Low temperature sputtering deposition of Al1−xScxN thin films: Physical, chemical, and piezoelectric properties evolution by tuning the nitrogen flux in (Ar + N2) reactive atmosphere Article Swipe
M.A. Signore
,
A. Serra
,
D. Manno
,
Gianluca Quarta
,
Lucio Calcagnile
,
Lucio Maruccio
,
Elisa Sciurti
,
Enrico Melissano
,
A. Campa
,
Maria Concetta Martucci
,
Luca Francioso
,
L. Velardi
·
YOU?
·
· 2024
· Open Access
·
· DOI: https://doi.org/10.1063/5.0202683
YOU?
·
· 2024
· Open Access
·
· DOI: https://doi.org/10.1063/5.0202683
This work investigates the physical properties of Al1−xScxN thin films sputtered at low temperatures by varying the process conditions. Specifically, the films were deposited at room temperature by applying a radio frequency power equal to 150 W to an AlSc alloy (60:40) target, varying the nitrogen flux percentage in the (Ar + N2) sputtering atmosphere (30%, 40%, 50%, and 60%) and keeping constant the working pressure at 5 × 10−3 mbar. The structural and chemical properties of the Al1−xScxN films were studied by x-ray diffraction and Rutherford backscattering spectrometry techniques, respectively. The piezoelectric response was investigated by piezoresponse force microscopy. In addition, the surface potential was evaluated for the first time for Sc-doped AlN thin films by Kelvin probe force microscopy, providing piezoelectric coefficients free from the no-piezoelectric additional effect to the mechanical deformation, i.e., the electrostatic force. By alloying AlN with scandium, the piezoelectric response was strongly enhanced (up to 200% compared to undoped AlN), despite the low deposition temperature and the absence of any other additional energy source supplied to the adatoms during thin film growth, which generally promotes a better structural arrangement of polycrystalline film. This is a strategic result in the field of microelectromechanical systems completely fabricated at low temperatures.
Related Topics
Concepts
Sputtering
Nitrogen
Flux (metallurgy)
Atmosphere (unit)
Thin film
Materials science
Deposition (geology)
Reactive nitrogen
Chemical vapor deposition
Piezoelectricity
Analytical Chemistry (journal)
Optoelectronics
Chemistry
Nanotechnology
Environmental chemistry
Composite material
Metallurgy
Thermodynamics
Physics
Organic chemistry
Sediment
Biology
Paleontology
Metadata
- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.1063/5.0202683
- https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0202683/19848977/125105_1_5.0202683.pdf
- OA Status
- hybrid
- Cited By
- 8
- References
- 51
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W4393192743
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
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https://openalex.org/W4393192743Canonical identifier for this work in OpenAlex
- DOI
-
https://doi.org/10.1063/5.0202683Digital Object Identifier
- Title
-
Low temperature sputtering deposition of Al1−xScxN thin films: Physical, chemical, and piezoelectric properties evolution by tuning the nitrogen flux in (Ar + N2) reactive atmosphereWork title
- Type
-
articleOpenAlex work type
- Language
-
enPrimary language
- Publication year
-
2024Year of publication
- Publication date
-
2024-03-26Full publication date if available
- Authors
-
M.A. Signore, A. Serra, D. Manno, Gianluca Quarta, Lucio Calcagnile, Lucio Maruccio, Elisa Sciurti, Enrico Melissano, A. Campa, Maria Concetta Martucci, Luca Francioso, L. VelardiList of authors in order
- Landing page
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https://doi.org/10.1063/5.0202683Publisher landing page
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https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0202683/19848977/125105_1_5.0202683.pdfDirect link to full text PDF
- Open access
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YesWhether a free full text is available
- OA status
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hybridOpen access status per OpenAlex
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https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0202683/19848977/125105_1_5.0202683.pdfDirect OA link when available
- Concepts
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Sputtering, Nitrogen, Flux (metallurgy), Atmosphere (unit), Thin film, Materials science, Deposition (geology), Reactive nitrogen, Chemical vapor deposition, Piezoelectricity, Analytical Chemistry (journal), Optoelectronics, Chemistry, Nanotechnology, Environmental chemistry, Composite material, Metallurgy, Thermodynamics, Physics, Organic chemistry, Sediment, Biology, PaleontologyTop concepts (fields/topics) attached by OpenAlex
- Cited by
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8Total citation count in OpenAlex
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2025: 7, 2024: 1Per-year citation counts (last 5 years)
- References (count)
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51Number of works referenced by this work
- Related works (count)
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10Other works algorithmically related by OpenAlex
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| abstract_inverted_index.strongly | 147 |
| abstract_inverted_index.supplied | 170 |
| abstract_inverted_index.addition, | 101 |
| abstract_inverted_index.deposited | 23 |
| abstract_inverted_index.evaluated | 106 |
| abstract_inverted_index.frequency | 31 |
| abstract_inverted_index.generally | 179 |
| abstract_inverted_index.potential | 104 |
| abstract_inverted_index.providing | 121 |
| abstract_inverted_index.scandium, | 142 |
| abstract_inverted_index.sputtered | 10 |
| abstract_inverted_index.strategic | 191 |
| abstract_inverted_index.Rutherford | 86 |
| abstract_inverted_index.additional | 128, 167 |
| abstract_inverted_index.atmosphere | 54 |
| abstract_inverted_index.completely | 199 |
| abstract_inverted_index.deposition | 159 |
| abstract_inverted_index.fabricated | 200 |
| abstract_inverted_index.mechanical | 132 |
| abstract_inverted_index.percentage | 47 |
| abstract_inverted_index.properties | 5, 75 |
| abstract_inverted_index.sputtering | 53 |
| abstract_inverted_index.structural | 72, 183 |
| abstract_inverted_index.Al1−xScxN | 7, 78 |
| abstract_inverted_index.arrangement | 184 |
| abstract_inverted_index.conditions. | 18 |
| abstract_inverted_index.diffraction | 84 |
| abstract_inverted_index.microscopy, | 120 |
| abstract_inverted_index.microscopy. | 99 |
| abstract_inverted_index.techniques, | 89 |
| abstract_inverted_index.temperature | 26, 160 |
| abstract_inverted_index.coefficients | 123 |
| abstract_inverted_index.deformation, | 133 |
| abstract_inverted_index.investigated | 95 |
| abstract_inverted_index.investigates | 2 |
| abstract_inverted_index.spectrometry | 88 |
| abstract_inverted_index.temperatures | 13 |
| abstract_inverted_index.Specifically, | 19 |
| abstract_inverted_index.electrostatic | 136 |
| abstract_inverted_index.piezoelectric | 92, 122, 144 |
| abstract_inverted_index.piezoresponse | 97 |
| abstract_inverted_index.respectively. | 90 |
| abstract_inverted_index.temperatures. | 203 |
| abstract_inverted_index.backscattering | 87 |
| abstract_inverted_index.polycrystalline | 186 |
| abstract_inverted_index.no-piezoelectric | 127 |
| abstract_inverted_index.microelectromechanical | 197 |
| cited_by_percentile_year.max | 99 |
| cited_by_percentile_year.min | 90 |
| countries_distinct_count | 1 |
| institutions_distinct_count | 12 |
| sustainable_development_goals[0].id | https://metadata.un.org/sdg/7 |
| sustainable_development_goals[0].score | 0.7599999904632568 |
| sustainable_development_goals[0].display_name | Affordable and clean energy |
| citation_normalized_percentile.value | 0.85325701 |
| citation_normalized_percentile.is_in_top_1_percent | False |
| citation_normalized_percentile.is_in_top_10_percent | True |