Explanipedia

H− production in hydrogen DC glow discharge Open

D. V. Lopaev, Yu. A. Mankelevich, A. N. Kropotkin, D. G. Voloshin, Т. В. Рахимова · 2024

Chemistry Physics Computer science

The H − ion dynamics in the positive column of H 2 DC glow discharge was studied by the laser photodetachment technique in a wide range of pressure, 0.1–3 Torr, and current, 1–30 mA, which cover a range of E/N from ∼40 Td up to ∼170 Td. Us…

Oxygen atom and ozone kinetics in the afterglow of a pulse-modulated DC discharge in pure O2: an experimental and modelling study of surface mechanisms and ozone vibrational kinetics Open

Jean‐Paul Booth, Olivier Guaitella, Shu Zhang, D. V. Lopaev, Sergey Zyryanov , et al. · 2023

Chemistry Materials science Physics

The chemical kinetics of oxygen atoms and ozone molecules were investigated in a fully-modulated DC discharge in pure oxygen gas in a borosilicate glass tube, using cavity ringdown spectroscopy (CRDS) of the optically forbidden O( 3 P 2 )→…

Plasma density determination from ion current to cylindrical Langmuir probe with validation on hairpin probe measurements Open

D. G. Voloshin, Т. В. Рахимова, A. N. Kropotkin, I. I. Amirov, M. O. Izyumov , et al. · 2023

Chemistry Physics Materials science

Numerical and analytical approaches to plasma density determination from the ion current to cylindrical Langmuir probe are validated on hairpin probe measurements. An argon inductively coupled plasma discharge in a pressure range from 4.5 …

Dynamics of H atoms surface recombination in low-temperature plasma Open

V. Gubarev, D. V. Lopaev, A I Zotovich, V. V. Medvedev, Pavel Krainov , et al. · 2022

Materials science Chemistry Physics

The dynamics of H atom recombination on materials of interest for a EUV lithographer was studied under a long-term low-pressure H2 plasma exposure. The similarity of the experimental plasma with the typical EUV-induced plasma over the mult…

Quenching of O 2 (b 1 Σ g + ) by O( 3 P) atoms. Effect of gas temperature Open

Jean‐Paul Booth, Abhyuday Chatterjee, Olivier Guaitella, D. V. Lopaev, Sergey Zyryanov , et al. · 2022

Chemistry Physics

We present a detailed study of the density and kinetics of O 2 (b 1 Σ g + ) in steady-state and partially-modulated DC positive column discharges in pure O 2 for gas pressures of 0.3–10 Torr and 10–40 mA current. The time-resolved density …

Study of H, N, and O atom interaction with quasi-two-dimensional molybdenum disulfide Open

D. E. Melezhenko, D. V. Lopaev, A I Zotovich, Е. Н. Воронина · 2022

Materials science Chemistry Physics

The paper presents the results of the experimental study of O, N, and H atom interaction with ultra-thin MoS 2 films demonstrating changes in properties of the surface layer of samples under investigation. Keywords: quasi-two-dimensional m…

‘Virtual IED sensor’ for df rf CCP discharges Open

М. А. Богданова, D. V. Lopaev, Т. В. Рахимова, D. G. Voloshin, A I Zotovich , et al. · 2021

Materials science Chemistry Physics

Ion-assisted surface processes are the basis of modern plasma processing. Ion energy distribution (IED) control is critical for precise material modification, especially in atomic-level technologies such as atomic layer etching. Since this…

Filling the Gaps in Our Understanding of Plasmas in Simple Diatomic Gases- Combining a DC Plasma in Pure O2 with Multiple Advanced Diagnostics for Experimental Validation of Simulations Open

Jean‐Paul Booth, Abhyuday Chatterjee, Olivier Guaitella, D. V. Lopaev, Sergey Zyryanov , et al. · 2021

Materials science Physics Computer science

International audience

Fast quenching of metastable O2(a 1Δ g ) and O2(b 1Σ g +) molecules by O(3P) atoms at high temperature Open

A V Volynets, D. V. Lopaev, Т. В. Рахимова, О. В. Прошина, A. A. Chukalovsky , et al. · 2020

Chemistry Physics

Oxygen molecules in the lowest metastable state, O 2 ( a 1 Δ g ), play an important role in oxygen plasmas due to their high reactivity and significant concentrations. The accumulation of high densities of O 2 ( a 1 Δ g ) occurs due to its…

