Phase defect detection signal analysis: dependence of defect size variation Article Swipe
Tsuyoshi Amano
,
Hidehiro Watanabe
,
Tsukasa Abe
·
YOU?
·
· 2015
· Open Access
·
· DOI: https://doi.org/10.1117/1.jmm.14.1.013502
YOU?
·
· 2015
· Open Access
·
· DOI: https://doi.org/10.1117/1.jmm.14.1.013502
The influence of the size or volume of the phase defect embedded in the extreme ultraviolet mask on wafer printability by scanning probe microscope (SPM) is well studied. However, only a few experimental results on the measurement accuracy of the phase defect size have been reported. Therefore, in this study, the measurement repeatability of the phase defect volume using SPM and the influence of the defect volume distribution on defect detection signal intensity (DSI) using an at-wavelength dark-field defect inspection tool were examined. A programmed phase defect mask was prepared, and a defect size measurement repeatability test was conducted using an SPM. As a result, the variation of the measured volume due to the measurement repeatability was much smaller than that of the defect-to-defect variation. This result indicates that measuring the volume of each phase defect is necessary in order to evaluate the defect detection yield using a phase defect inspection tool and wafer printability. In addition, the images of phase defects were captured using an at-wavelength dark-field inspection tool from which the defect DSIs were calculated. The DSI showed a direct correlation with the defect volume.
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- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.1117/1.jmm.14.1.013502
- https://www.spiedigitallibrary.org/journals/journal-of-micro-nanolithography-mems-and-moems/volume-14/issue-1/013502/Phase-defect-detection-signal-analysis--dependence-of-defect-size/10.1117/1.JMM.14.1.013502.pdf
- OA Status
- hybrid
- Cited By
- 7
- References
- 30
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W2116075909
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- OpenAlex ID
-
https://openalex.org/W2116075909Canonical identifier for this work in OpenAlex
- DOI
-
https://doi.org/10.1117/1.jmm.14.1.013502Digital Object Identifier
- Title
-
Phase defect detection signal analysis: dependence of defect size variationWork title
- Type
-
articleOpenAlex work type
- Language
-
enPrimary language
- Publication year
-
2015Year of publication
- Publication date
-
2015-01-22Full publication date if available
- Authors
-
Tsuyoshi Amano, Hidehiro Watanabe, Tsukasa AbeList of authors in order
- Landing page
-
https://doi.org/10.1117/1.jmm.14.1.013502Publisher landing page
- PDF URL
-
https://www.spiedigitallibrary.org/journals/journal-of-micro-nanolithography-mems-and-moems/volume-14/issue-1/013502/Phase-defect-detection-signal-analysis--dependence-of-defect-size/10.1117/1.JMM.14.1.013502.pdfDirect link to full text PDF
- Open access
-
YesWhether a free full text is available
- OA status
-
hybridOpen access status per OpenAlex
- OA URL
-
https://www.spiedigitallibrary.org/journals/journal-of-micro-nanolithography-mems-and-moems/volume-14/issue-1/013502/Phase-defect-detection-signal-analysis--dependence-of-defect-size/10.1117/1.JMM.14.1.013502.pdfDirect OA link when available
- Concepts
-
Repeatability, Materials science, Wafer, Phase (matter), Volume (thermodynamics), Optics, SIGNAL (programming language), Wavelength, Optoelectronics, Computer science, Chemistry, Physics, Programming language, Chromatography, Quantum mechanics, Organic chemistryTop concepts (fields/topics) attached by OpenAlex
- Cited by
-
7Total citation count in OpenAlex
- Citations by year (recent)
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2016: 3, 2015: 4Per-year citation counts (last 5 years)
