2025-01-01
P‐GaN/AlGaN/GaN E‐Mode HEMT With Extended MOS Gate
2025-01-01 • Min‐Keun Lee, G. Atmaca, Myeongsu Chae, Hyungtak Kim, Hyun‐Seop Kim, Ho‐Young Cha
ABSTRACT In this study, we propose a p‐GaN/AlGaN/GaN high‐electron mobility transistor (HEMT) featuring an extended metal‐oxide‐semiconductor (MOS) gate structure to enhance device performance. The extended MOS gate, located over the p‐GaN region and extending toward the drain side, increases current density while maintaining high breakdown voltage. By applying a positive bias to the extended MOS gate, the two‐dimensional electron gas density beneath the gate is enhanced, resulting in a higher drain current and lo…