Plasma Etching of Ti6al4v at Atmospheric Pressure Using a Fluorine Based Etchant Article Swipe
Alex Bishop
,
Z. Huang
,
Claudiu Giusca
,
Adam Bennett
,
Marco Castelli
,
Tian Long See
·
YOU?
·
· 2023
· Open Access
·
· DOI: https://doi.org/10.2139/ssrn.4343386
YOU?
·
· 2023
· Open Access
·
· DOI: https://doi.org/10.2139/ssrn.4343386
Related Topics
Concepts
Metadata
- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.2139/ssrn.4343386
- OA Status
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- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W4320016126
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
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https://openalex.org/W4320016126Canonical identifier for this work in OpenAlex
- DOI
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https://doi.org/10.2139/ssrn.4343386Digital Object Identifier
- Title
-
Plasma Etching of Ti6al4v at Atmospheric Pressure Using a Fluorine Based EtchantWork title
- Type
-
articleOpenAlex work type
- Language
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enPrimary language
- Publication year
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2023Year of publication
- Publication date
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2023-01-01Full publication date if available
- Authors
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Alex Bishop, Z. Huang, Claudiu Giusca, Adam Bennett, Marco Castelli, Tian Long SeeList of authors in order
- Landing page
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https://doi.org/10.2139/ssrn.4343386Publisher landing page
- Open access
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YesWhether a free full text is available
- OA status
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greenOpen access status per OpenAlex
- OA URL
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https://doi.org/10.2139/ssrn.4343386Direct OA link when available
- Concepts
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Atmospheric pressure, Etching (microfabrication), Atmospheric-pressure plasma, Fluorine, Plasma, Materials science, Analytical Chemistry (journal), Metallurgy, Composite material, Chemical engineering, Chemistry, Environmental chemistry, Nuclear physics, Physics, Engineering, Meteorology, Layer (electronics)Top concepts (fields/topics) attached by OpenAlex
- Cited by
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0Total citation count in OpenAlex
- Related works (count)
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10Other works algorithmically related by OpenAlex
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