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View article: Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions
Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions Open
Ruthenium (Ru) is a noble metal and is known to be resistant to many common chemicals and mixtures. We report in this study a controlled etching/recessing of Ru via wet processing and a combination of dry and wet process using metal-free c…
View article: Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography Open
Tellurium (Te) is one of the elements with highest extinction coefficient κ at the 13.5 nm extreme-ultraviolet (EUV) wavelength. It is being considered as an alternative absorber material for binary photomasks in EUV lithography. The absor…
View article: Scaled-Down c-Si and c-SiGe Wagon-Wheels for the Visualization of the Anisotropy and Selectivity of Wet-Chemical Etchants
Scaled-Down c-Si and c-SiGe Wagon-Wheels for the Visualization of the Anisotropy and Selectivity of Wet-Chemical Etchants Open
Wet etching offers an advantage as a soft, damage-less method to remove sacrificial material with close to nanometer precision which has become critical for the fabrication of nanoscale structures. In order to develop such wet etching solu…