Determination of absolute O( 3 P) and O 2 (a 1 Δ g ) densities and kinetics in fully modulated O 2 dc glow discharges from the O 2 (X 3 Σ g − ) afterglow recovery dynamics Open

Jean‐Paul Booth, Abhyuday Chatterjee, Olivier Guaitella, J. Santos Sousa, D. V. Lopaev , et al. · 2020

Chemistry Physics

A method is presented for the determination of the absolute densities of O( 3 P) atoms and O 2 (a 1 Δ g ) molecules in an O 2 electrical discharge, which does not depend on any calibration procedure or knowledge of optical transition stren…

Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma Open

Jean‐Paul Booth, Olivier Guaitella, Abhyuday Chatterjee, Cyril Drag, Vasco Guerra , et al. · 2019

Chemistry Materials science Physics

International audience

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models Open

Mikhaı̈l R. Baklanov, V. Jousseaume, Т. В. Рахимова, D. V. Lopaev, Yu. A. Mankelevich , et al. · 2019

Materials science Computer science Chemistry

This paper presents an in-depth overview of the application and impact of UV/VUV light in advanced interconnect technology. UV light application in BEOL historically was mainly motivated by the need to remove organic porogen and generate p…

Plasma-assisted oxide removal from ruthenium-coated EUV optics Open

A. A. Dolgov, Chris Lee, F. Bijkerk, A. A. Abrikosov, V.M. Krivtsun , et al. · 2018

Materials science Chemistry Physics

An experimental study of oxide reduction at the surface of ruthenium layers on top of multilayer mirrors and thin Ru/Si films is presented. Oxidation and reduction processes were observed under conditions close to those relevant for extrem…

Issue Information: Plasma Process. Polym. 3/2018 Open

D. V. Lopaev, Vladislav V. Rakhlinsky, Sergey Zyryanov, Yu. A. Mankelevich, Т. В. Рахимова , et al. · 2018

Computer science Physics

Front Cover: Chloride regulates the sterilization eff ect by plasma depending on the working gas.It potentiates O 2 plasma-induced, but attenuates N 2 and air plasma-induced bacterial inactivation (top-panel fi gures).The potentiation eff …

Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers Open

R.A.J.M. van den Bos, J. Reinink, D. V. Lopaev, Chris Lee, Jos Benschop , et al. · 2018

Materials science Chemistry Philosophy

A Mo/Si multilayer film may blister under hydrogen exposure. In this paper, we investigate the impact of intrinsic stress on blister formation in multilayers by varying the Si thickness between 3.4-11 nm and changing the hydrogen ion expos…

Ion flux and energy virtual sensor for measuring ion flux and energy distribution at a RF biased electrode in ICP reactor (RIE-mode) Open

М. А. Богданова, D. V. Lopaev, Sergey Zyryanov · 2016

Materials science Chemistry Physics

The modern technology of micro- and nanoelectronics involves a great number of steps, such as pattern transfer, where Reactive Ion Etching (RIE) in rf plasma reactors is widely used. To control the etching process, the ion flux and ion ene…

Mechanism of N2dissociation and kinetics of N(4S) atoms in pure nitrogen plasma Open

A V Volynets, D. V. Lopaev, Н. А. Попов · 2016

Chemistry Physics

This work deals with kinetics of the ground state nitrogen atoms N(4S) and N2 dissociation mechanism in pure nitrogen plasma. The experiment was carried out in positive column of DC glow discharge at a range of parameters p = 5 - 50 Torr, …

Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen Open

R M van der Horst, J. Beckers, E A Osorio, Dmitry Astakhov, W. J. Goedheer , et al. · 2016

Physics Materials science

Plasmas induced by EUV radiation are unique since they are created without the need of any discharge. Moreover, it is essential to characterize these plasmas to understand and predict their long term impact on highly delicate optics in EUV…

Plasma probe characteristics in low density hydrogen pulsed plasmas Open

Dmitry Astakhov, W. J. Goedheer, Chris Lee, V. V. Ivanov, V.M. Krivtsun , et al. · 2015

Chemistry Physics

Probe theories are only applicable in the regime where the probe's\nperturbation of the plasma can be neglected. However, it is not always possible\nto know, a priori, that a particular probe theory can be successfully applied,\nespecially…

Numerical and experimental studies of the carbon etching in EUV-induced plasma Open

Dmitry Astakhov, W. J. Goedheer, Chris Lee, V. V. Ivanov, V.M. Krivtsun , et al. · 2015

Materials science Chemistry Physics

We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy r…

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