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-
30Number of works referenced by this work
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-
10Other works algorithmically related by OpenAlex
Full payload
| id | https://openalex.org/W2116075909 |
|---|---|
| doi | https://doi.org/10.1117/1.jmm.14.1.013502 |
| ids.doi | https://doi.org/10.1117/1.jmm.14.1.013502 |
| ids.mag | 2116075909 |
| ids.openalex | https://openalex.org/W2116075909 |
| fwci | 1.16955221 |
| type | article |
| title | Phase defect detection signal analysis: dependence of defect size variation |
| biblio.issue | 1 |
| biblio.volume | 14 |
| biblio.last_page | 013502 |
| biblio.first_page | 013502 |
| topics[0].id | https://openalex.org/T11338 |
| topics[0].field.id | https://openalex.org/fields/22 |
| topics[0].field.display_name | Engineering |
| topics[0].score | 0.9998000264167786 |
| topics[0].domain.id | https://openalex.org/domains/3 |
| topics[0].domain.display_name | Physical Sciences |
| topics[0].subfield.id | https://openalex.org/subfields/2208 |
| topics[0].subfield.display_name | Electrical and Electronic Engineering |
| topics[0].display_name | Advancements in Photolithography Techniques |
| topics[1].id | https://openalex.org/T12039 |
| topics[1].field.id | https://openalex.org/fields/25 |
| topics[1].field.display_name | Materials Science |
| topics[1].score | 0.9993000030517578 |
| topics[1].domain.id | https://openalex.org/domains/3 |
| topics[1].domain.display_name | Physical Sciences |
| topics[1].subfield.id | https://openalex.org/subfields/2508 |
| topics[1].subfield.display_name | Surfaces, Coatings and Films |
| topics[1].display_name | Electron and X-Ray Spectroscopy Techniques |
| topics[2].id | https://openalex.org/T14117 |
| topics[2].field.id | https://openalex.org/fields/22 |
| topics[2].field.display_name | Engineering |
| topics[2].score | 0.9984999895095825 |
| topics[2].domain.id | https://openalex.org/domains/3 |
| topics[2].domain.display_name | Physical Sciences |
| topics[2].subfield.id | https://openalex.org/subfields/2208 |
| topics[2].subfield.display_name | Electrical and Electronic Engineering |
| topics[2].display_name | Integrated Circuits and Semiconductor Failure Analysis |
| is_xpac | False |
| apc_list | |
| apc_paid | |
| concepts[0].id | https://openalex.org/C154020017 |
| concepts[0].level | 2 |
| concepts[0].score | 0.8829665184020996 |
| concepts[0].wikidata | https://www.wikidata.org/wiki/Q520171 |
| concepts[0].display_name | Repeatability |
| concepts[1].id | https://openalex.org/C192562407 |
| concepts[1].level | 0 |
| concepts[1].score | 0.7574900388717651 |
| concepts[1].wikidata | https://www.wikidata.org/wiki/Q228736 |
| concepts[1].display_name | Materials science |
| concepts[2].id | https://openalex.org/C160671074 |
| concepts[2].level | 2 |
| concepts[2].score | 0.7391402125358582 |
| concepts[2].wikidata | https://www.wikidata.org/wiki/Q267131 |
| concepts[2].display_name | Wafer |
| concepts[3].id | https://openalex.org/C44280652 |
| concepts[3].level | 2 |
| concepts[3].score | 0.5648260116577148 |
| concepts[3].wikidata | https://www.wikidata.org/wiki/Q104837 |
| concepts[3].display_name | Phase (matter) |
| concepts[4].id | https://openalex.org/C20556612 |
| concepts[4].level | 2 |
| concepts[4].score | 0.538079023361206 |
| concepts[4].wikidata | https://www.wikidata.org/wiki/Q4469374 |
| concepts[4].display_name | Volume (thermodynamics) |
| concepts[5].id | https://openalex.org/C120665830 |
| concepts[5].level | 1 |
| concepts[5].score | 0.5339236259460449 |
| concepts[5].wikidata | https://www.wikidata.org/wiki/Q14620 |
| concepts[5].display_name | Optics |
