The sintering and dielectric properties modification of Li2MgSiO4 ceramic with Ni2+-ion doping based on calculation and experiment Article Swipe
Rui Peng
,
Hua Su
,
Di An
,
Yongcheng Lu
,
Zhihua Tao
,
Daming Chen
,
Liang Shi
,
Yuanxun Li
·
YOU?
·
· 2019
· Open Access
·
· DOI: https://doi.org/10.1016/j.jmrt.2019.11.061
YOU?
·
· 2019
· Open Access
·
· DOI: https://doi.org/10.1016/j.jmrt.2019.11.061
The microwave dielectric properties and sintering behavior of Li2(Mg1-xNix)SiO4 (x = 0.00–0.10) ceramics were researched with the help of first principle calculation and solid-state reaction experiment. The crystal structure, electron density, and formation energy were obtained through the density functional theory. The X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, and Network Analyzer were used in this study. The substitution of Ni2+-ion to Mg2+-ion could lower the densification temperature from 1250 °C to 1150 °C and improve the microwave dielectric properties of composite ceramics, demonstrated by the result of lattice parameters, bond population, electron density, and microstructure. A peak dielectric property of Li2(Mg1-xNix)SiO4 (x = 0.00-0.10) ceramics was achieved when x = 0.04 (εr = 5.69, Q×f = 28,448 GHz at 16 GHz, τf = −15.3 ppm/ °C) sintered at 1150 °C. Besides, LBBS glass was used as the sintering aid to lower the densification temperature from 1150℃ down to 900℃. The Li2(Mg0.96Ni0.04)SiO4 ceramic with 2 wt% LBBS sintered at 900 °C obtained excellent microwave dielectric properties, εr = 5.89, Q×f = 29,320 GHz (at 16 GHz), τf = −13.8 ppm/°C, and there was no chemical reaction between the composite ceramics and Ag. It’s a promising material for the applications of the millimeter-wave devices in the field of low temperature co-fired ceramics. Keywords: Low dielectric constant, LTCC, Microwave dielectric properties, DFT
Related Topics
Concepts
Metadata
- Type
- article
- Language
- en
- Landing Page
- https://doi.org/10.1016/j.jmrt.2019.11.061
- OA Status
- gold
- Cited By
- 47
- References
- 31
- Related Works
- 10
- OpenAlex ID
- https://openalex.org/W2993408044
All OpenAlex metadata
Raw OpenAlex JSON
- OpenAlex ID
-
https://openalex.org/W2993408044Canonical identifier for this work in OpenAlex
- DOI
-
https://doi.org/10.1016/j.jmrt.2019.11.061Digital Object Identifier
- Title
-
The sintering and dielectric properties modification of Li2MgSiO4 ceramic with Ni2+-ion doping based on calculation and experimentWork title
- Type
-
articleOpenAlex work type
- Language
-
enPrimary language
- Publication year
-
2019Year of publication
- Publication date
-
2019-12-06Full publication date if available
- Authors
-
Rui Peng, Hua Su, Di An, Yongcheng Lu, Zhihua Tao, Daming Chen, Liang Shi, Yuanxun LiList of authors in order
- Landing page
-
https://doi.org/10.1016/j.jmrt.2019.11.061Publisher landing page
- Open access
-
YesWhether a free full text is available
- OA status
-
goldOpen access status per OpenAlex
- OA URL
-
https://doi.org/10.1016/j.jmrt.2019.11.061Direct OA link when available
- Concepts
-
Materials science, Sintering, Ceramic, Dielectric, Microstructure, Scanning electron microscope, Analytical Chemistry (journal), Ion, Doping, Mineralogy, Composite material, Optoelectronics, Physics, Chemistry, Chromatography, Quantum mechanicsTop concepts (fields/topics) attached by OpenAlex
- Cited by
-
47Total citation count in OpenAlex
- Citations by year (recent)
-
2025: 5, 2024: 5, 2023: 5, 2022: 5, 2021: 19Per-year citation counts (last 5 years)
- References (count)
-
31Number of works referenced by this work
- Related works (count)
-
10Other works algorithmically related by OpenAlex
Full payload
| id | https://openalex.org/W2993408044 |
|---|---|
| doi | https://doi.org/10.1016/j.jmrt.2019.11.061 |
| ids.doi | https://doi.org/10.1016/j.jmrt.2019.11.061 |
| ids.mag | 2993408044 |
| ids.openalex | https://openalex.org/W2993408044 |
| fwci | 3.64327592 |
| type | article |
| title | The sintering and dielectric properties modification of Li2MgSiO4 ceramic with Ni2+-ion doping based on calculation and experiment |
| awards[0].id | https://openalex.org/G1847659183 |
| awards[0].funder_id | https://openalex.org/F4320321921 |
| awards[0].display_name | |
| awards[0].funder_award_id | 2016A03031006 |
| awards[0].funder_display_name | Natural Science Foundation of Guangdong Province |
| biblio.issue | 2 |
| biblio.volume | 9 |
| biblio.last_page | 1356 |
| biblio.first_page | 1344 |
| topics[0].id | https://openalex.org/T12155 |
| topics[0].field.id | https://openalex.org/fields/22 |
| topics[0].field.display_name | Engineering |
| topics[0].score | 1.0 |
| topics[0].domain.id | https://openalex.org/domains/3 |
| topics[0].domain.display_name | Physical Sciences |
