Bernd Bodermann
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View article: Spectroscopic Ellipsometry of Plasmonic Gratings─Ideal Parameters for Sensing and Subpicometer Measurement Uncertainty
Spectroscopic Ellipsometry of Plasmonic Gratings─Ideal Parameters for Sensing and Subpicometer Measurement Uncertainty Open
Gold gratings were measured by spectroscopic ellipsometry in reflection mode and modeled by the finite element method to investigate the capabilities of optical dimensional metrology for plasmonic diffractive structures. The gratings were …
View article: Resolution enhancement methods in optical microscopy for dimensional optical metrology
Resolution enhancement methods in optical microscopy for dimensional optical metrology Open
In this paper, we discuss several enhancement approaches to increase the resolution and sensitivity of optical microscopy as a tool for dimensional nanometrology. Firstly, we discuss a newly developed through-focus microscopy technique pro…
View article: T-matrix representation of optical scattering response: Suggestion for a data format
T-matrix representation of optical scattering response: Suggestion for a data format Open
The transition matrix, frequently abbreviated as T-matrix, contains the complete information in a linear approximation of how a spatially localized object scatters an incident field. The T-matrix is used to study the scattering response of…
View article: Optical and tactile measurements on SiC sample defects
Optical and tactile measurements on SiC sample defects Open
In power electronics, compound semiconductors with large bandgaps, like silicon carbide (SiC), are increasingly being used as material instead of silicon. They have a lot of advantages over silicon but are also intolerant of nanoscale mate…
View article: Investigations on Diamond-NV-Centers as Alternative Labels in STED Microscopy
Investigations on Diamond-NV-Centers as Alternative Labels in STED Microscopy Open
We investigate diamond nitrogen-vacancy (NV) centers as alternative labels in stimulated emission depletion (STED) microscopy. To this end, artificial diamond is used as a substrate and Raman spectroscopy in photoluminescence (PL) mode is …
View article: Imaging Mueller matrix ellipsometry measurements on measuring fields in the micrometre range
Imaging Mueller matrix ellipsometry measurements on measuring fields in the micrometre range Open
An imaging Mueller matrix ellipsometer is used to measure structures in measuring fields in the micrometre range, which are too small for conventional ellipsometry. Line and grid structures are measured and evaluated with the help of numer…
View article: Comparison measurements for hybrid evaluation approaches in optical nanometrology
Comparison measurements for hybrid evaluation approaches in optical nanometrology Open
In the pursuit of closing the gap between nanometrology and nanofabrication, we investigate the use of advanced optical far field methods for sub-wavelength parameter reconstruction. With the goal of establishing a hybrid evaluation scheme…
View article: Modeling of dimensions and sensing properties of gold gratings by spectroscopic ellipsometry and finite element method
Modeling of dimensions and sensing properties of gold gratings by spectroscopic ellipsometry and finite element method Open
Gold gratings were measured by spectroscopic ellipsometry and modeled by the finite element method to investigate the capabilities of optical dimensional metrology for plasmonic diffractive structures. The gratings were prepared by electro…
View article: Optical and Tactile Measurements on SiC Sample Defects - Dataset
Optical and Tactile Measurements on SiC Sample Defects - Dataset Open
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View article: Optical and Tactile Measurements on SiC Sample Defects - Dataset
Optical and Tactile Measurements on SiC Sample Defects - Dataset Open
No description provided.
View article: Measurement of layer thicknesses with an improved optimization method for depolarizing Mueller matrices
Measurement of layer thicknesses with an improved optimization method for depolarizing Mueller matrices Open
Measurement and simulation data of layer thickness standards
View article: Measurement of layer thicknesses with an improved optimization method for depolarizing Mueller matrices
Measurement of layer thicknesses with an improved optimization method for depolarizing Mueller matrices Open
Measurement and simulation data of layer thickness standards
View article: In situ, back-focal-plane-based determination of the numerical apertures in optical microscopes
In situ, back-focal-plane-based determination of the numerical apertures in optical microscopes Open
In this contribution, we present a technique for in situ determination of the numerical apertures (NAs) of optical microscopes using calibrated diffraction gratings. Many commonly practiced procedures use an external setup to determine the…
View article: Mueller Matrix Ellipsometric Approach on the Imaging of Sub-Wavelength Nanostructures
Mueller Matrix Ellipsometric Approach on the Imaging of Sub-Wavelength Nanostructures Open
Conventional spectroscopic ellipsometry is a powerful tool in optical metrology. However, when it comes to the characterization of non-periodic nanostructures or structured fields that are much smaller than the illumination spot size, it i…
View article: Alignment autocollimator-based microscope adjustment and its quality assessment
Alignment autocollimator-based microscope adjustment and its quality assessment Open
We report a custom microscope setup whose mechanical and optical components are adjusted by the means of an alignment autocollimator (AAC). Residual centring and angular misalignments of the components towards the microscope’s optical axis…
View article: Nanoform evaluation approach using Mueller matrix microscopy and machine learning concepts
