THE SULPHURIC ACID SOLVENT SYSTEM: PART V. SOLUTIONS OF SOME ORGANOSILICON COMPOUNDS Article Swipe
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· 1963
· Open Access
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· DOI: https://doi.org/10.1139/v63-363
· OA: W2049699915
The cryoscopic and conductimetric behavior of solutions of hexamethyldisiloxane, trimethylethoxysilane, dimethyldiethoxysilane, methyltriethoxysilane, and tetraphenylsilane in 100% sulphuric acid has been investigated. The measurements show that stable non-electrolytes such as (CH 3 ) 3 Si·HSO 4 and (CH 3 ) 2 Si(HSO 4 ) 2 are formed from the tri- and di-alkyl compounds. Species such as CH 3 Si(HSO 4 ) 3 , which are presumably formed in the reaction of monoalkyl compounds, and Si(HSO 4 ) 4 , which it is reasonable to suppose is the initial product from the cleavage of tetraphenylsilane, are unstable and polymerize to give polymers containing Si—O—Si bridging groups. No evidence was obtained for the formation of siliconium ions or for the formation of compounds containing silicon with a coordination number greater than four.
