Martin Ehrhardt
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View article: Stability of masking materials for pattern transfer of lithographic masks into fused silica by atmospheric pressure plasma jet etching
Stability of masking materials for pattern transfer of lithographic masks into fused silica by atmospheric pressure plasma jet etching Open
Masking of thin films and bulk materials is traditionally applied for the transfer of micron patterns into the functional material according to the requirements of the application. For optical purposes, lithographically produced micron pat…
View article: Transfer of photolithographic patterns by excimer laser ablation of polymers
Transfer of photolithographic patterns by excimer laser ablation of polymers Open
Pattern transfer of lithographically produced patterns is a key technology in microelectronics and other micro- and nanotechnologies. This approach has been perfected continuously to meet the requirements for size and quality, but vacuum p…
View article: Development platform for UV-NIL processes using polymer masters produced by laser ablation and photolithography
Development platform for UV-NIL processes using polymer masters produced by laser ablation and photolithography Open
Ultraviolet nanoimprint lithography (UV-NIL) is a versatile and cost-effective technique for the fabrication of micro- and nanostructures by copying master patterns in a planar or a roll-to-roll process through curing of a liquid UV-sensit…
View article: Transfer of micron pattern with reactive atmospheric plasma jets into fused silica
Transfer of micron pattern with reactive atmospheric plasma jets into fused silica Open
Pattern transfer by plasma etching is a traditional standard technology in microelectronics and other micron technologies. These technologies require vacuum conditions, which limit throughput, size, and low-cost fabrication. Recent develop…
View article: Cleaning of laser-induced periodic surface structures on copper by gentle wet chemical processing
Cleaning of laser-induced periodic surface structures on copper by gentle wet chemical processing Open
•Cleaning of 365 nm LIPSS from debris of with microemulsions has been demonstrated.•Excellent debris and particles removal while maintaining the LIPSS pattern were found.•The cleaning mechanism is dominated of selective dissolution of nano…
View article: Fabrication of Plasmonic Microcubes by Laser Ablation of Au‐Nanoparticles‐Loaded Acrylate
Fabrication of Plasmonic Microcubes by Laser Ablation of Au‐Nanoparticles‐Loaded Acrylate Open
The cover image is based on the Article Fabrication of Plasmonic Microcubes by Laser Ablation of Au-Nanoparticles-Loaded Acrylate by Pierre Lorenz et al., https://doi.org/10.1002/pssa.202300481.
View article: Mechanical Abrasion of Laser‐Machined Highly Hydrophobic Stainless Steel Surface Depending on Surface Topography
Mechanical Abrasion of Laser‐Machined Highly Hydrophobic Stainless Steel Surface Depending on Surface Topography Open
Stainless steel (SST) is an important material for a variety of applications including construction, food, and medical. Highly hydrophobic wetting properties enhance the surface properties of SST to support processes such as self‐cleaning …
View article: Simultaneous atmospheric pressure plasma jet etching and laser irradiation for ultra-precise optical glass processing
Simultaneous atmospheric pressure plasma jet etching and laser irradiation for ultra-precise optical glass processing Open
The use of beam-based technologies to process optical elements with nanoscale precision enables the fabrication of freeform surfaces. In particular, atmospheric pressure plasma jets (APPJs) have desirable properties, e.g., depth precision …
View article: Pulse Duration Dependence of Infrared Laser-Induced Secondary Electron Yield Reduction of Copper Surfaces
Pulse Duration Dependence of Infrared Laser-Induced Secondary Electron Yield Reduction of Copper Surfaces Open
The irradiation of metals with ultrashort laser pulses enables the rapid and cost-effective production of nanostructured surfaces with a wide range of industrial applications. The laser-induced surface roughening modifies the interaction p…
View article: Fabrication of Plasmonic Microcubes by Laser Ablation of Au‐Nanoparticles‐Loaded Acrylate
Fabrication of Plasmonic Microcubes by Laser Ablation of Au‐Nanoparticles‐Loaded Acrylate Open
The fabrication of plasmonic 3D microstructures is still a challenge. In this study, the fabrication of gold‐nanoparticle (Au‐NP)‐filled acrylate‐based micron‐scale cuboids forming plasmonic 3D particles is investigated. UV curable acrylat…
View article: Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses
Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses Open
The use of beam‐based technologies to process optical elements with nanoscale precision enables the fabrication of freeform surfaces. Especially, atmospheric pressure plasma jets (APPJ) have desirable properties such as atmospheric pressur…
View article: Laser Cutting of Polymer Templates for Water-Droplet Induced Self-Folding of Cubes: Hinge Geometry Optimization
Laser Cutting of Polymer Templates for Water-Droplet Induced Self-Folding of Cubes: Hinge Geometry Optimization Open
Droplet-induced self-folding processes enable the easy and cost-effective fabrication of millimeter to submillimeter 3D structures from planar templates.These templates were fabricated by laser cutting of polymer foils that offer a high fl…
