Silicon micromachined high-contrast artificial dielectrics for millimeter-wave transformation optics antennas Article Swipe
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· 2017
· Open Access
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· DOI: https://doi.org/10.1109/apusncursinrsm.2017.8073028
· OA: W2757138028
Transformation optics methods and gradient index electromagnetic structures\nrely upon spatially varied arbitrary permittivity. This, along with recent\ninterest in millimeter-wave lens-based antennas demands high spatial resolution\ndielectric variation. Perforated media have been used to fabricate gradient\nindex structures from microwaves to THz but are often limited in contrast. We\nshow that by employing regular polygon unit-cells (hexagon, square, and\ntriangle) on matched lattices we can realize very high contrast permittivity\nranging from 0.1-1.0 of the background permittivity. Silicon micromachining\n(Bosch process) is performed on high resistivity Silicon wafers to achieve a\nminimum permittivity of 1.25 (10% of Silicon) in the WR28 waveguide band,\nspecifically targeting the proposed 39 GHz 5G communications band. The method\nis valid into the THz band.\n
