Integration of Through‐Sapphire Substrate Machining with Superconducting Quantum Processors Article Swipe
Narendra Acharya
,
A. Robert Armstrong
,
Yashwanth Balaji
,
Kevin G. Crawford
,
James C. Gates
,
Paul C. Gow
,
Oscar W. Kennedy
,
Renuka Devi Pothuraju
,
Kowsar Shahbazi
,
Connor D. Shelly
·
YOU?
·
· 2025
· Open Access
·
· DOI: https://doi.org/10.1002/adma.202411780
YOU?
·
· 2025
· Open Access
·
· DOI: https://doi.org/10.1002/adma.202411780
A sapphire machining process integrated with intermediate‐scale quantum processors is demonstrated. The process allows through‐substrate electrical connections, necessary for low‐frequency mode‐mitigation, as well as signal‐routing, which are vital as quantum computers scale in qubit number, and thus dimension. High‐coherence qubits are required to build fault‐tolerant quantum computers and so material choices are an important consideration when developing a qubit technology platform. Sapphire, as a low‐loss dielectric substrate, has shown to support high‐coherence qubits. In addition, recent advances in material choices such as tantalum and titanium‐nitride, both deposited on a sapphire substrate, have demonstrated qubit lifetimes exceeding 0.3 ms. However, the lack of any process equivalent of deep‐silicon etching to create through‐substrate‐vias in sapphire, or to inductively shunt large dies, has limited sapphire to small‐scale processors, or necessitates the use of chiplet architecture. Here, a sapphire machining process that is compatible with high‐coherence qubits is presented. This technique immediately provides a means to scale quantum processing units (QPUs) with integrated mode‐mitigation, and provides a route toward the development of through‐sapphire‐vias, both of which allow the advantages of sapphire to be leveraged as well as facilitating the use of sapphire‐compatible materials for large‐scale QPUs.
Related Topics
Concepts
Sapphire
Materials science
Qubit
Optoelectronics
Silicon on sapphire
Quantum computer
Quantum
Etching (microfabrication)
Quantum technology
Nanotechnology
Electronic engineering
Computer science
Silicon
Physics
Engineering
Optics
Open quantum system
Layer (electronics)
Laser
Quantum mechanics
Silicon on insulator
Metadata
- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.1002/adma.202411780
- OA Status
- hybrid
- Cited By
- 3
- References
- 33
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W4406593053
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
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https://openalex.org/W4406593053Canonical identifier for this work in OpenAlex
- DOI
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https://doi.org/10.1002/adma.202411780Digital Object Identifier
- Title
-
Integration of Through‐Sapphire Substrate Machining with Superconducting Quantum ProcessorsWork title
- Type
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articleOpenAlex work type
- Language
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enPrimary language
- Publication year
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2025Year of publication
- Publication date
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2025-01-19Full publication date if available
- Authors
-
Narendra Acharya, A. Robert Armstrong, Yashwanth Balaji, Kevin G. Crawford, James C. Gates, Paul C. Gow, Oscar W. Kennedy, Renuka Devi Pothuraju, Kowsar Shahbazi, Connor D. ShellyList of authors in order
- Landing page
-
https://doi.org/10.1002/adma.202411780Publisher landing page
- Open access
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YesWhether a free full text is available
- OA status
-
hybridOpen access status per OpenAlex
- OA URL
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https://doi.org/10.1002/adma.202411780Direct OA link when available
- Concepts
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Sapphire, Materials science, Qubit, Optoelectronics, Silicon on sapphire, Quantum computer, Quantum, Etching (microfabrication), Quantum technology, Nanotechnology, Electronic engineering, Computer science, Silicon, Physics, Engineering, Optics, Open quantum system, Layer (electronics), Laser, Quantum mechanics, Silicon on insulatorTop concepts (fields/topics) attached by OpenAlex
- Cited by
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3Total citation count in OpenAlex
- Citations by year (recent)
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2025: 3Per-year citation counts (last 5 years)
- References (count)
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33Number of works referenced by this work
- Related works (count)
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10Other works algorithmically related by OpenAlex
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