Axel Scherer
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View article: Compact Mid‐Infrared Spectrometer Using Continuously Variable Infrared Filter and Microbolometer Array for Simple and Fast Measurement of Molecular Mid‐IR Spectra
Compact Mid‐Infrared Spectrometer Using Continuously Variable Infrared Filter and Microbolometer Array for Simple and Fast Measurement of Molecular Mid‐IR Spectra Open
The mid‐infrared (mid‐IR) region is attractive for spectroscopy because this range has molecular fingerprint information. Existing FTIR‐based systems are limited by their complex optical systems, highlighting the ongoing necessity to advan…
View article: Novel Deposition Method of Crosslinked Polyethylene Thin Film for Low-Refractive-Index Mid-Infrared Optical Coatings
Novel Deposition Method of Crosslinked Polyethylene Thin Film for Low-Refractive-Index Mid-Infrared Optical Coatings Open
Mid-infrared optics require optical coatings composed of high- and low-refractive-index dielectric layers for the design of optical mirrors, filters, and anti-reflection coatings. However, there are not many technologies for depositing a m…
View article: Lateral nanoscale field emission comb for frequency mixing
Lateral nanoscale field emission comb for frequency mixing Open
Nanoscale field emission devices are promising candidates to design high-frequency electronics due to the lack of scattering in the vacuum channel that enables ballistic transport. In-plane devices are relatively easy to fabricate with cur…
View article: Effect of praseodymium coating on electron emission from a nanoscale gold field emitter array
Effect of praseodymium coating on electron emission from a nanoscale gold field emitter array Open
Although field emission devices are inherently robust to high temperature and radiation environments as well as have high switching speeds, their development has been hindered by high voltages that are typically required for their operatio…
View article: Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography
Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography Open
A new class of negative-tone resist materials has been developed for electron beam and extreme ultraviolet lithography. The resist is based on heterometallic rings. From initial electron beam lithography studies, the resist performance dem…
View article: Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography
Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography Open
A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half‐pitch but at the expense of a low sensitivity. To improve …
View article: Suspended Nanoscale Field Emitter Devices for High-Temperature Operation
Suspended Nanoscale Field Emitter Devices for High-Temperature Operation Open
In this work, we demonstrate suspended two- and four-terminal field emission devices for high-temperature operation. The planar structures were fabricated with tungsten on a 200-nm silicon nitride membrane. The insulator in the vicinity of…
View article: Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography
Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography Open
Field-emission devices are promising candidates to replace silicon fin field-effect transistors as next-generation nanoelectronic components. For these devices to be adopted, nanoscale field emitters with nanoscale gaps between them need t…
View article: Design and implementation of the next generation electron beam resists for the production of EUVL photomasks
Design and implementation of the next generation electron beam resists for the production of EUVL photomasks Open
A new class of resist materials has been developed that is based on a family of heterometallic rings. The work is founded on a Monte Carlo simulation that utilizes a secondary and Auger electron generation model to design resist materials …
View article: Practical nanoscale field emission devices for integrated circuits
Practical nanoscale field emission devices for integrated circuits Open
Nanoscale field emission devices promise many advantages over traditional solid-state devices including fast switching speeds, extreme operating temperatures, and radiation hardness. Despite this, practical circuits have long been hampered…
View article: Use of Supramolecular Assemblies as Lithographic Resists
Use of Supramolecular Assemblies as Lithographic Resists Open
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecede…
View article: Silicon-on-insulator-based complementary metal oxide semiconductor integrated optoelectronic platform for biomedical applications
Silicon-on-insulator-based complementary metal oxide semiconductor integrated optoelectronic platform for biomedical applications Open
Microscale optical devices enabled by wireless power harvesting and telemetry facilitate manipulation and testing of localized biological environments (e.g., neural recording and stimulation, targeted delivery to cancer cells). Design of i…
View article: Metawaveguide for Asymmetric Interferometric Light-Light Switching
Metawaveguide for Asymmetric Interferometric Light-Light Switching Open
Light-light switching typically requires strong nonlinearity where intense laser fields route and direct data flows of weak power, leading to a high power consumption that limits its practical use. Here we report an experimental demonstrat…