Anjana Devi
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View article: VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties
VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties Open
Vanadium nitride (VN) is a promising material for many applications, including the electrochemical nitrogen reduction reaction (eNRR). Catalyst nanoengineering enables experimental validation of its predicted eNRR activity, but most VN cat…
View article: Atomic layer deposition of NiO <sub> <i>x</i> </sub> : harnessing the potential of new precursor combinations for photoelectrochemical water oxidation
Atomic layer deposition of NiO <sub> <i>x</i> </sub> : harnessing the potential of new precursor combinations for photoelectrochemical water oxidation Open
This work shows the critical effect of both nickel precursors and oxygen sources on the photoelectrochemical response towards water oxidation of NiO thin films grown by atomic layer deposition.
View article: Low-temperature, high-throughput spatial atomic layer deposition of NiOx nanocrystalline thin films from [Ni(ipki)2]
Low-temperature, high-throughput spatial atomic layer deposition of NiOx nanocrystalline thin films from [Ni(ipki)2] Open
International audience
View article: Functional Nanomaterials Based Electrochemical and Chemiresistive Sensors for Hydrogen Detection: A Review
Functional Nanomaterials Based Electrochemical and Chemiresistive Sensors for Hydrogen Detection: A Review Open
Hydrogen is a lightweight, small molecule that is highly flammable and causes an explosion when exposed to air by >4%. It is a colorless and odorless gas; hence, its physical examination is challenging. Therefore, a reliable detection tool…
View article: BROADBAND ANTENNA SYSTEM FOR ENHANCED SENSITIVITY IN PARTIAL DISCHARGE DETECTION WITHIN HIGH-VOLTAGE INSULATION
BROADBAND ANTENNA SYSTEM FOR ENHANCED SENSITIVITY IN PARTIAL DISCHARGE DETECTION WITHIN HIGH-VOLTAGE INSULATION Open
Partial discharges (PDs) are critical early indicators of insulation degradation in high-voltage (HV) equipment. Reliable detection of PDs is essential to avoid catastrophic failures in power systems. Conventional narrowband antenna system…
View article: High Quality Crystalline VN Thin Films via MOCVD from a New Vanadium Precursor: Linking Growth Chemistry to Functional Catalytic Surfaces
High Quality Crystalline VN Thin Films via MOCVD from a New Vanadium Precursor: Linking Growth Chemistry to Functional Catalytic Surfaces Open
Vanadium nitride (VN) has been identified as a promising material for numerous applications including electrochemical nitrogen reduction reaction (eNRR). For such applications, catalyst nanoengineering will help to experimentally test its …
View article: A Comprehensive Investigation of ESP32 in Enhancing Wi-Fi Range and Traffic Control for Defence Networks
A Comprehensive Investigation of ESP32 in Enhancing Wi-Fi Range and Traffic Control for Defence Networks Open
The study examines ESP32-based static and dynamic load-balancing algorithms to enhance defence networks’ Wi-Fi range and traffic control. This study is essential due to the growing need for dependable and efficient wireless communication i…
View article: Comparison of CT lung findings in RT-PCR positive COVID vaccinated and unvaccinated patients in a tertiary COVID-19 hospital
Comparison of CT lung findings in RT-PCR positive COVID vaccinated and unvaccinated patients in a tertiary COVID-19 hospital Open
Corona Virus Disease 2019 (COVID-19) caused by Severe Acute Respiratory Syndrome Corona Virus 2 (SARS-CoV-2) was initially reported in Wuhan, China. The disease had a rapid outbreak from then and spread to many parts of the world. WHO char…
View article: Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements
Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements Open
High‐quality rare earth element ( R ) based thin films are in demand for applications ranging from (opto)electronics and energy conversion/storage to medical diagnostics, imaging and security technologies. Atomic layer deposition (ALD) off…
View article: Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum
Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum Open
Vapor phase infiltration (VPI) has emerged as a promising tool for fabrication of novel hybrid materials. In the field of polymeric gas separation membranes, a beneficial impact on stability and membrane performance is known for several po…
View article: Cover Feature: Targeting Manganese Amidinate and ß‐Ketoiminate Complexes as Precursors for Mn‐Based Thin Film Deposition (Chem. Eur. J. 45/2024)
Cover Feature: Targeting Manganese Amidinate and ß‐Ketoiminate Complexes as Precursors for Mn‐Based Thin Film Deposition (Chem. Eur. J. 45/2024) Open
While targeting new metalorganic precursors for chemical vapor deposition of Mn-based thin-film materials, the choice of all-nitrogen and mixed oxygen–nitrogen coordinated ligands yielded volatile, reactive and thermally stable Mn precurso…
View article: Targeting Manganese Amidinate and ß‐Ketoiminate Complexes as Precursors for Mn‐Based Thin Film Deposition
Targeting Manganese Amidinate and ß‐Ketoiminate Complexes as Precursors for Mn‐Based Thin Film Deposition Open
With a focus on Mn based organometallic compounds with suitable physico‐chemical properties to serve as precursors for chemical vapor deposition (CVD) and atomic layer deposition (ALD) of Mn‐containing materials, systematic synthetic appro…
View article: A sustainable CVD approach for ZrN as potential catalyst for nitrogen reduction reaction
A sustainable CVD approach for ZrN as potential catalyst for nitrogen reduction reaction Open
In pursuit of developing alternatives for the highly polluting Haber-Bosch process for ammonia synthesis, the electrocatalytic nitrogen reduction reaction (NRR) on transition metal nitrides such as zirconium mononitride (ZrN) has been iden…
View article: Synthesis, Structure, Thermal Properties and Reactivity Studies on Manganese Amidinates and ß-Ketoiminates Supported by DFT: Potential Precursors for Vapor Deposition of Mn-Based Thin Films
Synthesis, Structure, Thermal Properties and Reactivity Studies on Manganese Amidinates and ß-Ketoiminates Supported by DFT: Potential Precursors for Vapor Deposition of Mn-Based Thin Films Open
To identify Mn based organometallic compounds that serve as precursors for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, systematic synthetic approaches with ligand variation, detailed characterization and th…
View article: Self-reducing Precursors for Aluminium Metal Thin Films: Evaluation of Stable Aluminium Hydrides for Vapor Phase Aluminium Deposition
Self-reducing Precursors for Aluminium Metal Thin Films: Evaluation of Stable Aluminium Hydrides for Vapor Phase Aluminium Deposition Open
Thin films of Al as interconnect materials and those of AlN as wide bandgap semiconductor and piezoelectric material are of great interest for microelectronic applications. For the fabrication of these thin films via chemical vapor deposit…
View article: A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction
A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction Open
A versatile CVD process for growing facetted ZrN layers as a potential catalyst for electrochemical reduction of nitrogen to ammonia.
