G. Strof
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View article: Effect of Mask Geometry Variation on Plasma Etching Profiles
Effect of Mask Geometry Variation on Plasma Etching Profiles Open
It is becoming quite evident that, when it comes to the further scaling of advanced node transistors, increasing the flash memory storage capacity, and enabling the on-chip integration of multiple functionalities, “there’s plenty of room a…
View article: DTCO flow for air spacer generation and its impact on power and performance at N7
DTCO flow for air spacer generation and its impact on power and performance at N7 Open
A novel DTCO flow is described with the principal aim to study the impact of air spacer fabrication on the power and performance of a 5-stage inverter ring oscillator at the 7 nm node. The flow incorporates physical and analytical process …
View article: Nano Device Simulator—A Practical Subband-BTE Solver for Path-Finding and DTCO
Nano Device Simulator—A Practical Subband-BTE Solver for Path-Finding and DTCO Open
We present an in-depth discussion on the subband Boltzmann transport (SBTE) methodology, its evolution, and its application to the simulation of nanoscale MOSFETs. The evolution of the method is presented from the point of view of developi…