| topics[0].subfield.id | https://openalex.org/subfields/2208 |
| topics[0].subfield.display_name | Electrical and Electronic Engineering |
| topics[0].display_name | Microwave Dielectric Ceramics Synthesis |
| topics[1].id | https://openalex.org/T10107 |
| topics[1].field.id | https://openalex.org/fields/25 |
| topics[1].field.display_name | Materials Science |
| topics[1].score | 0.996999979019165 |
| topics[1].domain.id | https://openalex.org/domains/3 |
| topics[1].domain.display_name | Physical Sciences |
| topics[1].subfield.id | https://openalex.org/subfields/2505 |
| topics[1].subfield.display_name | Materials Chemistry |
| topics[1].display_name | Ferroelectric and Piezoelectric Materials |
| topics[2].id | https://openalex.org/T10132 |
| topics[2].field.id | https://openalex.org/fields/25 |
| topics[2].field.display_name | Materials Science |
| topics[2].score | 0.9957000017166138 |
| topics[2].domain.id | https://openalex.org/domains/3 |
| topics[2].domain.display_name | Physical Sciences |
| topics[2].subfield.id | https://openalex.org/subfields/2503 |
| topics[2].subfield.display_name | Ceramics and Composites |
| topics[2].display_name | Advanced ceramic materials synthesis |
| funders[0].id | https://openalex.org/F4320321921 |
| funders[0].ror | |
| funders[0].display_name | Natural Science Foundation of Guangdong Province |
| is_xpac | False |
| apc_list.value | 1300 |
| apc_list.currency | USD |
| apc_list.value_usd | 1300 |
| apc_paid.value | 1300 |
| apc_paid.currency | USD |
| apc_paid.value_usd | 1300 |
| concepts[0].id | https://openalex.org/C192562407 |
| concepts[0].level | 0 |
| concepts[0].score | 0.9092442989349365 |
| concepts[0].wikidata | https://www.wikidata.org/wiki/Q228736 |
| concepts[0].display_name | Materials science |
| concepts[1].id | https://openalex.org/C2777581544 |
| concepts[1].level | 2 |
| concepts[1].score | 0.7315542101860046 |
| concepts[1].wikidata | https://www.wikidata.org/wiki/Q844613 |
| concepts[1].display_name | Sintering |
| concepts[2].id | https://openalex.org/C134132462 |
| concepts[2].level | 2 |
| concepts[2].score | 0.7079566717147827 |
| concepts[2].wikidata | https://www.wikidata.org/wiki/Q45621 |
| concepts[2].display_name | Ceramic |
| concepts[3].id | https://openalex.org/C133386390 |
| concepts[3].level | 2 |
| concepts[3].score | 0.6929969787597656 |
| concepts[3].wikidata | https://www.wikidata.org/wiki/Q184996 |
| concepts[3].display_name | Dielectric |
| concepts[4].id | https://openalex.org/C87976508 |
| concepts[4].level | 2 |
| concepts[4].score | 0.6609930396080017 |
| concepts[4].wikidata | https://www.wikidata.org/wiki/Q1498213 |
| concepts[4].display_name | Microstructure |
| concepts[5].id | https://openalex.org/C26771246 |
| concepts[5].level | 2 |
| concepts[5].score | 0.48378321528434753 |
| concepts[5].wikidata | https://www.wikidata.org/wiki/Q321095 |
| concepts[5].display_name | Scanning electron microscope |
| concepts[6].id | https://openalex.org/C113196181 |
| concepts[6].level | 2 |
| concepts[6].score | 0.44962531328201294 |
| concepts[6].wikidata | https://www.wikidata.org/wiki/Q485223 |
| concepts[6].display_name | Analytical Chemistry (journal) |
| concepts[7].id | https://openalex.org/C145148216 |
| concepts[7].level | 2 |
| concepts[7].score | 0.4323776960372925 |
| concepts[7].wikidata | https://www.wikidata.org/wiki/Q36496 |
| concepts[7].display_name | Ion |
| concepts[8].id | https://openalex.org/C57863236 |
| concepts[8].level | 2 |
| concepts[8].score | 0.43224266171455383 |
| concepts[8].wikidata | https://www.wikidata.org/wiki/Q1130571 |
| concepts[8].display_name | Doping |
| concepts[9].id | https://openalex.org/C199289684 |
| concepts[9].level | 1 |
| concepts[9].score | 0.3374568223953247 |
| concepts[9].wikidata | https://www.wikidata.org/wiki/Q83353 |
| concepts[9].display_name | Mineralogy |
| concepts[10].id | https://openalex.org/C159985019 |
| concepts[10].level | 1 |
| concepts[10].score | 0.32753467559814453 |
| concepts[10].wikidata | https://www.wikidata.org/wiki/Q181790 |
| concepts[10].display_name | Composite material |
| concepts[11].id | https://openalex.org/C49040817 |
| concepts[11].level | 1 |
| concepts[11].score | 0.05423519015312195 |
| concepts[11].wikidata | https://www.wikidata.org/wiki/Q193091 |
| concepts[11].display_name | Optoelectronics |
| concepts[12].id | https://openalex.org/C121332964 |
| concepts[12].level | 0 |
| concepts[12].score | 0.0 |
| concepts[12].wikidata | https://www.wikidata.org/wiki/Q413 |
| concepts[12].display_name | Physics |
| concepts[13].id | https://openalex.org/C185592680 |
| concepts[13].level | 0 |
| concepts[13].score | 0.0 |
| concepts[13].wikidata | https://www.wikidata.org/wiki/Q2329 |
