Daniel Penley
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Process Control for Spatial Atomic Layer Deposition Open
Within the semiconductor industry, interfacial engineering at the nanoscale has been developed to manufacture transistors with feature sizes on the order of single nanometers. As an integral technique for these advances, atomic layer depos…
View article: Lamination of >21% Efficient Perovskite Solar Cells with Independent Process Control of Transport Layers and Interfaces
Lamination of >21% Efficient Perovskite Solar Cells with Independent Process Control of Transport Layers and Interfaces Open
Transport layer and interface optimization is critical for improving the performance and stability of perovskite solar cells (PSCs) but is restricted by the conventional fabrication approach of sequential layer deposition. While the bottom…
Mechatronic Spatial Atomic Layer Deposition for Closed‐Loop and Customizable Process Control Open
A customized atmospheric‐pressure spatial atomic layer deposition (AP‐SALD) system is designed and implemented, which enables mechatronic control of key process parameters, including gap size and parallel alignment. A showerhead depositor …