A. Yu. Devizenko
YOU?
Author Swipe
View article: DIFFUSION PROCESSES IN METAL LAYERS OF Mo/Si MULTILAYER X-RAY MIRRORS DURING DEPOSITION
DIFFUSION PROCESSES IN METAL LAYERS OF Mo/Si MULTILAYER X-RAY MIRRORS DURING DEPOSITION Open
Small-angle reflectometry, X-ray diffractometry and X-ray tensometry (=0.154 nm) were used to study the structure of Mo layers in Mo/Si multilayer X-ray mirrors produced by magnetron sputtering as a function of the Ar pressure in the rang…
View article: <i>X-Ray Calc 3</i>: improved software for simulation and inverse problem solving for X-ray reflectivity
<i>X-Ray Calc 3</i>: improved software for simulation and inverse problem solving for X-ray reflectivity Open
This work introduces X-Ray Calc ( XRC ), an open-source software package designed to simulate X-ray reflectivity (XRR) and address the inverse problem of reconstructing film structures on the basis of measured XRR curves. XRC features a us…
View article: Reflective x-ray masks for x-ray lithography
Reflective x-ray masks for x-ray lithography Open
Application of x-ray multilayers as reflective x-ray masks for x-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect x-rays. The use of grazing geometry allows a pattern design on …
View article: EFFECT OF ARGON WORKING GAS PRESSURE ON MECHANICAL STRESSES IN Mo/Si MULTILAYER X-RAY MIRRORS
EFFECT OF ARGON WORKING GAS PRESSURE ON MECHANICAL STRESSES IN Mo/Si MULTILAYER X-RAY MIRRORS Open
By the method of X-ray tensometry (=0.154 nm), the dependences of residual stresses in Mo/Si multilayer Xray mirrors (MXMs) obtained by direct-current magnetron sputtering were studied as a function of the sputtering Ar pressure in the ra…
View article: Nonbolometric bottleneck in electron-phonon relaxation in ultrathin WSi films
Nonbolometric bottleneck in electron-phonon relaxation in ultrathin WSi films Open
We developed the model of the internal phonon bottleneck to describe the\nenergy exchange between the acoustically soft ultrathin metal film and\nacoustically rigid substrate. Discriminating phonons in the film into two\ngroups, escaping a…
View article: Scandium-silicon Multilayer X-ray Mirrors with CrB2 Barrier LayersScSiCrB
Scandium-silicon Multilayer X-ray Mirrors with CrB2 Barrier LayersScSiCrB Open
Методами рентгенівської дифракції (0,154 нм), просвічувачої електронної мікроскопії поперечних зрізів і рефлектометрії в області екстремального ультрафіолету (41-51 нм) досліджені бар'єрні властивості шарів CrB2 товщиною 0.3-1.3 нм в багат…
View article: Growth and structure of WC/Si multilayer x-ray mirror
Growth and structure of WC/Si multilayer x-ray mirror Open
WC/Si multilayer X-ray mirrors (MXMs) with nominal layers thicknesses of 0.2…30.3 nm (periods: 0.7…38.9 nm) were deposited by direct current magnetron sputtering and studied by X-ray diffraction and cross-sectional transmission electron mi…
View article: Application of Tungsten as a Barrier Layer in Sc/Si Multilayer X-ray Mirrors
Application of Tungsten as a Barrier Layer in Sc/Si Multilayer X-ray Mirrors Open
Методами рентгеновской дифракции (ƛ = 0,154 нм), просвечивающей электронной микроскопии поперечных срезов и рефлектометрии в мягкой рентгеновской области (ƛ = 25-50 нм) исследованы барьерные свойства слоев вольфрама толщиной 0,1-2,1 нм в м…
View article: Reduction of Interface Mixing in Sc/Si Multilayer X-ray Mirrors
Reduction of Interface Mixing in Sc/Si Multilayer X-ray Mirrors Open
By methods of X-ray diffraction in both hard ( 0.154 nm) and soft ( 11.7-50.0 nm) regions an influence of Ar pressure (1.6-2.4 mTorr) on interface mixing in Sc/Si multilayer X-ray mirrors (MXMs) during deposition is studied. Signific…
View article: Determination of a Thickness of Layers of Multilayer Periodic Coatings by a Method of the Rutherford Backscattering
Determination of a Thickness of Layers of Multilayer Periodic Coatings by a Method of the Rutherford Backscattering Open
Методом резерфордовского обратного рассеяния были определены толщины слоёв кобальта и углерода в многослойном периодическом покрытии [Со
View article: Electron-phonon relaxation time in ultrathin tungsten silicon film
Electron-phonon relaxation time in ultrathin tungsten silicon film Open
We developed the model of the internal phonon bottleneck to describe the energy exchange between the acoustically soft ultrathin metal film and acoustically rigid substrate. Discriminating phonons in the film into two groups, escaping and …
View article: Structural and X-Ray—Optical Characteristics of the W/Si Multilayer X-Ray Mirrors
Structural and X-Ray—Optical Characteristics of the W/Si Multilayer X-Ray Mirrors Open
Методами рентгеновской дифракции в жёстком ( 0,154 нм) и мягком (0,8 2,4 нм) диапазонах исследована структура и оптические свойства серии многослойных рентгеновских зеркал (МРЗ) W/Si с систематически изменяющимся периодом в диапаз…