| concepts[13].display_name | Chemistry |
| concepts[14].id | https://openalex.org/C43617362 |
| concepts[14].level | 1 |
| concepts[14].score | 0.0 |
| concepts[14].wikidata | https://www.wikidata.org/wiki/Q170050 |
| concepts[14].display_name | Chromatography |
| concepts[15].id | https://openalex.org/C62520636 |
| concepts[15].level | 1 |
| concepts[15].score | 0.0 |
| concepts[15].wikidata | https://www.wikidata.org/wiki/Q944 |
| concepts[15].display_name | Quantum mechanics |
| keywords[0].id | https://openalex.org/keywords/materials-science |
| keywords[0].score | 0.9092442989349365 |
| keywords[0].display_name | Materials science |
| keywords[1].id | https://openalex.org/keywords/sintering |
| keywords[1].score | 0.7315542101860046 |
| keywords[1].display_name | Sintering |
| keywords[2].id | https://openalex.org/keywords/ceramic |
| keywords[2].score | 0.7079566717147827 |
| keywords[2].display_name | Ceramic |
| keywords[3].id | https://openalex.org/keywords/dielectric |
| keywords[3].score | 0.6929969787597656 |
| keywords[3].display_name | Dielectric |
| keywords[4].id | https://openalex.org/keywords/microstructure |
| keywords[4].score | 0.6609930396080017 |
| keywords[4].display_name | Microstructure |
| keywords[5].id | https://openalex.org/keywords/scanning-electron-microscope |
| keywords[5].score | 0.48378321528434753 |
| keywords[5].display_name | Scanning electron microscope |
| keywords[6].id | https://openalex.org/keywords/analytical-chemistry |
| keywords[6].score | 0.44962531328201294 |
| keywords[6].display_name | Analytical Chemistry (journal) |
| keywords[7].id | https://openalex.org/keywords/ion |
| keywords[7].score | 0.4323776960372925 |
| keywords[7].display_name | Ion |
| keywords[8].id | https://openalex.org/keywords/doping |
| keywords[8].score | 0.43224266171455383 |
| keywords[8].display_name | Doping |
| keywords[9].id | https://openalex.org/keywords/mineralogy |
| keywords[9].score | 0.3374568223953247 |
| keywords[9].display_name | Mineralogy |
| keywords[10].id | https://openalex.org/keywords/composite-material |
| keywords[10].score | 0.32753467559814453 |
| keywords[10].display_name | Composite material |
| keywords[11].id | https://openalex.org/keywords/optoelectronics |
| keywords[11].score | 0.05423519015312195 |
| keywords[11].display_name | Optoelectronics |
| language | en |
| locations[0].id | doi:10.1016/j.jmrt.2019.11.061 |
| locations[0].is_oa | True |
| locations[0].source.id | https://openalex.org/S2765010971 |
| locations[0].source.issn | 2214-0697, 2238-7854 |
| locations[0].source.type | journal |
| locations[0].source.is_oa | True |
| locations[0].source.issn_l | 2214-0697 |
| locations[0].source.is_core | True |
| locations[0].source.is_in_doaj | True |
| locations[0].source.display_name | Journal of Materials Research and Technology |
| locations[0].source.host_organization | https://openalex.org/P4310320990 |
| locations[0].source.host_organization_name | Elsevier BV |
| locations[0].source.host_organization_lineage | https://openalex.org/P4310320990 |
| locations[0].source.host_organization_lineage_names | Elsevier BV |
| locations[0].license | cc-by-nc-nd |
| locations[0].pdf_url | |
| locations[0].version | publishedVersion |
| locations[0].raw_type | journal-article |
| locations[0].license_id | https://openalex.org/licenses/cc-by-nc-nd |
| locations[0].is_accepted | True |
| locations[0].is_published | True |
| locations[0].raw_source_name | Journal of Materials Research and Technology |
| locations[0].landing_page_url | https://doi.org/10.1016/j.jmrt.2019.11.061 |
| locations[1].id | pmh:oai:doaj.org/article:58d2dd2e3d99405b892d0d6b0ce55385 |
| locations[1].is_oa | True |
| locations[1].source.id | https://openalex.org/S4306401280 |
| locations[1].source.issn | |
| locations[1].source.type | repository |
| locations[1].source.is_oa | False |
| locations[1].source.issn_l | |
| locations[1].source.is_core | False |
| locations[1].source.is_in_doaj | False |
| locations[1].source.display_name | DOAJ (DOAJ: Directory of Open Access Journals) |
| locations[1].source.host_organization | |
| locations[1].source.host_organization_name | |
| locations[1].license | cc-by-sa |
| locations[1].pdf_url | |
| locations[1].version | submittedVersion |
| locations[1].raw_type | article |
| locations[1].license_id | https://openalex.org/licenses/cc-by-sa |
| locations[1].is_accepted | False |
| locations[1].is_published | False |
| locations[1].raw_source_name | Journal of Materials Research and Technology, Vol 9, Iss 2, Pp 1344-1356 (2020) |
| locations[1].landing_page_url | https://doaj.org/article/58d2dd2e3d99405b892d0d6b0ce55385 |
| indexed_in | crossref, doaj |
| authorships[0].author.id | https://openalex.org/A5066872426 |
