P. T. Lai
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View article: One‐Dimensional Hydrogen Chains in Li–Hf–H System: A Pathway to High Superconductivity Under High Pressure
One‐Dimensional Hydrogen Chains in Li–Hf–H System: A Pathway to High Superconductivity Under High Pressure Open
The recent discovery of high‐critical‐temperature (high‐ T c ) superconductivity in hydrides such as H 3 S and LaH 10 has significantly advanced the quest for room‐temperature superconductors. This work reports a new class of high‐ T c hyd…
View article: Remote Phonon Scattering in InGaZnO Thin-Film Transistor with Double-Layered High-κ Gate Dielectric
Remote Phonon Scattering in InGaZnO Thin-Film Transistor with Double-Layered High-κ Gate Dielectric Open
View article: Nd<sub><i>x</i></sub>Hf<sub>(1−<i>x</i>)</sub>ON as Gate Dielectric for High‐Performance Pentacene Organic Thin‐Film Transistors
Nd<sub><i>x</i></sub>Hf<sub>(1−<i>x</i>)</sub>ON as Gate Dielectric for High‐Performance Pentacene Organic Thin‐Film Transistors Open
NdON, HfON, and their mixtures (Nd x Hf (1− x ) ON) with different Hf contents are adopted as the gate dielectrics of pentacene organic thin‐film transistors (OTFTs). Their capacitance–voltage characteristics reveal that the Hf incorporati…
View article: Effect of dopant redistribution in gate electrode on surface plasmon resonance in InGaZnO thin-film transistors
Effect of dopant redistribution in gate electrode on surface plasmon resonance in InGaZnO thin-film transistors Open
To study the effect of dopant redistribution at/near the gate-dielectric/gate-electrode interface during high-temperature processing on surface plasmon resonance in InGaZnO thin-film transistor, boron-doped Si wafers (resistivity = 0.02–0.…
View article: Low-Temperature-Processed High-Performance Pentacene OTFTs with Optimal Nd-Ti Oxynitride Mixture as Gate Dielectric
Low-Temperature-Processed High-Performance Pentacene OTFTs with Optimal Nd-Ti Oxynitride Mixture as Gate Dielectric Open
When processed at a low temperature of 200 °C, organic thin-film transistors (OTFTs) with pentacene channel adopting high-k Neodymium-Titanium oxynitride mixtures (NdTiON) with various Ti contents as gate dielectrics are fabricated. The Ti…
View article: A Method for Thermal Resistance Test of Reverse-Conducting IGBT (RC-IGBT)
A Method for Thermal Resistance Test of Reverse-Conducting IGBT (RC-IGBT) Open
The RC-IGBT is integrated IGBT and fast recovery diode (FRD) on the same chip. RC-IGBT has smaller size, higher power density, lower cost, and higher reliability. However, due to the snap-back effect, the traditional test circuit and metho…
View article: Gate Failure Behavior and Mechanism of AlGaN/GaN HEMTs Under Transmission Line Pulsed Stress
Gate Failure Behavior and Mechanism of AlGaN/GaN HEMTs Under Transmission Line Pulsed Stress Open
The failure behavior and the corresponding physical mechanism of the AlGaN/GaN high electron mobility transistors (HEMTs) under transmission line pulse (TLP) stress were investigated in this paper. The result shows that the output and tran…
View article: Simulation Study of 4H-SiC High-k Pillar MOSFET With Integrated Schottky Barrier Diode
Simulation Study of 4H-SiC High-k Pillar MOSFET With Integrated Schottky Barrier Diode Open
A SiC high-k (HK) split-gate (SG) MOSFET is proposed with a Schottky barrier diode (SBD) integrated between the split gates, and is investigated by numerical TCAD simulation. Results show that it has the same breakdown voltage as the SiC h…
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View article: Two-Photon Fluorescence of Ca<sup>2+</sup>Migration in Mice With Vibrating Needle
Two-Photon Fluorescence of Ca<sup>2+</sup>Migration in Mice With Vibrating Needle Open
We report an experiment using a vibrating needle to activate calcium ions and waves in mice muscle tissue fibers. In vivo Ca2+ migration in mice was observed along with its muscle pathways using two-photon laser fluorescence.
