Self-Align-Gated GaN Field Emitter Arrays Sharpened by a Digital Etching Process Article Swipe
Pao-Chuan Shih
,
Girish Rughoobur
,
Kai Cheng
,
Akintunde I. Akinwande
,
Tomás Palacios
·
YOU?
·
· 2021
· Open Access
·
· DOI: https://doi.org/10.1109/led.2021.3052715
YOU?
·
· 2021
· Open Access
·
· DOI: https://doi.org/10.1109/led.2021.3052715
Department of Defense (DoD)
Related Topics
Concepts
Metadata
- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.1109/led.2021.3052715
- OA Status
- green
- Cited By
- 21
- References
- 33
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W3133658483
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
-
https://openalex.org/W3133658483Canonical identifier for this work in OpenAlex
- DOI
-
https://doi.org/10.1109/led.2021.3052715Digital Object Identifier
- Title
-
Self-Align-Gated GaN Field Emitter Arrays Sharpened by a Digital Etching ProcessWork title
- Type
-
articleOpenAlex work type
- Language
-
enPrimary language
- Publication year
-
2021Year of publication
- Publication date
-
2021-02-24Full publication date if available
- Authors
-
Pao-Chuan Shih, Girish Rughoobur, Kai Cheng, Akintunde I. Akinwande, Tomás PalaciosList of authors in order
- Landing page
-
https://doi.org/10.1109/led.2021.3052715Publisher landing page
- Open access
-
YesWhether a free full text is available
- OA status
-
greenOpen access status per OpenAlex
- OA URL
-
https://hdl.handle.net/1721.1/141929Direct OA link when available
- Concepts
-
Sharpening, Etching (microfabrication), Common emitter, Field (mathematics), Optoelectronics, Gallium nitride, Materials science, Silicon, Nanotechnology, Computer science, Mathematics, Layer (electronics), Pure mathematics, Computer visionTop concepts (fields/topics) attached by OpenAlex
- Cited by
-
21Total citation count in OpenAlex
- Citations by year (recent)
-
2025: 2, 2024: 7, 2023: 4, 2022: 4, 2021: 4Per-year citation counts (last 5 years)
- References (count)
-
33Number of works referenced by this work
- Related works (count)
-
10Other works algorithmically related by OpenAlex
Full payload
| id | https://openalex.org/W3133658483 |
|---|---|
| doi | https://doi.org/10.1109/led.2021.3052715 |
| ids.doi | https://doi.org/10.1109/led.2021.3052715 |
| ids.mag | 3133658483 |
| ids.openalex | https://openalex.org/W3133658483 |
| fwci | 1.74194704 |
| type | article |
| title | Self-Align-Gated GaN Field Emitter Arrays Sharpened by a Digital Etching Process |
| awards[0].id | https://openalex.org/G701794482 |
| awards[0].funder_id | https://openalex.org/F4320338279 |
| awards[0].display_name | |
| awards[0].funder_award_id | FA9550-18-1-0436 |
| awards[0].funder_display_name | Air Force Office of Scientific Research |
| biblio.issue | 3 |
| biblio.volume | 42 |
| biblio.last_page | 425 |
| biblio.first_page | 422 |
| topics[0].id | https://openalex.org/T10472 |
| topics[0].field.id | https://openalex.org/fields/22 |
| topics[0].field.display_name | Engineering |
| topics[0].score | 1.0 |
| topics[0].domain.id | https://openalex.org/domains/3 |
| topics[0].domain.display_name | Physical Sciences |
| topics[0].subfield.id | https://openalex.org/subfields/2208 |
| topics[0].subfield.display_name | Electrical and Electronic Engineering |
| topics[0].display_name | Semiconductor materials and devices |
| topics[1].id | https://openalex.org/T10099 |
| topics[1].field.id | https://openalex.org/fields/31 |
| topics[1].field.display_name | Physics and Astronomy |
| topics[1].score | 0.9998999834060669 |
| topics[1].domain.id | https://openalex.org/domains/3 |
| topics[1].domain.display_name | Physical Sciences |
| topics[1].subfield.id | https://openalex.org/subfields/3104 |
| topics[1].subfield.display_name | Condensed Matter Physics |
| topics[1].display_name | GaN-based semiconductor devices and materials |
| topics[2].id | https://openalex.org/T10558 |
| topics[2].field.id | https://openalex.org/fields/22 |