| concepts[6].id | https://openalex.org/C2779843651 |
| concepts[6].level | 2 |
| concepts[6].score | 0.5108120441436768 |
| concepts[6].wikidata | https://www.wikidata.org/wiki/Q7390335 |
| concepts[6].display_name | SIGNAL (programming language) |
| concepts[7].id | https://openalex.org/C6260449 |
| concepts[7].level | 2 |
| concepts[7].score | 0.4966493248939514 |
| concepts[7].wikidata | https://www.wikidata.org/wiki/Q41364 |
| concepts[7].display_name | Wavelength |
| concepts[8].id | https://openalex.org/C49040817 |
| concepts[8].level | 1 |
| concepts[8].score | 0.29684749245643616 |
| concepts[8].wikidata | https://www.wikidata.org/wiki/Q193091 |
| concepts[8].display_name | Optoelectronics |
| concepts[9].id | https://openalex.org/C41008148 |
| concepts[9].level | 0 |
| concepts[9].score | 0.08068442344665527 |
| concepts[9].wikidata | https://www.wikidata.org/wiki/Q21198 |
| concepts[9].display_name | Computer science |
| concepts[10].id | https://openalex.org/C185592680 |
| concepts[10].level | 0 |
| concepts[10].score | 0.07699429988861084 |
| concepts[10].wikidata | https://www.wikidata.org/wiki/Q2329 |
| concepts[10].display_name | Chemistry |
| concepts[11].id | https://openalex.org/C121332964 |
| concepts[11].level | 0 |
| concepts[11].score | 0.07552143931388855 |
| concepts[11].wikidata | https://www.wikidata.org/wiki/Q413 |
| concepts[11].display_name | Physics |
| concepts[12].id | https://openalex.org/C199360897 |
| concepts[12].level | 1 |
| concepts[12].score | 0.0 |
| concepts[12].wikidata | https://www.wikidata.org/wiki/Q9143 |
| concepts[12].display_name | Programming language |
| concepts[13].id | https://openalex.org/C43617362 |
| concepts[13].level | 1 |
| concepts[13].score | 0.0 |
| concepts[13].wikidata | https://www.wikidata.org/wiki/Q170050 |
| concepts[13].display_name | Chromatography |
| concepts[14].id | https://openalex.org/C62520636 |
| concepts[14].level | 1 |
| concepts[14].score | 0.0 |
| concepts[14].wikidata | https://www.wikidata.org/wiki/Q944 |
| concepts[14].display_name | Quantum mechanics |
| concepts[15].id | https://openalex.org/C178790620 |
| concepts[15].level | 1 |
| concepts[15].score | 0.0 |
| concepts[15].wikidata | https://www.wikidata.org/wiki/Q11351 |
| concepts[15].display_name | Organic chemistry |
| keywords[0].id | https://openalex.org/keywords/repeatability |
| keywords[0].score | 0.8829665184020996 |
| keywords[0].display_name | Repeatability |
| keywords[1].id | https://openalex.org/keywords/materials-science |
| keywords[1].score | 0.7574900388717651 |
| keywords[1].display_name | Materials science |
| keywords[2].id | https://openalex.org/keywords/wafer |
| keywords[2].score | 0.7391402125358582 |
| keywords[2].display_name | Wafer |
| keywords[3].id | https://openalex.org/keywords/phase |
| keywords[3].score | 0.5648260116577148 |
| keywords[3].display_name | Phase (matter) |
| keywords[4].id | https://openalex.org/keywords/volume |
| keywords[4].score | 0.538079023361206 |
| keywords[4].display_name | Volume (thermodynamics) |
| keywords[5].id | https://openalex.org/keywords/optics |
| keywords[5].score | 0.5339236259460449 |
| keywords[5].display_name | Optics |
| keywords[6].id | https://openalex.org/keywords/signal |
| keywords[6].score | 0.5108120441436768 |
| keywords[6].display_name | SIGNAL (programming language) |
| keywords[7].id | https://openalex.org/keywords/wavelength |
| keywords[7].score | 0.4966493248939514 |
| keywords[7].display_name | Wavelength |
| keywords[8].id | https://openalex.org/keywords/optoelectronics |
| keywords[8].score | 0.29684749245643616 |
| keywords[8].display_name | Optoelectronics |
| keywords[9].id | https://openalex.org/keywords/computer-science |
