Chao-Hsing Lin
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View article: Preparations of Polyurethane Foam Composite (PUFC) Pads Containing Micro-/Nano-Crystalline Cellulose (MCC/NCC) toward the Chemical Mechanical Polishing Process
Preparations of Polyurethane Foam Composite (PUFC) Pads Containing Micro-/Nano-Crystalline Cellulose (MCC/NCC) toward the Chemical Mechanical Polishing Process Open
Polyurethane foam (PUF) pads are widely used in semiconductor manufacturing, particularly for chemical mechanical polishing (CMP). This study prepares PUF composites with microcrystalline cellulose (MCC) and nanocrystalline cellulose (NCC)…