| topics[2].field.display_name | Engineering |
| topics[2].score | 0.9998999834060669 |
| topics[2].domain.id | https://openalex.org/domains/3 |
| topics[2].domain.display_name | Physical Sciences |
| topics[2].subfield.id | https://openalex.org/subfields/2208 |
| topics[2].subfield.display_name | Electrical and Electronic Engineering |
| topics[2].display_name | Advancements in Semiconductor Devices and Circuit Design |
| funders[0].id | https://openalex.org/F4320338279 |
| funders[0].ror | https://ror.org/011e9bt93 |
| funders[0].display_name | Air Force Office of Scientific Research |
| is_xpac | False |
| apc_list | |
| apc_paid | |
| concepts[0].id | https://openalex.org/C2781137444 |
| concepts[0].level | 2 |
| concepts[0].score | 0.7984417676925659 |
| concepts[0].wikidata | https://www.wikidata.org/wiki/Q237105 |
| concepts[0].display_name | Sharpening |
| concepts[1].id | https://openalex.org/C100460472 |
| concepts[1].level | 3 |
| concepts[1].score | 0.6869144439697266 |
| concepts[1].wikidata | https://www.wikidata.org/wiki/Q2368605 |
| concepts[1].display_name | Etching (microfabrication) |
| concepts[2].id | https://openalex.org/C46918542 |
| concepts[2].level | 2 |
| concepts[2].score | 0.5788329839706421 |
| concepts[2].wikidata | https://www.wikidata.org/wiki/Q1648344 |
| concepts[2].display_name | Common emitter |
| concepts[3].id | https://openalex.org/C9652623 |
| concepts[3].level | 2 |
| concepts[3].score | 0.5761386156082153 |
| concepts[3].wikidata | https://www.wikidata.org/wiki/Q190109 |
| concepts[3].display_name | Field (mathematics) |
| concepts[4].id | https://openalex.org/C49040817 |
| concepts[4].level | 1 |
| concepts[4].score | 0.5466391444206238 |
| concepts[4].wikidata | https://www.wikidata.org/wiki/Q193091 |
| concepts[4].display_name | Optoelectronics |
| concepts[5].id | https://openalex.org/C2778871202 |
| concepts[5].level | 3 |
| concepts[5].score | 0.47586363554000854 |
| concepts[5].wikidata | https://www.wikidata.org/wiki/Q411713 |
| concepts[5].display_name | Gallium nitride |
| concepts[6].id | https://openalex.org/C192562407 |
| concepts[6].level | 0 |
| concepts[6].score | 0.46717649698257446 |
| concepts[6].wikidata | https://www.wikidata.org/wiki/Q228736 |
| concepts[6].display_name | Materials science |
| concepts[7].id | https://openalex.org/C544956773 |
| concepts[7].level | 2 |
| concepts[7].score | 0.41823694109916687 |
| concepts[7].wikidata | https://www.wikidata.org/wiki/Q670 |
| concepts[7].display_name | Silicon |
| concepts[8].id | https://openalex.org/C171250308 |
| concepts[8].level | 1 |
| concepts[8].score | 0.3510003685951233 |
| concepts[8].wikidata | https://www.wikidata.org/wiki/Q11468 |
| concepts[8].display_name | Nanotechnology |
| concepts[9].id | https://openalex.org/C41008148 |
| concepts[9].level | 0 |
| concepts[9].score | 0.20808008313179016 |
| concepts[9].wikidata | https://www.wikidata.org/wiki/Q21198 |
| concepts[9].display_name | Computer science |
| concepts[10].id | https://openalex.org/C33923547 |
| concepts[10].level | 0 |
| concepts[10].score | 0.07604241371154785 |
| concepts[10].wikidata | https://www.wikidata.org/wiki/Q395 |
| concepts[10].display_name | Mathematics |
| concepts[11].id | https://openalex.org/C2779227376 |
| concepts[11].level | 2 |
| concepts[11].score | 0.0622556209564209 |
| concepts[11].wikidata | https://www.wikidata.org/wiki/Q6505497 |
| concepts[11].display_name | Layer (electronics) |
| concepts[12].id | https://openalex.org/C202444582 |
| concepts[12].level | 1 |
| concepts[12].score | 0.0 |
| concepts[12].wikidata | https://www.wikidata.org/wiki/Q837863 |
| concepts[12].display_name | Pure mathematics |
| concepts[13].id | https://openalex.org/C31972630 |
| concepts[13].level | 1 |
| concepts[13].score | 0.0 |
| concepts[13].wikidata | https://www.wikidata.org/wiki/Q844240 |
| concepts[13].display_name | Computer vision |