| keywords[9].score | 0.08068442344665527 |
| keywords[9].display_name | Computer science |
| keywords[10].id | https://openalex.org/keywords/chemistry |
| keywords[10].score | 0.07699429988861084 |
| keywords[10].display_name | Chemistry |
| keywords[11].id | https://openalex.org/keywords/physics |
| keywords[11].score | 0.07552143931388855 |
| keywords[11].display_name | Physics |
| language | en |
| locations[0].id | doi:10.1117/1.jmm.14.1.013502 |
| locations[0].is_oa | True |
| locations[0].source.id | https://openalex.org/S205064806 |
| locations[0].source.issn | 1932-5134, 1932-5150 |
| locations[0].source.type | journal |
| locations[0].source.is_oa | False |
| locations[0].source.issn_l | 1932-5134 |
| locations[0].source.is_core | True |
| locations[0].source.is_in_doaj | False |
| locations[0].source.display_name | Journal of Micro/Nanolithography MEMS and MOEMS |
| locations[0].source.host_organization | https://openalex.org/P4310315543 |
| locations[0].source.host_organization_name | SPIE |
| locations[0].source.host_organization_lineage | https://openalex.org/P4310315543 |
| locations[0].source.host_organization_lineage_names | SPIE |
| locations[0].license | cc-by |
| locations[0].pdf_url | https://www.spiedigitallibrary.org/journals/journal-of-micro-nanolithography-mems-and-moems/volume-14/issue-1/013502/Phase-defect-detection-signal-analysis--dependence-of-defect-size/10.1117/1.JMM.14.1.013502.pdf |
| locations[0].version | publishedVersion |
| locations[0].raw_type | journal-article |
| locations[0].license_id | https://openalex.org/licenses/cc-by |
| locations[0].is_accepted | True |
| locations[0].is_published | True |
| locations[0].raw_source_name | Journal of Micro/Nanolithography, MEMS, and MOEMS |
| locations[0].landing_page_url | https://doi.org/10.1117/1.jmm.14.1.013502 |
| indexed_in | crossref |
| authorships[0].author.id | https://openalex.org/A5100840520 |
| authorships[0].author.orcid | |
| authorships[0].author.display_name | Tsuyoshi Amano |
| authorships[0].affiliations[0].raw_affiliation_string | EUVL Infrastructure Development Center, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan |
| authorships[0].author_position | first |
| authorships[0].raw_author_name | Tsuyoshi Amano |
| authorships[0].is_corresponding | False |
| authorships[0].raw_affiliation_strings | EUVL Infrastructure Development Center, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan |
| authorships[1].author.id | https://openalex.org/A5036564280 |
| authorships[1].author.orcid | https://orcid.org/0000-0001-6714-1834 |
| authorships[1].author.display_name | Hidehiro Watanabe |
| authorships[1].affiliations[0].raw_affiliation_string | EUVL Infrastructure Development Center, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan |
| authorships[1].author_position | middle |
| authorships[1].raw_author_name | Hidehiro Watanabe |
| authorships[1].is_corresponding | False |
| authorships[1].raw_affiliation_strings | EUVL Infrastructure Development Center, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan |
| authorships[2].author.id | https://openalex.org/A5072517591 |
| authorships[2].author.orcid | https://orcid.org/0000-0002-2400-3797 |
| authorships[2].author.display_name | Tsukasa Abe |
| authorships[2].countries | JP |
| authorships[2].affiliations[0].institution_ids | https://openalex.org/I126913320 |
| authorships[2].affiliations[0].raw_affiliation_string | Dai Nippon Printing Co., Ltd., 2-2-1 Fukuoka, Fujimino, Saitama 356-8507, Japan |
| authorships[2].institutions[0].id | https://openalex.org/I126913320 |
| authorships[2].institutions[0].ror | https://ror.org/01be2k939 |
| authorships[2].institutions[0].type | company |
