Improving the Precision of On-Wafer W-Band Scalar Load-Pull Measurements Article Swipe
Nicholas C. Miller
,
Michael Elliott
,
Eythan Lam
,
Ryan Gilbert
,
J. Uyeda
,
R. Coffie
·
YOU?
·
· 2023
· Open Access
·
· DOI: https://doi.org/10.1109/jmw.2023.3279014
YOU?
·
· 2023
· Open Access
·
· DOI: https://doi.org/10.1109/jmw.2023.3279014
This article presents an empirical investigation of calibration effects on load-pull measurements collected on wafer and at W-band frequencies. An analysis of scattering parameter (S-parameter) measurements provides insight into how small-signal metrics germane to load pull are affected by choice of the calibration technique. It is found that off-wafer line-reflect-reflect-match (LRRM) calibrated measurements of the same transistor with different probes exhibit drastically different maximum small-signal gains compared to equivalent on-wafer multiline thru-reflect-line (mTRL) calibrated measurements. Load-pull measurements are heavily influenced by choice of calibration algorithm, and LRRM calibrated large-signal measurements collected with different waveguide probes yield variations in large-signal gain of over 2 dB and variations in peak PAE of over 24 percentage points. The equivalent on-wafer mTRL calibrated load-pull measurements collected with different waveguide probes are consistent to within 0.1 dB for large-signal gain and 1 percentage point for peak PAE. This work provides quantitative evidence that on-wafer mTRL calibration with well-designed calibration structures is preferred for large-signal measurements collected at millimeter-wave frequencies. If utilization of on-wafer mTRL calibration is not possible, this work suggests using similar measurement setups, i.e., waveguide probes, calibration standards, etc., for evaluating on-wafer unmatched transistors in a consistent manner.
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Metadata
- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.1109/jmw.2023.3279014
- https://ieeexplore.ieee.org/ielx7/9171629/9206027/10143346.pdf
- OA Status
- gold
- Cited By
- 5
- References
- 23
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W4379184224
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
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https://openalex.org/W4379184224Canonical identifier for this work in OpenAlex
- DOI
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https://doi.org/10.1109/jmw.2023.3279014Digital Object Identifier
- Title
-
Improving the Precision of On-Wafer W-Band Scalar Load-Pull MeasurementsWork title
- Type
-
articleOpenAlex work type
- Language
-
enPrimary language
- Publication year
-
2023Year of publication
- Publication date
-
2023-06-02Full publication date if available
- Authors
-
Nicholas C. Miller, Michael Elliott, Eythan Lam, Ryan Gilbert, J. Uyeda, R. CoffieList of authors in order
- Landing page
-
https://doi.org/10.1109/jmw.2023.3279014Publisher landing page
- PDF URL
-
https://ieeexplore.ieee.org/ielx7/9171629/9206027/10143346.pdfDirect link to full text PDF
- Open access
-
YesWhether a free full text is available
- OA status
-
goldOpen access status per OpenAlex
- OA URL
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https://ieeexplore.ieee.org/ielx7/9171629/9206027/10143346.pdfDirect OA link when available
- Concepts
-
Calibration, Wafer, SIGNAL (programming language), Load pull, Transistor, Scattering parameters, Materials science, Wafer testing, Waveguide, Optics, Physics, Optoelectronics, Electrical engineering, Computer science, Engineering, Programming language, Voltage, Quantum mechanicsTop concepts (fields/topics) attached by OpenAlex
- Cited by
-
5Total citation count in OpenAlex
- Citations by year (recent)
-
2025: 3, 2023: 2Per-year citation counts (last 5 years)
- References (count)
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23Number of works referenced by this work
- Related works (count)
-
10Other works algorithmically related by OpenAlex
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