Nanoform evaluation approach using Mueller matrix microscopy and machine learning concepts Open
We realized an imaging Mueller matrix microscope for nanostructure characterization. For investigations on nanoform characterization via Mueller matrix images, we measured and simulated Mueller matrix images of specially designed nanostruc…
View article: Characterisation of nanowire structures with scatterometric and ellipsometric measurements
Characterisation of nanowire structures with scatterometric and ellipsometric measurements Open
Nanowire structures arranged in a hexagonal lattice are to be characterized in terms of their diameter, height and pitch. A scatterometer and an imaging Mueller matrix ellipsometer, which is a combination of a commercial Mueller matrix ell…
View article: Elementary, my dear Zernike: model order reduction for accelerating optical dimensional microscopy
Elementary, my dear Zernike: model order reduction for accelerating optical dimensional microscopy Open
Dimensional microscopy is an essential tool for non-destructive and fast inspection of manufacturing processes. Standard approaches process only the measured images. By modelling the imaged structure and solving an inverse problem, the unc…
View article: Quasi-bound states in the continuum for deep subwavelength structural information retrieval for DUV nano-optical polarizers
Quasi-bound states in the continuum for deep subwavelength structural information retrieval for DUV nano-optical polarizers Open
We demonstrate the retrieval of deep subwavelength structural information in nano-optical polarizers by scatterometry of quasi-bound states in the continuum (quasi-BICs). To this end, we investigate titanium dioxide wire grid polarizers fo…
View article: Measurement of layer thicknesses with an improved optimization method for depolarizing Mueller matrices
Measurement of layer thicknesses with an improved optimization method for depolarizing Mueller matrices Open
There are some commonly-used optimization techniques for the analysis of measured data in spectroscopic Mueller matrix ellipsometry (MME) used, for example, to calculate the layer thicknesses of samples under test. Concentrating on the met…
View article: Inverted plasmonic lens design for nanometrology applications
Inverted plasmonic lens design for nanometrology applications Open
Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of li…
View article: Imaging Mueller matrix ellipsometry setup for optical nanoform metrology
Imaging Mueller matrix ellipsometry setup for optical nanoform metrology Open
We designed, realized, and characterised an imaging Mueller matrix ellipsometry setup for the pixelwise measurement of the Mueller matrices in microscope images. Our setup is capable of performing measurements in reflection as well as in t…
View article: Characterization progress of a UV-microscope recently implemented at the PTB Nanometer Comparator for uni- and bidirectional measurements
Characterization progress of a UV-microscope recently implemented at the PTB Nanometer Comparator for uni- and bidirectional measurements Open
In this contribution, we emphasize the need for a sophisticated characterization of measurement devices in particular for optical bidirectional measurements. As an example, the ongoing characterization of the UV-microscope at PTB’s linesca…
View article: Some aspects on the uncertainty calculation in Mueller ellipsometry
Some aspects on the uncertainty calculation in Mueller ellipsometry Open
In this paper, we focus on the metrological aspects of spectroscopic Mueller ellipsometry—i.e. on the uncertainty estimation of the measurement results. With the help of simulated Mueller matrices, we demonstrate that the commonly used mer…
View article: An efficient approach to global sensitivity analysis and parameter estimation for line gratings
An efficient approach to global sensitivity analysis and parameter estimation for line gratings Open
Scatterometry is a fast, indirect and nondestructive optical method for the quality control in the production of lithography masks. Geometry parameters of line gratings are obtained from diffracted light intensities by solving an inverse p…
View article: Nano-structured transmissive spectral filter matrix based on guided-mode resonances
Nano-structured transmissive spectral filter matrix based on guided-mode resonances Open
Background In this work, a nanostructured guided-mode resonance filter matrix with high transmission efficiency and narrow bandwidth is demonstrated. The developed nano-filter arrays have various usages, e.g., combined with the CMOS image …
View article: Mueller matrix ellipsometry for enhanced optical form metrology of sub-lambda structures
Mueller matrix ellipsometry for enhanced optical form metrology of sub-lambda structures Open
Accurate metrology of nanostructures gains more and more importance and for efficiency reasons optical methods play a significant role here. Unfortunately, conventional optical microscopy is subject to the well-known resolution limit. The …
View article: Pixel-Wise Multispectral Sensing System Using Nanostructured Filter Matrix for Biomedical Applications
Pixel-Wise Multispectral Sensing System Using Nanostructured Filter Matrix for Biomedical Applications Open
In this work, a novel multispectral sensing system consisting of nanostructured filter matrix and a charge-coupled device (CCD)-based image sensor has been developed to overcome the limitation of the conventional pigment filtered sensors, …
View article: Using DNA origami nanorulers as traceable distance measurement standards and nanoscopic benchmark structures
Using DNA origami nanorulers as traceable distance measurement standards and nanoscopic benchmark structures Open
In recent years, DNA origami nanorulers for superresolution (SR) fluorescence microscopy have been developed from fundamental proof-of-principle experiments to commercially available test structures. The self-assembled nanostructures allow…