| authorships[0].author.orcid | https://orcid.org/0000-0002-9497-7108 |
| authorships[0].author.display_name | Rui Peng |
| authorships[0].countries | CN |
| authorships[0].affiliations[0].institution_ids | https://openalex.org/I150229711, https://openalex.org/I4210124847 |
| authorships[0].affiliations[0].raw_affiliation_string | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[0].institutions[0].id | https://openalex.org/I4210124847 |
| authorships[0].institutions[0].ror | https://ror.org/02k4dcs46 |
| authorships[0].institutions[0].type | facility |
| authorships[0].institutions[0].lineage | https://openalex.org/I4210124847 |
| authorships[0].institutions[0].country_code | CN |
| authorships[0].institutions[0].display_name | National Engineering Research Center of Electromagnetic Radiation Control Materials |
| authorships[0].institutions[1].id | https://openalex.org/I150229711 |
| authorships[0].institutions[1].ror | https://ror.org/04qr3zq92 |
| authorships[0].institutions[1].type | education |
| authorships[0].institutions[1].lineage | https://openalex.org/I150229711 |
| authorships[0].institutions[1].country_code | CN |
| authorships[0].institutions[1].display_name | University of Electronic Science and Technology of China |
| authorships[0].author_position | first |
| authorships[0].raw_author_name | Rui Peng |
| authorships[0].is_corresponding | False |
| authorships[0].raw_affiliation_strings | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[1].author.id | https://openalex.org/A5027922810 |
| authorships[1].author.orcid | https://orcid.org/0000-0002-5823-0808 |
| authorships[1].author.display_name | Hua Su |
| authorships[1].countries | CN |
| authorships[1].affiliations[0].institution_ids | https://openalex.org/I150229711, https://openalex.org/I4210124847 |
| authorships[1].affiliations[0].raw_affiliation_string | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[1].institutions[0].id | https://openalex.org/I4210124847 |
| authorships[1].institutions[0].ror | https://ror.org/02k4dcs46 |
| authorships[1].institutions[0].type | facility |
| authorships[1].institutions[0].lineage | https://openalex.org/I4210124847 |
| authorships[1].institutions[0].country_code | CN |
| authorships[1].institutions[0].display_name | National Engineering Research Center of Electromagnetic Radiation Control Materials |
| authorships[1].institutions[1].id | https://openalex.org/I150229711 |
| authorships[1].institutions[1].ror | https://ror.org/04qr3zq92 |
| authorships[1].institutions[1].type | education |
| authorships[1].institutions[1].lineage | https://openalex.org/I150229711 |
| authorships[1].institutions[1].country_code | CN |
| authorships[1].institutions[1].display_name | University of Electronic Science and Technology of China |
| authorships[1].author_position | middle |
| authorships[1].raw_author_name | Hua Su |
| authorships[1].is_corresponding | False |
| authorships[1].raw_affiliation_strings | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[2].author.id | https://openalex.org/A5012821821 |
| authorships[2].author.orcid | https://orcid.org/0000-0003-3991-1859 |
| authorships[2].author.display_name | Di An |
| authorships[2].countries | CN |
| authorships[2].affiliations[0].institution_ids | https://openalex.org/I20942203 |
| authorships[2].affiliations[0].raw_affiliation_string | School of Materials Science and Engineering, Hainan University, Haikou 570228, China |
| authorships[2].institutions[0].id | https://openalex.org/I20942203 |
| authorships[2].institutions[0].ror | https://ror.org/03q648j11 |
| authorships[2].institutions[0].type | education |
| authorships[2].institutions[0].lineage | https://openalex.org/I20942203 |
| authorships[2].institutions[0].country_code | CN |
| authorships[2].institutions[0].display_name | Hainan University |
| authorships[2].author_position | middle |
| authorships[2].raw_author_name | Di An |
| authorships[2].is_corresponding | False |
| authorships[2].raw_affiliation_strings | School of Materials Science and Engineering, Hainan University, Haikou 570228, China |
| authorships[3].author.id | https://openalex.org/A5025437391 |
| authorships[3].author.orcid | https://orcid.org/0000-0003-1205-5642 |
| authorships[3].author.display_name | Yongcheng Lu |
| authorships[3].countries | CN |
| authorships[3].affiliations[0].institution_ids | https://openalex.org/I150229711, https://openalex.org/I4210124847 |
| authorships[3].affiliations[0].raw_affiliation_string | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[3].institutions[0].id | https://openalex.org/I4210124847 |
| authorships[3].institutions[0].ror | https://ror.org/02k4dcs46 |
| authorships[3].institutions[0].type | facility |
