Present Status of the PF-ring and PF-AR Operations Article Swipe

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Ryota Takai , Tohru Honda , Yukinori Kobayashi , Shinya Nagahashi ·

YOU? · · 2019 · Open Access · · DOI: https://doi.org/10.18429/jacow-ipac2019-tupgw106

The Photon Factory at KEK has been managing two synchrotron radiation sources, the PF-ring and PF-AR, for over 30 years. Although their operation time has been decreasing in recent years for budget reasons, continuous efforts to improve their performance have been made. In this paper, the operational status of these light sources for FY2018 is described. At the PF-ring, a first-generation undulator was renewed with the beamline components. A vacuum chamber for the new undulator was applied the NEG coating on the inner surface. This is the first attempt in Japanese light sources that the NEG-coated chamber is used for undulators. At the PF-AR, the top-up injection using the direct beam transport line was introduced to the user operation for the first time. Since modification of the beam injector LINAC for enabling simultaneous injection to the four different rings (the PF-ring, PF-AR, SuperKEKB HER and LER) was completed, this top-up operation no longer disturbs the operation of the other three rings. A low-energy operation of the PF-AR was also tested to secure more operation time within the limited budget.

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Computer Science

Chemistry

Organic Chemistry

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Ring (chemistry) Computer science Chemistry Organic chemistry

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Type: article
Language: en
Landing Page: https://doi.org/10.18429/jacow-ipac2019-tupgw106
OA Status: green
References: 3
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DOI: https://doi.org/10.18429/jacow-ipac2019-tupgw106

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Title: Present Status of the PF-ring and PF-AR Operations

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Type: article

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Language: en

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Publication year: 2019

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Publication date: 2019-01-01

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Authors: Ryota Takai, Tohru Honda, Yukinori Kobayashi, Shinya Nagahashi

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Landing page: https://doi.org/10.18429/jacow-ipac2019-tupgw106

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OA status: green

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OA URL: https://doi.org/10.18429/jacow-ipac2019-tupgw106

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Concepts: Ring (chemistry), Computer science, Chemistry, Organic chemistry

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