineering

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Type: article
Language: en
Landing Page: https://doi.org/10.1039/d1dt02315b
PDF: https://pubs.rsc.org/en/content/articlepdf/2021/dt/d1dt02315b
OA Status: hybrid
Cited By: 1
References: 44
Related Works: 10
OpenAlex ID: https://openalex.org/W3193289515

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DOI: https://doi.org/10.1039/d1dt02315b

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Title: Highly conductive and stable Co₉S₈ thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

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Type: article

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Language: en

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Publication year: 2021

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Publication date: 2021-01-01

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Authors: Miika Mattinen, Timo Hatanpää, Kenichiro Mizohata, J. Räisänen, Markku Leskelä, Mikko Ritala

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Landing page: https://doi.org/10.1039/d1dt02315b

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Concepts: Atomic layer deposition, Deposition (geology), Characterization (materials science), Electrical conductor, Layer (electronics), Epitaxy, Materials science, Chemical engineering, Nanotechnology, Thin film, Composite material, Paleontology, Sediment, Biology, Engineering

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Highly conductive and stable Co9S8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth Article Swipe

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Highly conductive and stable Co₉S₈ thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth Article Swipe