Eberhard Bär
YOU?
Author Swipe
View article: Process Variability—Technological Challenge and Design Issue for Nanoscale Devices
Process Variability—Technological Challenge and Design Issue for Nanoscale Devices Open
Current advanced transistor architectures, such as FinFETs and (stacked) nanowires and nanosheets, employ truly three-dimensional architectures. Already for aggressively scaled bulk transistors, both statistical and systematic process vari…