| authorships[3].institutions[0].lineage | https://openalex.org/I4210124847 |
| authorships[3].institutions[0].country_code | CN |
| authorships[3].institutions[0].display_name | National Engineering Research Center of Electromagnetic Radiation Control Materials |
| authorships[3].institutions[1].id | https://openalex.org/I150229711 |
| authorships[3].institutions[1].ror | https://ror.org/04qr3zq92 |
| authorships[3].institutions[1].type | education |
| authorships[3].institutions[1].lineage | https://openalex.org/I150229711 |
| authorships[3].institutions[1].country_code | CN |
| authorships[3].institutions[1].display_name | University of Electronic Science and Technology of China |
| authorships[3].author_position | middle |
| authorships[3].raw_author_name | Yongcheng Lu |
| authorships[3].is_corresponding | False |
| authorships[3].raw_affiliation_strings | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[4].author.id | https://openalex.org/A5038025848 |
| authorships[4].author.orcid | |
| authorships[4].author.display_name | Zhihua Tao |
| authorships[4].countries | CN |
| authorships[4].affiliations[0].institution_ids | https://openalex.org/I150229711, https://openalex.org/I4210124847 |
| authorships[4].affiliations[0].raw_affiliation_string | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[4].institutions[0].id | https://openalex.org/I4210124847 |
| authorships[4].institutions[0].ror | https://ror.org/02k4dcs46 |
| authorships[4].institutions[0].type | facility |
| authorships[4].institutions[0].lineage | https://openalex.org/I4210124847 |
| authorships[4].institutions[0].country_code | CN |
| authorships[4].institutions[0].display_name | National Engineering Research Center of Electromagnetic Radiation Control Materials |
| authorships[4].institutions[1].id | https://openalex.org/I150229711 |
| authorships[4].institutions[1].ror | https://ror.org/04qr3zq92 |
| authorships[4].institutions[1].type | education |
| authorships[4].institutions[1].lineage | https://openalex.org/I150229711 |
| authorships[4].institutions[1].country_code | CN |
| authorships[4].institutions[1].display_name | University of Electronic Science and Technology of China |
| authorships[4].author_position | middle |
| authorships[4].raw_author_name | Zhihua Tao |
| authorships[4].is_corresponding | False |
| authorships[4].raw_affiliation_strings | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[5].author.id | https://openalex.org/A5068159241 |
| authorships[5].author.orcid | https://orcid.org/0000-0001-9450-1145 |
| authorships[5].author.display_name | Daming Chen |
| authorships[5].countries | CN |
| authorships[5].affiliations[0].institution_ids | https://openalex.org/I150229711 |
| authorships[5].affiliations[0].raw_affiliation_string | Institute of Electronic and Information Engineering of UESTC in Guangdong, Dongguan 523000, China |
| authorships[5].institutions[0].id | https://openalex.org/I150229711 |
| authorships[5].institutions[0].ror | https://ror.org/04qr3zq92 |
| authorships[5].institutions[0].type | education |
| authorships[5].institutions[0].lineage | https://openalex.org/I150229711 |
| authorships[5].institutions[0].country_code | CN |
| authorships[5].institutions[0].display_name | University of Electronic Science and Technology of China |
| authorships[5].author_position | middle |
| authorships[5].raw_author_name | Daming Chen |
| authorships[5].is_corresponding | False |
| authorships[5].raw_affiliation_strings | Institute of Electronic and Information Engineering of UESTC in Guangdong, Dongguan 523000, China |
| authorships[6].author.id | https://openalex.org/A5100783250 |
| authorships[6].author.orcid | https://orcid.org/0000-0002-5976-2304 |
| authorships[6].author.display_name | Liang Shi |
| authorships[6].countries | CN |
| authorships[6].affiliations[0].institution_ids | https://openalex.org/I150229711, https://openalex.org/I4210124847 |
| authorships[6].affiliations[0].raw_affiliation_string | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[6].institutions[0].id | https://openalex.org/I4210124847 |
| authorships[6].institutions[0].ror | https://ror.org/02k4dcs46 |
| authorships[6].institutions[0].type | facility |
| authorships[6].institutions[0].lineage | https://openalex.org/I4210124847 |
| authorships[6].institutions[0].country_code | CN |
| authorships[6].institutions[0].display_name | National Engineering Research Center of Electromagnetic Radiation Control Materials |
| authorships[6].institutions[1].id | https://openalex.org/I150229711 |
| authorships[6].institutions[1].ror | https://ror.org/04qr3zq92 |
| authorships[6].institutions[1].type | education |
| authorships[6].institutions[1].lineage | https://openalex.org/I150229711 |