| authorships[2].institutions[0].lineage | https://openalex.org/I126913320 |
| authorships[2].institutions[0].country_code | JP |
| authorships[2].institutions[0].display_name | Dai Nippon Printing (Japan) |
| authorships[2].author_position | last |
| authorships[2].raw_author_name | Tsukasa Abe |
| authorships[2].is_corresponding | False |
| authorships[2].raw_affiliation_strings | Dai Nippon Printing Co., Ltd., 2-2-1 Fukuoka, Fujimino, Saitama 356-8507, Japan |
| has_content.pdf | True |
| has_content.grobid_xml | True |
| is_paratext | False |
| open_access.is_oa | True |
| open_access.oa_url | https://www.spiedigitallibrary.org/journals/journal-of-micro-nanolithography-mems-and-moems/volume-14/issue-1/013502/Phase-defect-detection-signal-analysis--dependence-of-defect-size/10.1117/1.JMM.14.1.013502.pdf |
| open_access.oa_status | hybrid |
| open_access.any_repository_has_fulltext | False |
| created_date | 2025-10-10T00:00:00 |
| display_name | Phase defect detection signal analysis: dependence of defect size variation |
| has_fulltext | True |
| is_retracted | False |
| updated_date | 2025-11-06T03:46:38.306776 |
| primary_topic.id | https://openalex.org/T11338 |
| primary_topic.field.id | https://openalex.org/fields/22 |
| primary_topic.field.display_name | Engineering |
| primary_topic.score | 0.9998000264167786 |
| primary_topic.domain.id | https://openalex.org/domains/3 |
| primary_topic.domain.display_name | Physical Sciences |
| primary_topic.subfield.id | https://openalex.org/subfields/2208 |
| primary_topic.subfield.display_name | Electrical and Electronic Engineering |
| primary_topic.display_name | Advancements in Photolithography Techniques |
| related_works | https://openalex.org/W2481168506, https://openalex.org/W2893816048, https://openalex.org/W4288084846, https://openalex.org/W3168747143, https://openalex.org/W2237675924, https://openalex.org/W2315867670, https://openalex.org/W1968795594, https://openalex.org/W4256621282, https://openalex.org/W2755432716, https://openalex.org/W1605170656 |
| cited_by_count | 7 |
| counts_by_year[0].year | 2016 |
| counts_by_year[0].cited_by_count | 3 |
| counts_by_year[1].year | 2015 |
| counts_by_year[1].cited_by_count | 4 |
| locations_count | 1 |
| best_oa_location.id | doi:10.1117/1.jmm.14.1.013502 |
| best_oa_location.is_oa | True |
| best_oa_location.source.id | https://openalex.org/S205064806 |
| best_oa_location.source.issn | 1932-5134, 1932-5150 |
| best_oa_location.source.type | journal |
| best_oa_location.source.is_oa | False |
| best_oa_location.source.issn_l | 1932-5134 |
| best_oa_location.source.is_core | True |
| best_oa_location.source.is_in_doaj | False |
| best_oa_location.source.display_name | Journal of Micro/Nanolithography MEMS and MOEMS |
| best_oa_location.source.host_organization | https://openalex.org/P4310315543 |
| best_oa_location.source.host_organization_name | SPIE |
| best_oa_location.source.host_organization_lineage | https://openalex.org/P4310315543 |
| best_oa_location.source.host_organization_lineage_names | SPIE |
| best_oa_location.license | cc-by |
| best_oa_location.pdf_url | https://www.spiedigitallibrary.org/journals/journal-of-micro-nanolithography-mems-and-moems/volume-14/issue-1/013502/Phase-defect-detection-signal-analysis--dependence-of-defect-size/10.1117/1.JMM.14.1.013502.pdf |
| best_oa_location.version | publishedVersion |
| best_oa_location.raw_type | journal-article |
| best_oa_location.license_id | https://openalex.org/licenses/cc-by |
| best_oa_location.is_accepted | True |
| best_oa_location.is_published | True |
| best_oa_location.raw_source_name | Journal of Micro/Nanolithography, MEMS, and MOEMS |
