Eunwan Cho
YOU?
Author Swipe
View article: Analysis of the negative charges injected into a SiO<sub>2</sub>/SiN<sub>x</sub> stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface
Analysis of the negative charges injected into a SiO<sub>2</sub>/SiN<sub>x</sub> stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface Open
We investigated field‐effect passivation by injecting negative charges into SiO 2 /SiN x stack using a plasma charge injection technique. The Si/SiO 2 /SiN x samples exhibited a very high flat‐band shift with a high injected negative charg…