View article: Pulse duration dependent laser-induced plasma etching of polyimide using a high repetition rate laser
Pulse duration dependent laser-induced plasma etching of polyimide using a high repetition rate laser Open
Although laser ablation of polymers is well investigated the achievable surface quality of this process is limited due to laser-induced structural and morphological defects, arising surface roughness and redeposition of debris. Because hig…
View article: Self-organized submicron structures in photoresist films by UV-laser irradiation at water-confined conditions
Self-organized submicron structures in photoresist films by UV-laser irradiation at water-confined conditions Open
A new kind of self-organized pattern formation process has been found during laser irradiation of polymer films in water confinement just below the laser ablation threshold, resulting in a randomly oriented pattern with a period of about 4…
View article: Influence of wavelength and accumulated fluence at picosecond laser-induced surface roughening of copper on secondary electron yield
Influence of wavelength and accumulated fluence at picosecond laser-induced surface roughening of copper on secondary electron yield Open
Ultrashort-pulse laser processing of copper is performed in air to reduce the secondary electron yield (SEY). By UV (355 nm), green (532 nm), and IR (1064 nm) laser-light induced surface modification, this study investigates the influence …
View article: Ultrahigh Precision Machining of Polymer Surface using Laser-Induced Reactive Micro-Plasmas
Ultrahigh Precision Machining of Polymer Surface using Laser-Induced Reactive Micro-Plasmas Open
The process requirements for ultra-precise machining of surfaces for optical applications is still challenging for laser ablation-based methods.The LIPE (laser-induced plasma etching) method combines the two complementary techniques of las…
View article: High Pore Density Polyimide Membrane Production by PS Laser Pulses
High Pore Density Polyimide Membrane Production by PS Laser Pulses Open
High pore density membranes exhibit various applications, especially in microfiltration, bioseparation, microbiology and medicine.The laser ablation process allows the fabrication of membranes with high pore density and pore diameter in th…
View article: Secondary electron yield reduction of copper after 355 nm ultrashort pulse laser ablation
Secondary electron yield reduction of copper after 355 nm ultrashort pulse laser ablation Open
Nanostructured surfaces exhibit remarkable chemical, physical and microbiological properties and have therefore various technical and industrial applications. The ultrashort laser pulse irradiation (wavelength λ = 355 nm, pulse duration Δt…
View article: Secondary electron yield engineering of copper surfaces by 532 nm ultrashort laser pulses
Secondary electron yield engineering of copper surfaces by 532 nm ultrashort laser pulses Open
Nanostructured surfaces exhibit outstanding properties and enable manifold industrial applications. In this study the laser surface processing of polycrystalline, flat copper surfaces by 532 nm picosecond laser irradiation for secondary el…
View article: Plasma jet assisted polishing of fused silica freeform optics
Plasma jet assisted polishing of fused silica freeform optics Open
Atmospheric pressure plasma jet machining technology not only provides a flexible and efficient way to generate and correct optical freeform surfaces made of fused silica, it can also be applied as a surface smoothing or polishing techniqu…
View article: Self-cleaning stainless steel surfaces induced by laser processing and chemical engineering
Self-cleaning stainless steel surfaces induced by laser processing and chemical engineering Open
Nanostructured surfaces show a variety of beneficial macroscopic effects. The combination of hierarchic nanostructures with a suitable chemical surface composition allows for the fabrication of surfaces with interesting fluidic properties …
View article: Dry Etching of Germanium with Laser Induced Reactive Micro Plasma
Dry Etching of Germanium with Laser Induced Reactive Micro Plasma Open
High-quality, ultra-precise processing of surfaces is of high importance for high-tech industry and requires a good depth control of processing, a low roughness of the machined surface and as little as possible surface and subsurface damag…
View article: Laser-induced reactive microplasma for etching of fused silica
Laser-induced reactive microplasma for etching of fused silica Open
The ultra-precise machining (UPM) of surfaces with contact-free, beam-based technologies enables the development of flexible and reliable fabrication methods by non-vacuum processes for future application in advanced industrial fields. Las…
View article: Residual Layer Removal of Technical Glass Resulting from Reactive Atmospheric Plasma Jet Etching by Pulsed Laser Irradiation
Residual Layer Removal of Technical Glass Resulting from Reactive Atmospheric Plasma Jet Etching by Pulsed Laser Irradiation Open
Ultrahigh-precision machining of glass is indispensable for optical component fabrication and therefore for applications. In this regard, plasma jet assisted chemical etching technologies enable new fabrication processes for enhanced optic…