| authorships[6].institutions[1].country_code | CN |
| authorships[6].institutions[1].display_name | University of Electronic Science and Technology of China |
| authorships[6].author_position | middle |
| authorships[6].raw_author_name | Liang Shi |
| authorships[6].is_corresponding | False |
| authorships[6].raw_affiliation_strings | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[7].author.id | https://openalex.org/A5090782921 |
| authorships[7].author.orcid | https://orcid.org/0000-0002-2425-2048 |
| authorships[7].author.display_name | Yuanxun Li |
| authorships[7].countries | CN |
| authorships[7].affiliations[0].institution_ids | https://openalex.org/I150229711, https://openalex.org/I4210124847 |
| authorships[7].affiliations[0].raw_affiliation_string | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| authorships[7].institutions[0].id | https://openalex.org/I4210124847 |
| authorships[7].institutions[0].ror | https://ror.org/02k4dcs46 |
| authorships[7].institutions[0].type | facility |
| authorships[7].institutions[0].lineage | https://openalex.org/I4210124847 |
| authorships[7].institutions[0].country_code | CN |
| authorships[7].institutions[0].display_name | National Engineering Research Center of Electromagnetic Radiation Control Materials |
| authorships[7].institutions[1].id | https://openalex.org/I150229711 |
| authorships[7].institutions[1].ror | https://ror.org/04qr3zq92 |
| authorships[7].institutions[1].type | education |
| authorships[7].institutions[1].lineage | https://openalex.org/I150229711 |
| authorships[7].institutions[1].country_code | CN |
| authorships[7].institutions[1].display_name | University of Electronic Science and Technology of China |
| authorships[7].author_position | last |
| authorships[7].raw_author_name | Yuanxun Li |
| authorships[7].is_corresponding | True |
| authorships[7].raw_affiliation_strings | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
| has_content.pdf | False |
| has_content.grobid_xml | False |
| is_paratext | False |
| open_access.is_oa | True |
| open_access.oa_url | https://doi.org/10.1016/j.jmrt.2019.11.061 |
| open_access.oa_status | gold |
| open_access.any_repository_has_fulltext | False |
| created_date | 2025-10-10T00:00:00 |
| display_name | The sintering and dielectric properties modification of Li2MgSiO4 ceramic with Ni2+-ion doping based on calculation and experiment |
| has_fulltext | False |
| is_retracted | False |
| updated_date | 2025-11-08T23:21:52.890332 |
| primary_topic.id | https://openalex.org/T12155 |
| primary_topic.field.id | https://openalex.org/fields/22 |
| primary_topic.field.display_name | Engineering |
| primary_topic.score | 1.0 |
| primary_topic.domain.id | https://openalex.org/domains/3 |
| primary_topic.domain.display_name | Physical Sciences |
| primary_topic.subfield.id | https://openalex.org/subfields/2208 |
| primary_topic.subfield.display_name | Electrical and Electronic Engineering |
| primary_topic.display_name | Microwave Dielectric Ceramics Synthesis |
| related_works | https://openalex.org/W3146752240, https://openalex.org/W2378086236, https://openalex.org/W2470504773, https://openalex.org/W1839750456, https://openalex.org/W2365145484, https://openalex.org/W1991354250, https://openalex.org/W2383968488, https://openalex.org/W1829125544, https://openalex.org/W1875055084, https://openalex.org/W2376799332 |
| cited_by_count | 47 |
| counts_by_year[0].year | 2025 |
| counts_by_year[0].cited_by_count | 5 |
| counts_by_year[1].year | 2024 |
| counts_by_year[1].cited_by_count | 5 |
| counts_by_year[2].year | 2023 |
| counts_by_year[2].cited_by_count | 5 |
| counts_by_year[3].year | 2022 |
| counts_by_year[3].cited_by_count | 5 |
| counts_by_year[4].year | 2021 |
| counts_by_year[4].cited_by_count | 19 |
| counts_by_year[5].year | 2020 |
| counts_by_year[5].cited_by_count | 8 |
| locations_count | 2 |
| best_oa_location.id | doi:10.1016/j.jmrt.2019.11.061 |
| best_oa_location.is_oa | True |
| best_oa_location.source.id | https://openalex.org/S2765010971 |
| best_oa_location.source.issn | 2214-0697, 2238-7854 |
| best_oa_location.source.type | journal |
| best_oa_location.source.is_oa | True |
| best_oa_location.source.issn_l | 2214-0697 |
| best_oa_location.source.is_core | True |
| best_oa_location.source.is_in_doaj | True |
| best_oa_location.source.display_name | Journal of Materials Research and Technology |
| best_oa_location.source.host_organization | https://openalex.org/P4310320990 |
| best_oa_location.source.host_organization_name | Elsevier BV |
| best_oa_location.source.host_organization_lineage | https://openalex.org/P4310320990 |
| best_oa_location.source.host_organization_lineage_names | Elsevier BV |