| best_oa_location.landing_page_url | https://doi.org/10.1117/1.jmm.14.1.013502 |
| primary_location.id | doi:10.1117/1.jmm.14.1.013502 |
| primary_location.is_oa | True |
| primary_location.source.id | https://openalex.org/S205064806 |
| primary_location.source.issn | 1932-5134, 1932-5150 |
| primary_location.source.type | journal |
| primary_location.source.is_oa | False |
| primary_location.source.issn_l | 1932-5134 |
| primary_location.source.is_core | True |
| primary_location.source.is_in_doaj | False |
| primary_location.source.display_name | Journal of Micro/Nanolithography MEMS and MOEMS |
| primary_location.source.host_organization | https://openalex.org/P4310315543 |
| primary_location.source.host_organization_name | SPIE |
| primary_location.source.host_organization_lineage | https://openalex.org/P4310315543 |
| primary_location.source.host_organization_lineage_names | SPIE |
| primary_location.license | cc-by |
| primary_location.pdf_url | https://www.spiedigitallibrary.org/journals/journal-of-micro-nanolithography-mems-and-moems/volume-14/issue-1/013502/Phase-defect-detection-signal-analysis--dependence-of-defect-size/10.1117/1.JMM.14.1.013502.pdf |
| primary_location.version | publishedVersion |
| primary_location.raw_type | journal-article |
| primary_location.license_id | https://openalex.org/licenses/cc-by |
| primary_location.is_accepted | True |
| primary_location.is_published | True |
| primary_location.raw_source_name | Journal of Micro/Nanolithography, MEMS, and MOEMS |
| primary_location.landing_page_url | https://doi.org/10.1117/1.jmm.14.1.013502 |
| publication_date | 2015-01-22 |
| publication_year | 2015 |
| referenced_works | https://openalex.org/W1967317167, https://openalex.org/W2161718226, https://openalex.org/W2084230486, https://openalex.org/W2069049618, https://openalex.org/W2002593357, https://openalex.org/W2033905642, https://openalex.org/W2068559752, https://openalex.org/W1974233575, https://openalex.org/W2022106185, https://openalex.org/W1973897902, https://openalex.org/W1967214424, https://openalex.org/W2073915350, https://openalex.org/W4233904890, https://openalex.org/W2079464821, https://openalex.org/W2028565644, https://openalex.org/W2079490078, https://openalex.org/W2039257975, https://openalex.org/W2063478049, https://openalex.org/W2048250119, https://openalex.org/W2047514005, https://openalex.org/W2012806708, https://openalex.org/W2001553530, https://openalex.org/W2026466092, https://openalex.org/W2007058108, https://openalex.org/W2009433659, https://openalex.org/W2042470598, https://openalex.org/W2055984483, https://openalex.org/W1990904913, https://openalex.org/W1970165637, https://openalex.org/W2003625007 |
| referenced_works_count | 30 |
| abstract_inverted_index.A | 83 |
| abstract_inverted_index.a | 30, 91, 103, 147, 180 |
| abstract_inverted_index.As | 102 |
| abstract_inverted_index.In | 155 |
| abstract_inverted_index.an | 75, 100, 165 |
| abstract_inverted_index.by | 20 |
| abstract_inverted_index.in | 12, 47, 138 |
| abstract_inverted_index.is | 25, 136 |
| abstract_inverted_index.of | 2, 7, 38, 53, 63, 107, 121, 132, 159 |
| abstract_inverted_index.on | 17, 34, 68 |
| abstract_inverted_index.or | 5 |
| abstract_inverted_index.to | 112, 140 |
| abstract_inverted_index.DSI | 178 |
| abstract_inverted_index.SPM | 59 |
| abstract_inverted_index.The | 0, 177 |
| abstract_inverted_index.and | 60, 90, 152 |
| abstract_inverted_index.due | 111 |
| abstract_inverted_index.few | 31 |
| abstract_inverted_index.the | 3, 8, 13, 35, 39, 50, 54, 61, 64, 105, 108, 113, 122, 130, 142, 157, 172, 184 |
| abstract_inverted_index.was | 88, 97, 116 |
| abstract_inverted_index.DSIs | 174 |
| abstract_inverted_index.SPM. | 101 |
| abstract_inverted_index.This | 125 |
