Sub-wavelength Lithography of Complex 2D and 3D Nanostructures without Dyes Article Swipe
Raghvendra Pratap Chaudhary
,
Arun Jaiswal
,
Govind Ummethala
,
Suyog Hawal
,
Sumit Saxena
,
Shobha Shukla
·
YOU?
·
· 2016
· Open Access
·
· DOI: https://doi.org/10.48550/arxiv.1609.02495
YOU?
·
· 2016
· Open Access
·
· DOI: https://doi.org/10.48550/arxiv.1609.02495
One-photon or two photon absorption by dye molecules in photopolymers enable direct 2D & 3D lithography of micro/nano structures with high spatial resolution and can be used effectively in fabricating artificially structured nanomaterials. However, the major bottleneck in unleashing the potential of this useful technique is the indispensable usage of dyes that are extremely expensive, highly toxic and usually insoluble in commercially available photopolymers. Here we report a simple, inexpensive and one-step technique for direct-writing of micro/nanostructures, with sub-wavelength resolution at extremely high speeds without using any one photon or two photon absorbing dye. We incorporated large amount (20 weight %) of inexpensive photoinitiator into the photopolymer and utilized its two-photon absorbing property for sub-wavelength patterning. Complex 2D and 3D patterns were fabricated with sub-micron resolution, in commercially available liquid photopolymer to show the impact/versatility of this technique.
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Metadata
- Type
- preprint
- Language
- en
- Landing Page
- http://arxiv.org/abs/1609.02495
- https://arxiv.org/pdf/1609.02495
- OA Status
- green
- References
- 26
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W2519089291
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
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https://openalex.org/W2519089291Canonical identifier for this work in OpenAlex
- DOI
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https://doi.org/10.48550/arxiv.1609.02495Digital Object Identifier
- Title
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Sub-wavelength Lithography of Complex 2D and 3D Nanostructures without DyesWork title
- Type
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preprintOpenAlex work type
- Language
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enPrimary language
- Publication year
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2016Year of publication
- Publication date
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2016-08-24Full publication date if available
- Authors
-
Raghvendra Pratap Chaudhary, Arun Jaiswal, Govind Ummethala, Suyog Hawal, Sumit Saxena, Shobha ShuklaList of authors in order
- Landing page
-
https://arxiv.org/abs/1609.02495Publisher landing page
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https://arxiv.org/pdf/1609.02495Direct link to full text PDF
- Open access
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YesWhether a free full text is available
- OA status
-
greenOpen access status per OpenAlex
- OA URL
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https://arxiv.org/pdf/1609.02495Direct OA link when available
- Concepts
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Lithography, Wavelength, Materials science, Nanotechnology, Nanostructure, Optoelectronics, Extreme ultraviolet lithographyTop concepts (fields/topics) attached by OpenAlex
- Cited by
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0Total citation count in OpenAlex
- References (count)
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26Number of works referenced by this work
- Related works (count)
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10Other works algorithmically related by OpenAlex
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