| keywords[0].id | https://openalex.org/keywords/sharpening |
| keywords[0].score | 0.7984417676925659 |
| keywords[0].display_name | Sharpening |
| keywords[1].id | https://openalex.org/keywords/etching |
| keywords[1].score | 0.6869144439697266 |
| keywords[1].display_name | Etching (microfabrication) |
| keywords[2].id | https://openalex.org/keywords/common-emitter |
| keywords[2].score | 0.5788329839706421 |
| keywords[2].display_name | Common emitter |
| keywords[3].id | https://openalex.org/keywords/field |
| keywords[3].score | 0.5761386156082153 |
| keywords[3].display_name | Field (mathematics) |
| keywords[4].id | https://openalex.org/keywords/optoelectronics |
| keywords[4].score | 0.5466391444206238 |
| keywords[4].display_name | Optoelectronics |
| keywords[5].id | https://openalex.org/keywords/gallium-nitride |
| keywords[5].score | 0.47586363554000854 |
| keywords[5].display_name | Gallium nitride |
| keywords[6].id | https://openalex.org/keywords/materials-science |
| keywords[6].score | 0.46717649698257446 |
| keywords[6].display_name | Materials science |
| keywords[7].id | https://openalex.org/keywords/silicon |
| keywords[7].score | 0.41823694109916687 |
| keywords[7].display_name | Silicon |
| keywords[8].id | https://openalex.org/keywords/nanotechnology |
| keywords[8].score | 0.3510003685951233 |
| keywords[8].display_name | Nanotechnology |
| keywords[9].id | https://openalex.org/keywords/computer-science |
| keywords[9].score | 0.20808008313179016 |
| keywords[9].display_name | Computer science |
| keywords[10].id | https://openalex.org/keywords/mathematics |
| keywords[10].score | 0.07604241371154785 |
| keywords[10].display_name | Mathematics |
| keywords[11].id | https://openalex.org/keywords/layer |
| keywords[11].score | 0.0622556209564209 |
| keywords[11].display_name | Layer (electronics) |
| language | en |
| locations[0].id | doi:10.1109/led.2021.3052715 |
| locations[0].is_oa | False |
| locations[0].source.id | https://openalex.org/S19887683 |
| locations[0].source.issn | 0741-3106, 1558-0563 |
| locations[0].source.type | journal |
| locations[0].source.is_oa | False |
| locations[0].source.issn_l | 0741-3106 |
| locations[0].source.is_core | True |
| locations[0].source.is_in_doaj | False |
| locations[0].source.display_name | IEEE Electron Device Letters |
| locations[0].source.host_organization | https://openalex.org/P4310319808 |
| locations[0].source.host_organization_name | Institute of Electrical and Electronics Engineers |
| locations[0].source.host_organization_lineage | https://openalex.org/P4310319808 |
| locations[0].source.host_organization_lineage_names | Institute of Electrical and Electronics Engineers |
| locations[0].license | |
| locations[0].pdf_url | |
| locations[0].version | publishedVersion |
| locations[0].raw_type | journal-article |
| locations[0].license_id | |
| locations[0].is_accepted | True |
| locations[0].is_published | True |
| locations[0].raw_source_name | IEEE Electron Device Letters |
| locations[0].landing_page_url | https://doi.org/10.1109/led.2021.3052715 |
| locations[1].id | pmh:oai:dspace.mit.edu:1721.1/141929 |
| locations[1].is_oa | True |
| locations[1].source.id | https://openalex.org/S4306400425 |
| locations[1].source.issn | |
| locations[1].source.type | repository |
| locations[1].source.is_oa | False |
| locations[1].source.issn_l | |
| locations[1].source.is_core | False |
| locations[1].source.is_in_doaj | False |
| locations[1].source.display_name | DSpace@MIT (Massachusetts Institute of Technology) |
| locations[1].source.host_organization | https://openalex.org/I63966007 |
| locations[1].source.host_organization_name | Massachusetts Institute of Technology |
| locations[1].source.host_organization_lineage | https://openalex.org/I63966007 |
| locations[1].license | cc-by-nc-sa |
| locations[1].pdf_url | |
| locations[1].version | submittedVersion |
