Improved Gate Reliability of p-GaN Gate HEMTs by Gate Doping Engineering Article Swipe
Guangnan Zhou
,
Fanming Zeng
,
Rongyu Gao
,
Qing Wang
,
Kai Cheng
,
Guangrui Xia
,
Hongyu Yu
·
YOU?
·
· 2021
· Open Access
·
· DOI: https://doi.org/10.48550/arxiv.2106.01495
YOU?
·
· 2021
· Open Access
·
· DOI: https://doi.org/10.48550/arxiv.2106.01495
We present a novel p-GaN gate HEMT structure with reduced hole concentration near the Schottky interface by doping engineering in MOCVD, which aims at lowering the electric field across the gate. By employing an additional unintentionally doped GaN layer, the gate leakage current is suppressed and the gate breakdown voltage is boosted from 10.6 to 14.6 V with negligible influence on the threshold voltage and on-resistance. Time-dependent gate breakdown measurements reveal that the maximum gate drive voltage increases from 6.2 to 10.6 V for a 10-year lifetime with a 1% gate failure rate. This method effectively expands the operating voltage margin of the p-GaN gate HEMTs without any other additional process steps.
Related Topics
Concepts
Materials science
Optoelectronics
Time-dependent gate oxide breakdown
Breakdown voltage
High-electron-mobility transistor
Gate oxide
Doping
Reliability (semiconductor)
Schottky barrier
Voltage
Electrical engineering
Transistor
Engineering
Power (physics)
Physics
Diode
Quantum mechanics
Metadata
- Type
- preprint
- Language
- en
- Landing Page
- http://arxiv.org/abs/2106.01495
- https://arxiv.org/pdf/2106.01495
- OA Status
- green
- Cited By
- 1
- References
- 23
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W3169326328
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
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https://openalex.org/W3169326328Canonical identifier for this work in OpenAlex
- DOI
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https://doi.org/10.48550/arxiv.2106.01495Digital Object Identifier
- Title
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Improved Gate Reliability of p-GaN Gate HEMTs by Gate Doping EngineeringWork title
- Type
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preprintOpenAlex work type
- Language
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enPrimary language
- Publication year
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2021Year of publication
- Publication date
-
2021-06-02Full publication date if available
- Authors
-
Guangnan Zhou, Fanming Zeng, Rongyu Gao, Qing Wang, Kai Cheng, Guangrui Xia, Hongyu YuList of authors in order
- Landing page
-
https://arxiv.org/abs/2106.01495Publisher landing page
- PDF URL
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https://arxiv.org/pdf/2106.01495Direct link to full text PDF
- Open access
-
YesWhether a free full text is available
- OA status
-
greenOpen access status per OpenAlex
- OA URL
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https://arxiv.org/pdf/2106.01495Direct OA link when available
- Concepts
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Materials science, Optoelectronics, Time-dependent gate oxide breakdown, Breakdown voltage, High-electron-mobility transistor, Gate oxide, Doping, Reliability (semiconductor), Schottky barrier, Voltage, Electrical engineering, Transistor, Engineering, Power (physics), Physics, Diode, Quantum mechanicsTop concepts (fields/topics) attached by OpenAlex
- Cited by
-
1Total citation count in OpenAlex
- Citations by year (recent)
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2023: 1Per-year citation counts (last 5 years)
- References (count)
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23Number of works referenced by this work
- Related works (count)
-
10Other works algorithmically related by OpenAlex
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| abstract_inverted_index.rate. | 92 |
| abstract_inverted_index.which | 21 |
| abstract_inverted_index.MOCVD, | 20 |
| abstract_inverted_index.across | 28 |
| abstract_inverted_index.doping | 17 |
| abstract_inverted_index.layer, | 38 |
| abstract_inverted_index.margin | 100 |
| abstract_inverted_index.method | 94 |
| abstract_inverted_index.reveal | 70 |
| abstract_inverted_index.steps. | 111 |
| abstract_inverted_index.10-year | 85 |
| abstract_inverted_index.boosted | 51 |
| abstract_inverted_index.current | 42 |
| abstract_inverted_index.expands | 96 |
| abstract_inverted_index.failure | 91 |
| abstract_inverted_index.leakage | 41 |
| abstract_inverted_index.maximum | 73 |
| abstract_inverted_index.present | 1 |
| abstract_inverted_index.process | 110 |
| abstract_inverted_index.reduced | 9 |
| abstract_inverted_index.voltage | 49, 63, 76, 99 |
| abstract_inverted_index.without | 106 |
| abstract_inverted_index.Schottky | 14 |
| abstract_inverted_index.electric | 26 |
| abstract_inverted_index.lifetime | 86 |
| abstract_inverted_index.lowering | 24 |
| abstract_inverted_index.breakdown | 48, 68 |
| abstract_inverted_index.employing | 32 |
| abstract_inverted_index.increases | 77 |
| abstract_inverted_index.influence | 59 |
| abstract_inverted_index.interface | 15 |
| abstract_inverted_index.operating | 98 |
| abstract_inverted_index.structure | 7 |
| abstract_inverted_index.threshold | 62 |
| abstract_inverted_index.additional | 34, 109 |
| abstract_inverted_index.negligible | 58 |
| abstract_inverted_index.suppressed | 44 |
| abstract_inverted_index.effectively | 95 |
| abstract_inverted_index.engineering | 18 |
| abstract_inverted_index.measurements | 69 |
| abstract_inverted_index.concentration | 11 |
| abstract_inverted_index.Time-dependent | 66 |
| abstract_inverted_index.on-resistance. | 65 |
| abstract_inverted_index.unintentionally | 35 |
| cited_by_percentile_year | |
| countries_distinct_count | 0 |
| institutions_distinct_count | 7 |
| sustainable_development_goals[0].id | https://metadata.un.org/sdg/7 |
| sustainable_development_goals[0].score | 0.4699999988079071 |
| sustainable_development_goals[0].display_name | Affordable and clean energy |
| citation_normalized_percentile |