Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography Article Swipe

View

Related Concepts

Resist Materials science Electron-beam lithography Sensitivity (control systems) Lithography Cathode ray Tone (literature) Monte Carlo method Proximity effect (electron beam lithography) Nanotechnology Resolution (logic) Optoelectronics Optics Electron Electronic engineering Computer science Physics Literature Layer (electronics) Mathematics Art Engineering Quantum mechanics Statistics Artificial intelligence

Scott Lewis , Guy A. DeRose , Hayden R. Alty , Matthew S. Hunt , Nathan Lee , James A. Mann , Richard Grindell , Alex Wertheim , Lucia De Rose , Antonio Fernández , C.A. Muryn , George F. S. Whitehead , Grigore A. Timco , Axel Scherer , Richard E. P. Winpenny ·

YOU? · · 2022 · Open Access · · DOI: https://doi.org/10.1002/adfm.202202710 · OA: W4281608291

A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half‐pitch but at the expense of a low sensitivity. To improve sensitivity a 3D Monte Carlo simulation is used that utilizes a secondary and Auger electron generation model. The simulation suggests that the sensitivity can be dramatically improved while maintaining high resolution by incorporating appropriate chemical functionality around the metal–organic core. The new resists designs based on the simulation have the increased sensitivity expected and illustrate the value of the simulation approach.