Bernhard Y. van der Wel
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View article: Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Gallium Nitride
Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Gallium Nitride Open
This work reports on the successful intrinsic area-selective deposition of GaN films by thermal atomic layer deposition at back-end-of-line compatible temperatures. Using sequential pulses of trimethylgallium and ammonia (NH3) a…
View article: Metallic molybdenum obtained by atomic layer deposition from Mo(CO)6
Metallic molybdenum obtained by atomic layer deposition from Mo(CO)6 Open
A feasibility study was conducted into the atomic layer deposition (ALD) of metallic molybdenum from the molybdenum hexacarbonyl [Mo(CO)6] precursor. Without the use of a coreactant, Mo(CO)6 decarbonylates in a nonself-limiting fashion to …
View article: Low-resistivity molybdenum obtained by atomic layer deposition
Low-resistivity molybdenum obtained by atomic layer deposition Open
A novel atomic layer deposition (ALD) process was developed for low-resistivity molybdenum (Mo) from molybdenum dichloride dioxide (MoCl2O2) and atomic hydrogen (at-H). A wide ALD window of self-limiting growth was observed between 150 and…
View article: Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride
Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride Open
This work demonstrates intrinsic area-selective deposition of AlN films by thermal atomic layer deposition (ALD). Using sequential pulses of trimethylaluminum and NH3 at a substrate temperature of 623 K, polycrystalline AlN was selectively…
View article: Wafer-scale fabrication and modification of silicon nano-pillar arrays for nanoelectronics, nanofluidics and beyond
Wafer-scale fabrication and modification of silicon nano-pillar arrays for nanoelectronics, nanofluidics and beyond Open
We report on the fabrication and modification of a top-down nanofabrication platform for enormous parallel silicon nanowire-based devices. We explain the nanowire formation in detail, using an additive hybrid lithography step, optimising a…