Surface bonding state of germanium via cyclic dry treatments using plasma of hydrogen iodine and pure oxygen gases Article Swipe

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Hiroto Ishii , Wen-Hsin Chang , Hiroyuki Ishii , Mengnan Ke , Tatsuro Maeda ·

YOU? · · 2022 · Open Access · · DOI: https://doi.org/10.35848/1347-4065/ac4ce0

The effect of HI and O 2 plasma treatments on a Ge surface is studied by X-ray photoelectron spectroscopy. Ge oxide on a Ge surface can be effectively removed at room temperature by remote HI plasma in inductively coupled plasma reactive ion etching system without substrate bias. The re-oxidation of oxide-free HI plasma-treated Ge has been performed sequentially by O 2 plasma. By utilizing HI and O 2 plasma treatment cyclically, we have proved the viability of Ge digital dry etching. Ge digital dry etching by controlling the plasma power and the processing time of HI and O 2 plasma treatments will be the building block for achieving Ge atomic layer etching.

Related Topics

X-Ray Photoelectron Spectroscopy

Etching (Microfabrication)

Plasma (Physics)

Reactive-Ion Etching

Inductively Coupled Plasma

Environmental Chemistry

Concepts

X-ray photoelectron spectroscopy Etching (microfabrication) Plasma Dry etching Reactive-ion etching Inductively coupled plasma Oxide Hydrogen Analytical Chemistry (journal) Chemistry Substrate (aquarium) Plasma processing Germanium Layer (electronics) Plasma cleaning Oxygen Materials science Silicon Chemical engineering Environmental chemistry Quantum mechanics Engineering Organic chemistry Geology Physics Oceanography

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Type: article
Language: en
Landing Page: https://doi.org/10.35848/1347-4065/ac4ce0
PDF: https://iopscience.iop.org/article/10.35848/1347-4065/ac4ce0/pdf
OA Status: bronze
Cited By: 1
References: 33
Related Works: 10
OpenAlex ID: https://openalex.org/W4210339577

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DOI: https://doi.org/10.35848/1347-4065/ac4ce0

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Title: Surface bonding state of germanium via cyclic dry treatments using plasma of hydrogen iodine and pure oxygen gases

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Type: article

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Language: en

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Publication year: 2022

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Publication date: 2022-01-19

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Authors: Hiroto Ishii, Wen-Hsin Chang, Hiroyuki Ishii, Mengnan Ke, Tatsuro Maeda

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Landing page: https://doi.org/10.35848/1347-4065/ac4ce0

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Concepts: X-ray photoelectron spectroscopy, Etching (microfabrication), Plasma, Dry etching, Reactive-ion etching, Inductively coupled plasma, Oxide, Hydrogen, Analytical Chemistry (journal), Chemistry, Substrate (aquarium), Plasma processing, Germanium, Layer (electronics), Plasma cleaning, Oxygen, Materials science, Silicon, Chemical engineering, Environmental chemistry, Quantum mechanics, Engineering, Organic chemistry, Geology, Physics, Oceanography

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Cited by: 1

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