Explanipedia

DIFFUSION PROCESSES IN METAL LAYERS OF Mo/Si MULTILAYER X-RAY MIRRORS DURING DEPOSITION Open

Y. P. Pershyn, V.S. Chumak, A. Yu. Devizenko, E. N. Zubarev, V.A. Sevryukova , et al. · 2024

Small-angle reflectometry, X-ray diffractometry and X-ray tensometry (=0.154 nm) were used to study the structure of Mo layers in Mo/Si multilayer X-ray mirrors produced by magnetron sputtering as a function of the Ar pressure in the rang…

Reflective x-ray masks for x-ray lithography Open

V.S. Chumak, Sergey Peredkov, A. Yu. Devizenko, I. А. Kopylets, Y. P. Pershyn · 2024

Materials science Physics

Application of x-ray multilayers as reflective x-ray masks for x-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect x-rays. The use of grazing geometry allows a pattern design on …

EFFECT OF ARGON WORKING GAS PRESSURE ON MECHANICAL STRESSES IN Mo/Si MULTILAYER X-RAY MIRRORS Open

Y. P. Pershyn, V.S. Chumak, A. Yu. Devizenko, E. N. Zubarev, В. В. Кондратенко · 2024

Materials science Physics Engineering

By the method of X-ray tensometry (=0.154 nm), the dependences of residual stresses in Mo/Si multilayer Xray mirrors (MXMs) obtained by direct-current magnetron sputtering were studied as a function of the sputtering Ar pressure in the ra…

STRUCTURE AND PHASE COMPOSITION OF W-Si MULTILAYER X-RAY MIRRORS Open

Materials science Chemistry Biology

X-ray diffractometry in a hard region (l~0.154 nm) was used to study the phase structure, composition and construction of W/Si multilayer X-ray mirrors (MXMs) with thicknesses of tW2.7 nm, and at tW<1.9 nm they are amorphous. Using the sin…

Scandium-silicon Multilayer X-ray Mirrors with CrB2 Barrier LayersScSiCrB Open

Y. P. Pershyn, A. Yu. Devizenko, E. N. Zubarev, В. В. Кондратенко, Dmitriy L. Voronov , et al. · 2018

Materials science Physics

Методами рентгенівської дифракції (0,154 нм), просвічувачої електронної мікроскопії поперечних зрізів і рефлектометрії в області екстремального ультрафіолету (41-51 нм) досліджені бар'єрні властивості шарів CrB2 товщиною 0.3-1.3 нм в багат…

Growth and structure of WC/Si multilayer x-ray mirror Open

Y. P. Pershyn, V.S. Chumak, I.G. Shypkova, V.V. Mamon, A. Yu. Devizenko , et al. · 2018

Materials science Physics Chemistry

WC/Si multilayer X-ray mirrors (MXMs) with nominal layers thicknesses of 0.2…30.3 nm (periods: 0.7…38.9 nm) were deposited by direct current magnetron sputtering and studied by X-ray diffraction and cross-sectional transmission electron mi…

Application of Tungsten as a Barrier Layer in Sc/Si Multilayer X-ray Mirrors Open

Y. P. Pershyn, V.S. Chumak, E. N. Zubarev, A. Yu. Devizenko, В. В. Кондратенко , et al. · 2018

Materials science Physics

Методами рентгеновской дифракции (ƛ = 0,154 нм), просвечивающей электронной микроскопии поперечных срезов и рефлектометрии в мягкой рентгеновской области (ƛ = 25-50 нм) исследованы барьерные свойства слоев вольфрама толщиной 0,1-2,1 нм в м…

Reduction of Interface Mixing in Sc/Si Multilayer X-ray Mirrors Open

Y. P. Pershyn, A. Yu. Devizenko, В. В. Кондратенко, Dmitriy L. Voronov, E. M. Gullikson · 2017

Materials science Physics Mathematics

By methods of X-ray diffraction in both hard (  0.154 nm) and soft (  11.7-50.0 nm) regions an influence of Ar pressure (1.6-2.4 mTorr) on interface mixing in Sc/Si multilayer X-ray mirrors (MXMs) during deposition is studied. Signific…

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