| locations[1].raw_type | http://purl.org/eprint/type/JournalArticle |
| locations[1].license_id | https://openalex.org/licenses/cc-by-nc-sa |
| locations[1].is_accepted | False |
| locations[1].is_published | False |
| locations[1].raw_source_name | Pao-Chuan Shih |
| locations[1].landing_page_url | https://hdl.handle.net/1721.1/141929 |
| indexed_in | crossref |
| authorships[0].author.id | https://openalex.org/A5040593751 |
| authorships[0].author.orcid | https://orcid.org/0000-0002-9936-1732 |
| authorships[0].author.display_name | Pao-Chuan Shih |
| authorships[0].countries | US |
| authorships[0].affiliations[0].institution_ids | https://openalex.org/I63966007 |
| authorships[0].affiliations[0].raw_affiliation_string | Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA |
| authorships[0].institutions[0].id | https://openalex.org/I63966007 |
| authorships[0].institutions[0].ror | https://ror.org/042nb2s44 |
| authorships[0].institutions[0].type | education |
| authorships[0].institutions[0].lineage | https://openalex.org/I63966007 |
| authorships[0].institutions[0].country_code | US |
| authorships[0].institutions[0].display_name | Massachusetts Institute of Technology |
| authorships[0].author_position | first |
| authorships[0].raw_author_name | Pao-Chuan Shih |
| authorships[0].is_corresponding | False |
| authorships[0].raw_affiliation_strings | Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA |
| authorships[1].author.id | https://openalex.org/A5018574560 |
| authorships[1].author.orcid | |
| authorships[1].author.display_name | Girish Rughoobur |
| authorships[1].countries | US |
| authorships[1].affiliations[0].institution_ids | https://openalex.org/I63966007 |
| authorships[1].affiliations[0].raw_affiliation_string | Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA |
| authorships[1].institutions[0].id | https://openalex.org/I63966007 |
| authorships[1].institutions[0].ror | https://ror.org/042nb2s44 |
| authorships[1].institutions[0].type | education |
| authorships[1].institutions[0].lineage | https://openalex.org/I63966007 |
| authorships[1].institutions[0].country_code | US |
| authorships[1].institutions[0].display_name | Massachusetts Institute of Technology |
| authorships[1].author_position | middle |
| authorships[1].raw_author_name | Girish Rughoobur |
| authorships[1].is_corresponding | False |
| authorships[1].raw_affiliation_strings | Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA |
| authorships[2].author.id | https://openalex.org/A5052444057 |
| authorships[2].author.orcid | https://orcid.org/0000-0001-6303-015X |
| authorships[2].author.display_name | Kai Cheng |
| authorships[2].countries | CN |
| authorships[2].affiliations[0].institution_ids | https://openalex.org/I4210151518 |
| authorships[2].affiliations[0].raw_affiliation_string | Enkris Semiconductor, Inc., Suzhou, China |
| authorships[2].institutions[0].id | https://openalex.org/I4210151518 |
| authorships[2].institutions[0].ror | https://ror.org/04t8pft48 |
| authorships[2].institutions[0].type | company |
| authorships[2].institutions[0].lineage | https://openalex.org/I4210151518 |
| authorships[2].institutions[0].country_code | CN |
| authorships[2].institutions[0].display_name | Nanopolis Suzhou (China) |
| authorships[2].author_position | middle |
| authorships[2].raw_author_name | Kai Cheng |
| authorships[2].is_corresponding | False |
| authorships[2].raw_affiliation_strings | Enkris Semiconductor, Inc., Suzhou, China |
| authorships[3].author.id | https://openalex.org/A5063695026 |
| authorships[3].author.orcid | https://orcid.org/0000-0003-3001-9223 |
| authorships[3].author.display_name | Akintunde I. Akinwande |
| authorships[3].countries | US |
| authorships[3].affiliations[0].institution_ids | https://openalex.org/I63966007 |
| authorships[3].affiliations[0].raw_affiliation_string | Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA |
