Andreas Pflug
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View article: A Coaxial Nozzle Attachment Improving the Homogeneity of the Gas Flow Sputtering
A Coaxial Nozzle Attachment Improving the Homogeneity of the Gas Flow Sputtering Open
The Hollow Cathode Gas Flow Sputtering (GFS) provides special plasma conditions and is of extensive interest as a more affordable alternative to the high vacuum sputtering techniques. In the case of the tubular cathode a circular outlet sy…
View article: Precise control and adjustment of uniformity for optical coatings on 2D and 3D components
Precise control and adjustment of uniformity for optical coatings on 2D and 3D components Open
The uniformity of a PVD coating process is investigated and adjusted in this work. With the help of a digital twin derived from physical modelling of the plasma and gas flow dynamics in the reactor, it is possible to precisely predict and …
View article: Complex refractive indices of Spiro-TTB and C<sub>60</sub> for optical analysis of perovskite silicon tandem solar cells
Complex refractive indices of Spiro-TTB and C<sub>60</sub> for optical analysis of perovskite silicon tandem solar cells Open
Evaporated charge extraction layers from organic molecular materials are vital in perovskite-based solar cells. For opto-electronic device optimization their complex refractive indices must be known for the visible and near infrared wavele…
View article: Understanding the role of energetic particles during the growth of TiO <sub>2</sub> thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental deposition
Understanding the role of energetic particles during the growth of TiO <sub>2</sub> thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental deposition Open
In this paper, a previously established 3D multi-scale simulation chain of plasma deposition process, based on a combination of a direct simulation Monte Carlo (gas phase) algorithm and a kinetic Monte Carlo (kMC) (film growth) code, is im…
View article: Magnetron sputtering: determining scaling relations towards real power discharges using 3D particle-in-cell Monte Carlo models
Magnetron sputtering: determining scaling relations towards real power discharges using 3D particle-in-cell Monte Carlo models Open
Plasma simulation of glow-magnetized discharges with the particle-in-cell Monte Carlo (PICMC) method is constraint to low current densities because of otherwise huge computational requirements. The present work aims to show, how it is neve…
View article: Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals
Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals Open
A study of plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor is presented. Both experimental and numerical approaches are used to investigate thin film growth mechanisms and polymer film properties d…
View article: Correlation of structural and optical properties using virtual materials analysis
Correlation of structural and optical properties using virtual materials analysis Open
Thin film growth of ${\textrm{TiO}}_2$TiO2 by physical vapor deposition processes is simulated in the Virtual Coater framework resulting in virtual thin films. The simulations are carried out for artificial, simplified deposition condition…
View article: Uniformity and wavefront control of optical filters
Uniformity and wavefront control of optical filters Open
The present paper addresses uniformity effects in demanding dielectric optical coatings. The origins of spectral resonant wavefront errors (WFE) induced by non-uniformities in complex dielectric filters are investigated in detail. The coat…
View article: Crystallisation Phenomena of In2O3:H Films
Crystallisation Phenomena of In2O3:H Films Open
The crystallisation of sputter-deposited, amorphous In2O3:H films was investigated. The influence of deposition and crystallisation parameters onto crystallinity and electron hall mobility was explored. Significant precipitation of metalli…
View article: Simulation in thin film technology
Simulation in thin film technology Open
Simulation and modeling find more and more their way into thin film technology. Beside theoretical models for layer design, pre-production design analysis, and real time process control, atomistic simulation techniques gain of importance. …
View article: Multiple scale modeling of Al2O3 thin film growth in an ion beam sputtering process
Multiple scale modeling of Al2O3 thin film growth in an ion beam sputtering process Open
A multiple scale model approach is presented in order to investigate Al2O3 thin film growth in the framework of an existing Ion Beam Sputtering (IBS) coating process. Therefore, several simulation techniques are combined via optimized inte…