| abstract_inverted_index.been | 44 |
| abstract_inverted_index.each | 133 |
| abstract_inverted_index.from | 170 |
| abstract_inverted_index.have | 43 |
| abstract_inverted_index.mask | 16, 87 |
| abstract_inverted_index.much | 117 |
| abstract_inverted_index.only | 29 |
| abstract_inverted_index.size | 4, 42, 93 |
| abstract_inverted_index.test | 96 |
| abstract_inverted_index.than | 119 |
| abstract_inverted_index.that | 120, 128 |
| abstract_inverted_index.this | 48 |
| abstract_inverted_index.tool | 80, 151, 169 |
| abstract_inverted_index.well | 26 |
| abstract_inverted_index.were | 81, 162, 175 |
| abstract_inverted_index.with | 183 |
| abstract_inverted_index.(DSI) | 73 |
| abstract_inverted_index.(SPM) | 24 |
| abstract_inverted_index.order | 139 |
| abstract_inverted_index.phase | 9, 40, 55, 85, 134, 148, 160 |
| abstract_inverted_index.probe | 22 |
| abstract_inverted_index.using | 58, 74, 99, 146, 164 |
| abstract_inverted_index.wafer | 18, 153 |
| abstract_inverted_index.which | 171 |
| abstract_inverted_index.yield | 145 |
| abstract_inverted_index.defect | 10, 41, 56, 65, 69, 78, 86, 92, 135, 143, 149, 173, 185 |
| abstract_inverted_index.direct | 181 |
| abstract_inverted_index.images | 158 |
| abstract_inverted_index.result | 126 |
| abstract_inverted_index.showed | 179 |
| abstract_inverted_index.signal | 71 |
| abstract_inverted_index.study, | 49 |
| abstract_inverted_index.volume | 6, 57, 66, 110, 131 |
| abstract_inverted_index.defects | 161 |
| abstract_inverted_index.extreme | 14 |
| abstract_inverted_index.result, | 104 |
| abstract_inverted_index.results | 33 |
| abstract_inverted_index.smaller | 118 |
| abstract_inverted_index.volume. | 186 |
| abstract_inverted_index.However, | 28 |
| abstract_inverted_index.accuracy | 37 |
| abstract_inverted_index.captured | 163 |
| abstract_inverted_index.embedded | 11 |
| abstract_inverted_index.evaluate | 141 |
| abstract_inverted_index.measured | 109 |
| abstract_inverted_index.scanning | 21 |
| abstract_inverted_index.studied. | 27 |
| abstract_inverted_index.addition, | 156 |
| abstract_inverted_index.conducted | 98 |
| abstract_inverted_index.detection | 70, 144 |
| abstract_inverted_index.examined. | 82 |
| abstract_inverted_index.indicates | 127 |
| abstract_inverted_index.influence | 1, 62 |
| abstract_inverted_index.intensity | 72 |
| abstract_inverted_index.measuring | 129 |
| abstract_inverted_index.necessary | 137 |
| abstract_inverted_index.prepared, | 89 |
| abstract_inverted_index.reported. | 45 |
| abstract_inverted_index.variation | 106 |
| abstract_inverted_index.Therefore, | 46 |
| abstract_inverted_index.dark-field | 77, 167 |
| abstract_inverted_index.inspection | 79, 150, 168 |
| abstract_inverted_index.microscope | 23 |
| abstract_inverted_index.programmed | 84 |
| abstract_inverted_index.variation. | 124 |
| abstract_inverted_index.calculated. | 176 |
| abstract_inverted_index.correlation | 182 |
| abstract_inverted_index.measurement | 36, 51, 94, 114 |
| abstract_inverted_index.ultraviolet | 15 |
| abstract_inverted_index.distribution | 67 |
| abstract_inverted_index.experimental | 32 |
| abstract_inverted_index.printability | 19 |
| abstract_inverted_index.at-wavelength | 76, 166 |
| abstract_inverted_index.printability. | 154 |
| abstract_inverted_index.repeatability | 52, 95, 115 |
| abstract_inverted_index.defect-to-defect | 123 |
| cited_by_percentile_year.max | 98 |
| cited_by_percentile_year.min | 96 |
| countries_distinct_count | 1 |
| institutions_distinct_count | 3 |
| citation_normalized_percentile.value | 0.84069323 |
| citation_normalized_percentile.is_in_top_1_percent | False |
| citation_normalized_percentile.is_in_top_10_percent | False |