View article: Advances in La-Based High-k Dielectrics for MOS Applications
Advances in La-Based High-k Dielectrics for MOS Applications Open
This paper reviews the studies on La-based high-k dielectrics for metal-oxide-semiconductor (MOS) applications in recent years. According to the analyses of the physical and chemical characteristics of La2O3, its hygroscopicity and defects…
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View article: Electrochemical characteristics of amorphous silicon carbide film as a lithium-ion battery anode
Electrochemical characteristics of amorphous silicon carbide film as a lithium-ion battery anode Open
The electrochemical reactions of SiC film with Li+ have been investigated by electrochemical characterization and X-ray photoelectron spectroscopy.
View article: High-sensitivity β-Ga_2O_3 solar-blind photodetector on high-temperature pretreated c-plane sapphire substrate
High-sensitivity β-Ga_2O_3 solar-blind photodetector on high-temperature pretreated c-plane sapphire substrate Open
Recently, monoclinic Ga2O3 (beta-Ga2O3) photodetectors (PDs) have been extensively studied for various commercial and military applications due to the merits of intrinsic solar rejection, high gain, and great compactness. In this work, c-p…
View article: Effects of annealing temperature of NbLaO gate dielectric on electrical properties of ZnO thin-film transistor
Effects of annealing temperature of NbLaO gate dielectric on electrical properties of ZnO thin-film transistor Open
A bottom-gate zinc-oxide thin-film transistor (ZnO TFT) with high-k NbLaO as gate dielectric was fabricated on indium tin oxide-coated glass substrate by radio frequency sputtering. The NbLaO gate dielectric was annealed in N2 at different…
View article: An Improved Racetrack Structure for Transporting a Skyrmion
An Improved Racetrack Structure for Transporting a Skyrmion Open
Magnetic skyrmions are promising building blocks for next generation data storage due to their stability, small size and extremely low currents to drive them, which can be used instead of traditional magnetic domain walls to store informat…
View article: High-performance GaAs metal-oxide-semiconductor capacitor by using NbAlON as high-k gate dielectric
High-performance GaAs metal-oxide-semiconductor capacitor by using NbAlON as high-k gate dielectric Open
A GaAs metal-oxide-semiconductor (MOS) capacitor using NbAlON as a gate dielectric with different Nb contents is fabricated. Experimental results show that the k value and crystallization temperature of the AlON dielectric can be improved …
View article: The influence of the edge effect on the skyrmion generation in a magnetic nanotrack
The influence of the edge effect on the skyrmion generation in a magnetic nanotrack Open
Magnetic skyrmions might be used for building next-generation nanomagnetic and spintronic devices, as they have several perspective properties, such as topologically protected stability, nanoscale size, and ultra-low depinning current dens…
View article: Nb-doped Ga 2 O 3 as charge-trapping layer for nonvolatile memory applications
Nb-doped Ga 2 O 3 as charge-trapping layer for nonvolatile memory applications Open
View article: <i>β</i>-Ga2O3 solar-blind deep-ultraviolet photodetector based on a four-terminal structure with or without Zener diodes
<i>β</i>-Ga2O3 solar-blind deep-ultraviolet photodetector based on a four-terminal structure with or without Zener diodes Open
A four-terminal photodetector was fabricated on the (2¯01)-dominant β-Ga2O3 thin film which was deposited in a plasma-assisted molecular beam epitaxy system. The suitability of this film for solar-blind DUV detection was proved by its tran…
View article: Passivation of oxide traps in gallium arsenide (semiconductor) metal-oxide-semiconductor capacitor with high-k dielectric by using fluorine incorporation
Passivation of oxide traps in gallium arsenide (semiconductor) metal-oxide-semiconductor capacitor with high-k dielectric by using fluorine incorporation Open
Gallium arsenide (semiconductor) (GaAs) metal-oxide-semiconductor capacitors with fluorine-incorporated TaHfON as gate dielectric are fabricated by pre- or postdeposition fluorine plasma treatment and their electrical and physical properti…
View article: Interfacial and electrical properties of InGaAs metal-oxide-semiconductor capacitor with TiON/TaON multilayer composite gate dielectric
Interfacial and electrical properties of InGaAs metal-oxide-semiconductor capacitor with TiON/TaON multilayer composite gate dielectric Open
InGaAs metal-oxide-semiconductor (MOS) capacitors with composite gate dielectric consisting of Ti-based oxynitride (TiON)/Ta-based oxynitride (TaON) multilayer are fabricated by RF sputtering. The interfacial and electrical properties of t…