Kyungbae Kwon
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View article: Investigation on the Effects of Interconnect RC in 3nm Technology Node Using Path-Finding Process Design Kit
Investigation on the Effects of Interconnect RC in 3nm Technology Node Using Path-Finding Process Design Kit Open
With the continuous development of front-end-of-line (FEOL) technology, the development of interconnection processes at nanoscale process nodes is becoming important. We conducted a post-layout circuit simulation to consider the effect of …