View article: Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition
Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition Open
Aluminium hydride based complexes were synthesized and characterised with the scope of employing them as Al precursors in chemical vapor deposition processes that was suppored by DFT calculations.
View article: PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films
PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films Open
This feature article presents insights concerning the correlation of plasma‐enhanced chemical vapor deposition and plasma‐enhanced atomic layer deposition thin film structures with their barrier or membrane properties. While in principle s…
View article: Ultrafast Surface‐Specific Spectroscopy of Water at a Photoexcited TiO<sub>2</sub> Model Water‐Splitting Photocatalyst
Ultrafast Surface‐Specific Spectroscopy of Water at a Photoexcited TiO<sub>2</sub> Model Water‐Splitting Photocatalyst Open
A critical step in photocatalytic water dissociation is the hole‐mediated oxidation reaction. Molecular‐level insights into the mechanism of this complex reaction under realistic conditions with high temporal resolution are highly desirabl…
View article: PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth
PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth Open
This feature article presents recent results on the analysis of plasma/polymer interactions and the nucleation of ultra‐thin plasma films on polymeric substrates. Because of their high importance for the understanding of such processes, in…
View article: In Pursuit of Next Generation N-Heterocyclic Carbene-Stabilized Copper and Silver Precursors for Metalorganic Chemical Vapor Deposition and Atomic Layer Deposition Processes
In Pursuit of Next Generation N-Heterocyclic Carbene-Stabilized Copper and Silver Precursors for Metalorganic Chemical Vapor Deposition and Atomic Layer Deposition Processes Open
Volatile, reactive, and thermally stable organometallic copper and silver complexes are of significant interest as precursors for the metalorganic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) of ultra-thin metallic f…
View article: Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al <sub>2</sub> O <sub>3</sub> atomic layer deposition
Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al <sub>2</sub> O <sub>3</sub> atomic layer deposition Open
In the present study, the effects of oxygen plasma treatment and subsequent 2 nm thin Al 2 O 3 film deposition by atomic layer deposition on about 30 nm thick hexamethyldisilazane polymer layers are investigated by using a combination of s…
View article: Ultrashort‐Pulsed‐Laser Annealing of Amorphous Atomic‐Layer‐Deposited MoS<sub>2</sub> Films
Ultrashort‐Pulsed‐Laser Annealing of Amorphous Atomic‐Layer‐Deposited MoS<sub>2</sub> Films Open
To implement 2D molybdenum disulfide (MoS 2 ) in the flexible electronic industry, large, uniform, and crystalline films on flexible substrates are needed. Thermal atomic layer deposition (ALD) generates large‐area uniform MoS 2 films at l…
View article: Interplay of Precursor and Plasma for The Deposition of HfO<sub>2</sub> via PEALD: Film Growth and Dielectric Properties
Interplay of Precursor and Plasma for The Deposition of HfO<sub>2</sub> via PEALD: Film Growth and Dielectric Properties Open
HfO 2 thin films are appealing for microelectronic applications such as high‐ κ dielectric layers, memristors, and ferroelectric memory devices. To fulfill the different requirements of each application, the properties of the deposited mat…
View article: Sign Language Recognition and Training Module
Sign Language Recognition and Training Module Open
Recognition of sign language has long been essential to communication between the deaf and non-verbal cultures. From early electric signal-based sign language identification to more recent recognition using machine/deep learning techniques…
View article: PECVD and PEALD on polymer substrates (Part II): Understanding and tuning of barrier and membrane properties of thin films
PECVD and PEALD on polymer substrates (Part II): Understanding and tuning of barrier and membrane properties of thin films Open
This feature article presents insights concerning the correlation of PECVD and PEALD thin film structures with their barrier or membrane properties. While in principle similar precursor gases and processes can be applied, the adjustment of…
View article: PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth
PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth Open
This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups in the field of plasma physics, chemistry, electric as well …
View article: The impact of plasma enhancement on the deposition of carbon‐containing zirconia films by metalorganic chemical vapor deposition
The impact of plasma enhancement on the deposition of carbon‐containing zirconia films by metalorganic chemical vapor deposition Open
Zirconia layers are often used as thermal barriers. In recent years, depositions by chemical vapor deposition methods using a metalorganic precursor (MOCVD) have been primarily investigated. Here, we combine MOCVD with plasma activation ‐ …