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View article: Rapid formation of large-area MoS2 monolayers by a parameter resilient atomic layer deposition approach
Rapid formation of large-area MoS2 monolayers by a parameter resilient atomic layer deposition approach Open
In this work, an atomic layer deposition approach for the synthesis of MoS2 monolayers is presented. Optical properties of the prepared large-area samples were characterized by Raman and photoluminescence (PL) spectroscopies, yielding homo…