| authorships[3].institutions[0].id | https://openalex.org/I63966007 |
| authorships[3].institutions[0].ror | https://ror.org/042nb2s44 |
| authorships[3].institutions[0].type | education |
| authorships[3].institutions[0].lineage | https://openalex.org/I63966007 |
| authorships[3].institutions[0].country_code | US |
| authorships[3].institutions[0].display_name | Massachusetts Institute of Technology |
| authorships[3].author_position | middle |
| authorships[3].raw_author_name | Akintunde I. Akinwande |
| authorships[3].is_corresponding | False |
| authorships[3].raw_affiliation_strings | Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA |
| authorships[4].author.id | https://openalex.org/A5024027903 |
| authorships[4].author.orcid | https://orcid.org/0000-0002-2190-563X |
| authorships[4].author.display_name | Tomás Palacios |
| authorships[4].countries | US |
| authorships[4].affiliations[0].institution_ids | https://openalex.org/I63966007 |
| authorships[4].affiliations[0].raw_affiliation_string | Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA |
| authorships[4].institutions[0].id | https://openalex.org/I63966007 |
| authorships[4].institutions[0].ror | https://ror.org/042nb2s44 |
| authorships[4].institutions[0].type | education |
| authorships[4].institutions[0].lineage | https://openalex.org/I63966007 |
| authorships[4].institutions[0].country_code | US |
| authorships[4].institutions[0].display_name | Massachusetts Institute of Technology |
| authorships[4].author_position | last |
| authorships[4].raw_author_name | Tomas Palacios |
| authorships[4].is_corresponding | False |
| authorships[4].raw_affiliation_strings | Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA |
| has_content.pdf | False |
| has_content.grobid_xml | False |
| is_paratext | False |
| open_access.is_oa | True |
| open_access.oa_url | https://hdl.handle.net/1721.1/141929 |
| open_access.oa_status | green |
| open_access.any_repository_has_fulltext | False |
| created_date | 2025-10-10T00:00:00 |
| display_name | Self-Align-Gated GaN Field Emitter Arrays Sharpened by a Digital Etching Process |
| has_fulltext | False |
| is_retracted | False |
| updated_date | 2025-11-06T03:46:38.306776 |
| primary_topic.id | https://openalex.org/T10472 |
| primary_topic.field.id | https://openalex.org/fields/22 |
| primary_topic.field.display_name | Engineering |
| primary_topic.score | 1.0 |
| primary_topic.domain.id | https://openalex.org/domains/3 |
| primary_topic.domain.display_name | Physical Sciences |
| primary_topic.subfield.id | https://openalex.org/subfields/2208 |
| primary_topic.subfield.display_name | Electrical and Electronic Engineering |
| primary_topic.display_name | Semiconductor materials and devices |
| related_works | https://openalex.org/W2329932281, https://openalex.org/W64535957, https://openalex.org/W2043790407, https://openalex.org/W2087564795, https://openalex.org/W2348902545, https://openalex.org/W2321247741, https://openalex.org/W3136545447, https://openalex.org/W4296598175, https://openalex.org/W67974928, https://openalex.org/W4241000903 |
| cited_by_count | 21 |
| counts_by_year[0].year | 2025 |
| counts_by_year[0].cited_by_count | 2 |
| counts_by_year[1].year | 2024 |
| counts_by_year[1].cited_by_count | 7 |
| counts_by_year[2].year | 2023 |
| counts_by_year[2].cited_by_count | 4 |
| counts_by_year[3].year | 2022 |
| counts_by_year[3].cited_by_count | 4 |
| counts_by_year[4].year | 2021 |
| counts_by_year[4].cited_by_count | 4 |
| locations_count | 2 |
| best_oa_location.id | pmh:oai:dspace.mit.edu:1721.1/141929 |
| best_oa_location.is_oa | True |
| best_oa_location.source.id | https://openalex.org/S4306400425 |
| best_oa_location.source.issn | |
| best_oa_location.source.type | repository |
| best_oa_location.source.is_oa | False |
| best_oa_location.source.issn_l | |
| best_oa_location.source.is_core | False |
