Laura Toselli
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View article: In situ cleaning of InGaAs surfaces prior to low contact resistance metallization
In situ cleaning of InGaAs surfaces prior to low contact resistance metallization Open
View article: Cleaning of InGaAs and InP Layers for Nanoelectronics and Photonics Contact Technology Applications
Cleaning of InGaAs and InP Layers for Nanoelectronics and Photonics Contact Technology Applications Open
InGaAs and InP layers were treated by using Ar and He direct plasmas coupled with wet chemical treatments. InP surfaces are more sensitive to the various treatments than the InGaAs ones. Suitable and efficient treatments have been proposed…
View article: InGaAs surface pretreatment prior to metal solid-state reactions for low resistance contacts
InGaAs surface pretreatment prior to metal solid-state reactions for low resistance contacts Open
International audience
View article: In situ cleaning/passivation of surfaces for contact technology on III-V materials
In situ cleaning/passivation of surfaces for contact technology on III-V materials Open
International audience