| best_oa_location.license | cc-by-nc-nd |
| best_oa_location.pdf_url | |
| best_oa_location.version | publishedVersion |
| best_oa_location.raw_type | journal-article |
| best_oa_location.license_id | https://openalex.org/licenses/cc-by-nc-nd |
| best_oa_location.is_accepted | True |
| best_oa_location.is_published | True |
| best_oa_location.raw_source_name | Journal of Materials Research and Technology |
| best_oa_location.landing_page_url | https://doi.org/10.1016/j.jmrt.2019.11.061 |
| primary_location.id | doi:10.1016/j.jmrt.2019.11.061 |
| primary_location.is_oa | True |
| primary_location.source.id | https://openalex.org/S2765010971 |
| primary_location.source.issn | 2214-0697, 2238-7854 |
| primary_location.source.type | journal |
| primary_location.source.is_oa | True |
| primary_location.source.issn_l | 2214-0697 |
| primary_location.source.is_core | True |
| primary_location.source.is_in_doaj | True |
| primary_location.source.display_name | Journal of Materials Research and Technology |
| primary_location.source.host_organization | https://openalex.org/P4310320990 |
| primary_location.source.host_organization_name | Elsevier BV |
| primary_location.source.host_organization_lineage | https://openalex.org/P4310320990 |
| primary_location.source.host_organization_lineage_names | Elsevier BV |
| primary_location.license | cc-by-nc-nd |
| primary_location.pdf_url | |
| primary_location.version | publishedVersion |
| primary_location.raw_type | journal-article |
| primary_location.license_id | https://openalex.org/licenses/cc-by-nc-nd |
| primary_location.is_accepted | True |
| primary_location.is_published | True |
| primary_location.raw_source_name | Journal of Materials Research and Technology |
| primary_location.landing_page_url | https://doi.org/10.1016/j.jmrt.2019.11.061 |
| publication_date | 2019-12-06 |
| publication_year | 2019 |
| referenced_works | https://openalex.org/W1983684630, https://openalex.org/W1968284435, https://openalex.org/W2750820915, https://openalex.org/W2890049446, https://openalex.org/W2517131731, https://openalex.org/W1994728513, https://openalex.org/W2110538520, https://openalex.org/W2122611249, https://openalex.org/W2145265662, https://openalex.org/W2143110579, https://openalex.org/W6754733336, https://openalex.org/W2904730793, https://openalex.org/W2904777362, https://openalex.org/W1955372033, https://openalex.org/W2106310629, https://openalex.org/W2080308607, https://openalex.org/W1981038488, https://openalex.org/W2087041232, https://openalex.org/W2075770720, https://openalex.org/W2098432400, https://openalex.org/W2523548914, https://openalex.org/W2312846637, https://openalex.org/W2160849410, https://openalex.org/W1980037686, https://openalex.org/W2070317052, https://openalex.org/W2147343221, https://openalex.org/W2038469017, https://openalex.org/W2167590372, https://openalex.org/W2313561330, https://openalex.org/W2894664445, https://openalex.org/W3101405631 |
| referenced_works_count | 31 |
| abstract_inverted_index.2 | 155 |
| abstract_inverted_index.= | 10, 104, 111, 114, 117, 124, 168, 171, 178 |
| abstract_inverted_index.A | 97 |
| abstract_inverted_index.a | 194 |
| abstract_inverted_index.x | 110 |
| abstract_inverted_index.(x | 9, 103 |
| abstract_inverted_index.16 | 121, 175 |
| abstract_inverted_index.as | 137 |
| abstract_inverted_index.at | 120, 129, 159 |
| abstract_inverted_index.by | 85 |
| abstract_inverted_index.in | 55, 204 |
| abstract_inverted_index.no | 184 |
| abstract_inverted_index.of | 7, 18, 60, 81, 88, 101, 200, 207 |
| abstract_inverted_index.to | 62, 72, 141, 149 |
| abstract_inverted_index.(at | 174 |
| abstract_inverted_index.900 | 160 |
| abstract_inverted_index.Ag. | 192 |
| abstract_inverted_index.DFT | 220 |
| abstract_inverted_index.GHz | 119, 173 |
| abstract_inverted_index.Low | 213 |
| abstract_inverted_index.The | 0, 26, 41, 58, 151 |
| abstract_inverted_index.aid | 140 |
| abstract_inverted_index.and | 4, 22, 31, 50, 75, 95, 181, 191 |
| abstract_inverted_index.for | 197 |
| abstract_inverted_index.low | 208 |
| abstract_inverted_index.the | 16, 37, 66, 77, 86, 138, 143, 188, 198, 201, 205 |
| abstract_inverted_index.was | 107, 135, 183 |
| abstract_inverted_index.wt% | 156 |
| abstract_inverted_index.°C | 71, 74, 161 |
| abstract_inverted_index.εr | 167 |
| abstract_inverted_index.τf | 123, 177 |
| abstract_inverted_index.(εr | 113 |
| abstract_inverted_index.0.04 | 112 |
| abstract_inverted_index.1150 | 73, 130 |
| abstract_inverted_index.1250 | 70 |
| abstract_inverted_index.GHz, | 122 |
| abstract_inverted_index.LBBS | 133, 157 |
| abstract_inverted_index.Q×f | 116, 170 |
| abstract_inverted_index.bond | 91 |
| abstract_inverted_index.down | 148 |
| abstract_inverted_index.from | 69, 146 |
