Nanoimprint lithography-assisted block copolymer self-assembly for hyperfine fabrication of magnetic patterns based on L10-FePt nanoparticles Article Swipe
Jie Zhang
,
Yi Chen
,
Guijun Li
,
Zelin Sun
,
Zhengong Meng
,
Wai‐Yeung Wong
·
YOU?
·
· 2025
· Open Access
·
· DOI: https://doi.org/10.1007/s11426-024-2333-x
YOU?
·
· 2025
· Open Access
·
· DOI: https://doi.org/10.1007/s11426-024-2333-x
L1 0 -FePt-type bit-patterned media has provided a promising alternative for ultrahigh-density magnetic recording systems in the current digital era, but rapid fabrication of magnetic patterns with hyperfine bit islands is still challenging, especially with the target for miniaturization and scalable production simultaneously. Herein, Fe,Pt-containing block copolymers were utilized as single-source precursors for solution-processable patterning and subsequent generation of the demanding magnetic FePt dots by in situ pyrolysis. High-throughput nanoimprint lithography was initially employed to fabricate the predefined bit cells precisely, and then the intrinsic self-assembly of phase-separated block copolymers further drove the formation of accurate bit islands. Benefiting from the synergistic effect of top-down lithographic approach and bottom-up self-assembly, the customizable patterns could be achieved for large-scale mass production in targeted areas, but high-density isolated dots could also be accurately aligned along the patterned features after subsequent self-assembly. This reliable strategy would provide a good avenue to precisely construct ultrahigh-density magnetic data storage devices.
Related Topics
Concepts
Nanoimprint lithography
Copolymer
Materials science
Fabrication
Nanoparticle
Nanotechnology
Lithography
Nanolithography
Magnetic nanoparticles
Hyperfine structure
Self-assembly
Block (permutation group theory)
Optoelectronics
Polymer
Composite material
Physics
Pathology
Medicine
Geometry
Quantum mechanics
Alternative medicine
Mathematics
Metadata
- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.1007/s11426-024-2333-x
- https://link.springer.com/content/pdf/10.1007/s11426-024-2333-x.pdf
- OA Status
- hybrid
- Cited By
- 4
- References
- 54
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W4406313056
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
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https://openalex.org/W4406313056Canonical identifier for this work in OpenAlex
- DOI
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https://doi.org/10.1007/s11426-024-2333-xDigital Object Identifier
- Title
-
Nanoimprint lithography-assisted block copolymer self-assembly for hyperfine fabrication of magnetic patterns based on L10-FePt nanoparticlesWork title
- Type
-
articleOpenAlex work type
- Language
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enPrimary language
- Publication year
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2025Year of publication
- Publication date
-
2025-01-06Full publication date if available
- Authors
-
Jie Zhang, Yi Chen, Guijun Li, Zelin Sun, Zhengong Meng, Wai‐Yeung WongList of authors in order
- Landing page
-
https://doi.org/10.1007/s11426-024-2333-xPublisher landing page
- PDF URL
-
https://link.springer.com/content/pdf/10.1007/s11426-024-2333-x.pdfDirect link to full text PDF
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YesWhether a free full text is available
- OA status
-
hybridOpen access status per OpenAlex
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https://link.springer.com/content/pdf/10.1007/s11426-024-2333-x.pdfDirect OA link when available
- Concepts
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Nanoimprint lithography, Copolymer, Materials science, Fabrication, Nanoparticle, Nanotechnology, Lithography, Nanolithography, Magnetic nanoparticles, Hyperfine structure, Self-assembly, Block (permutation group theory), Optoelectronics, Polymer, Composite material, Physics, Pathology, Medicine, Geometry, Quantum mechanics, Alternative medicine, MathematicsTop concepts (fields/topics) attached by OpenAlex
- Cited by
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4Total citation count in OpenAlex
- Citations by year (recent)
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2025: 4Per-year citation counts (last 5 years)
- References (count)
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54Number of works referenced by this work
- Related works (count)
-
10Other works algorithmically related by OpenAlex
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