| best_oa_location.source.is_in_doaj | False |
| best_oa_location.source.display_name | DSpace@MIT (Massachusetts Institute of Technology) |
| best_oa_location.source.host_organization | https://openalex.org/I63966007 |
| best_oa_location.source.host_organization_name | Massachusetts Institute of Technology |
| best_oa_location.source.host_organization_lineage | https://openalex.org/I63966007 |
| best_oa_location.license | cc-by-nc-sa |
| best_oa_location.pdf_url | |
| best_oa_location.version | submittedVersion |
| best_oa_location.raw_type | http://purl.org/eprint/type/JournalArticle |
| best_oa_location.license_id | https://openalex.org/licenses/cc-by-nc-sa |
| best_oa_location.is_accepted | False |
| best_oa_location.is_published | False |
| best_oa_location.raw_source_name | Pao-Chuan Shih |
| best_oa_location.landing_page_url | https://hdl.handle.net/1721.1/141929 |
| primary_location.id | doi:10.1109/led.2021.3052715 |
| primary_location.is_oa | False |
| primary_location.source.id | https://openalex.org/S19887683 |
| primary_location.source.issn | 0741-3106, 1558-0563 |
| primary_location.source.type | journal |
| primary_location.source.is_oa | False |
| primary_location.source.issn_l | 0741-3106 |
| primary_location.source.is_core | True |
| primary_location.source.is_in_doaj | False |
| primary_location.source.display_name | IEEE Electron Device Letters |
| primary_location.source.host_organization | https://openalex.org/P4310319808 |
| primary_location.source.host_organization_name | Institute of Electrical and Electronics Engineers |
| primary_location.source.host_organization_lineage | https://openalex.org/P4310319808 |
| primary_location.source.host_organization_lineage_names | Institute of Electrical and Electronics Engineers |
| primary_location.license | |
| primary_location.pdf_url | |
| primary_location.version | publishedVersion |
| primary_location.raw_type | journal-article |
| primary_location.license_id | |
| primary_location.is_accepted | True |
| primary_location.is_published | True |
| primary_location.raw_source_name | IEEE Electron Device Letters |
| primary_location.landing_page_url | https://doi.org/10.1109/led.2021.3052715 |
| publication_date | 2021-02-24 |
| publication_year | 2021 |
| referenced_works | https://openalex.org/W2970645592, https://openalex.org/W2159364125, https://openalex.org/W1984836445, https://openalex.org/W2050848093, https://openalex.org/W2010571334, https://openalex.org/W2039141775, https://openalex.org/W2530033883, https://openalex.org/W2405078409, https://openalex.org/W2050393855, https://openalex.org/W2018431043, https://openalex.org/W2093715168, https://openalex.org/W2607821572, https://openalex.org/W2004442080, https://openalex.org/W2042659840, https://openalex.org/W2068787064, https://openalex.org/W3003243024, https://openalex.org/W1678527968, https://openalex.org/W3042847638, https://openalex.org/W2560289782, https://openalex.org/W2076000375, https://openalex.org/W2087414359, https://openalex.org/W2210530817, https://openalex.org/W2075779686, https://openalex.org/W2043554827, https://openalex.org/W2925027629, https://openalex.org/W6781776429, https://openalex.org/W2114625227, https://openalex.org/W2894950078, https://openalex.org/W3042000455, https://openalex.org/W2994249272, https://openalex.org/W2974218128, https://openalex.org/W3081079490, https://openalex.org/W3098978371 |
| referenced_works_count | 33 |
| abstract_inverted_index.of | 1 |
| abstract_inverted_index.(DoD) | 3 |
| abstract_inverted_index.Defense | 2 |
| abstract_inverted_index.Department | 0 |
| cited_by_percentile_year.max | 99 |
| cited_by_percentile_year.min | 95 |
| countries_distinct_count | 2 |
| institutions_distinct_count | 5 |
| citation_normalized_percentile.value | 0.8607717 |
| citation_normalized_percentile.is_in_top_1_percent | False |
| citation_normalized_percentile.is_in_top_10_percent | False |