| abstract_inverted_index.help | 17 |
| abstract_inverted_index.peak | 98 |
| abstract_inverted_index.ppm/ | 126 |
| abstract_inverted_index.this | 56 |
| abstract_inverted_index.used | 54, 136 |
| abstract_inverted_index.were | 13, 34, 53 |
| abstract_inverted_index.when | 109 |
| abstract_inverted_index.with | 15, 154 |
| abstract_inverted_index.°C) | 127 |
| abstract_inverted_index.°C. | 131 |
| abstract_inverted_index.5.69, | 115 |
| abstract_inverted_index.5.89, | 169 |
| abstract_inverted_index.GHz), | 176 |
| abstract_inverted_index.LTCC, | 216 |
| abstract_inverted_index.X-ray | 42, 48 |
| abstract_inverted_index.could | 64 |
| abstract_inverted_index.field | 206 |
| abstract_inverted_index.first | 19 |
| abstract_inverted_index.glass | 134 |
| abstract_inverted_index.lower | 65, 142 |
| abstract_inverted_index.there | 182 |
| abstract_inverted_index.28,448 | 118 |
| abstract_inverted_index.29,320 | 172 |
| abstract_inverted_index.It’s | 193 |
| abstract_inverted_index.energy | 33 |
| abstract_inverted_index.result | 87 |
| abstract_inverted_index.study. | 57 |
| abstract_inverted_index.1150℃ | 147 |
| abstract_inverted_index.900℃. | 150 |
| abstract_inverted_index.Network | 51 |
| abstract_inverted_index.between | 187 |
| abstract_inverted_index.ceramic | 153 |
| abstract_inverted_index.crystal | 27 |
| abstract_inverted_index.density | 38 |
| abstract_inverted_index.devices | 203 |
| abstract_inverted_index.improve | 76 |
| abstract_inverted_index.lattice | 89 |
| abstract_inverted_index.theory. | 40 |
| abstract_inverted_index.through | 36 |
| abstract_inverted_index.−13.8 | 179 |
| abstract_inverted_index.−15.3 | 125 |
| abstract_inverted_index.Analyzer | 52 |
| abstract_inverted_index.Besides, | 132 |
| abstract_inverted_index.Mg2+-ion | 63 |
| abstract_inverted_index.Ni2+-ion | 61 |
| abstract_inverted_index.achieved | 108 |
| abstract_inverted_index.behavior | 6 |
| abstract_inverted_index.ceramics | 12, 106, 190 |
| abstract_inverted_index.chemical | 185 |
| abstract_inverted_index.co-fired | 210 |
| abstract_inverted_index.density, | 30, 94 |
| abstract_inverted_index.electron | 29, 45, 93 |
| abstract_inverted_index.material | 196 |
| abstract_inverted_index.obtained | 35, 162 |
| abstract_inverted_index.ppm/°C, | 180 |
| abstract_inverted_index.property | 100 |
| abstract_inverted_index.reaction | 24, 186 |
| abstract_inverted_index.scanning | 44 |
| abstract_inverted_index.sintered | 128, 158 |
| abstract_inverted_index.Keywords: | 212 |
| abstract_inverted_index.Microwave | 217 |
| abstract_inverted_index.ceramics, | 83 |
| abstract_inverted_index.ceramics. | 211 |
| abstract_inverted_index.composite | 82, 189 |
| abstract_inverted_index.constant, | 215 |
| abstract_inverted_index.excellent | 163 |
| abstract_inverted_index.formation | 32 |
| abstract_inverted_index.microwave | 1, 78, 164 |
| abstract_inverted_index.principle | 20 |
| abstract_inverted_index.promising | 195 |
| abstract_inverted_index.sintering | 5, 139 |
| abstract_inverted_index.0.00-0.10) | 105 |
| abstract_inverted_index.dielectric | 2, 79, 99, 165, 214, 218 |
| abstract_inverted_index.functional | 39 |
| abstract_inverted_index.properties | 3, 80 |
| abstract_inverted_index.researched | 14 |
| abstract_inverted_index.structure, | 28 |
| abstract_inverted_index.calculation | 21 |
| abstract_inverted_index.experiment. | 25 |
| abstract_inverted_index.microscopy, | 46 |
| abstract_inverted_index.parameters, | 90 |
| abstract_inverted_index.population, | 92 |
| abstract_inverted_index.properties, | 166, 219 |
| abstract_inverted_index.solid-state | 23 |
| abstract_inverted_index.temperature | 68, 145, 209 |
| abstract_inverted_index.0.00–0.10) | 11 |
| abstract_inverted_index.applications | 199 |
| abstract_inverted_index.demonstrated | 84 |
| abstract_inverted_index.diffraction, | 43 |
| abstract_inverted_index.substitution | 59 |
| abstract_inverted_index.densification | 67, 144 |
| abstract_inverted_index.spectroscopy, | 49 |
| abstract_inverted_index.microstructure. | 96 |
| abstract_inverted_index.millimeter-wave | 202 |
| abstract_inverted_index.Li2(Mg1-xNix)SiO4 | 8, 102 |
| abstract_inverted_index.energy-dispersive | 47 |
| abstract_inverted_index.Li2(Mg0.96Ni0.04)SiO4 | 152 |
| cited_by_percentile_year.max | 100 |
| cited_by_percentile_year.min | 97 |
| corresponding_author_ids | https://openalex.org/A5090782921 |
| countries_distinct_count | 1 |
| institutions_distinct_count | 8 |
| corresponding_institution_ids | https://openalex.org/I150229711, https://openalex.org/I4210124847 |
| citation_normalized_percentile.value | 0.94169089 |
| citation_normalized_percentile.is_in_top_1_percent | False |
| citation_normalized_percentile.is_in_top_10_percent | True |