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View article: Electrical and magnetic properties of atomic layer deposited cobalt oxide and iron oxide stacks
Electrical and magnetic properties of atomic layer deposited cobalt oxide and iron oxide stacks Open
We observed that thin films exhibit exceptional magnetic coercivity and saturation magnetization. These results demonstrate a route to engineer ferrite-based thin films with superior magnetic performance at nanoscale thicknesses.
View article: Forming and Resistive Switching of HfO₂-Based RRAM Devices at Cryogenic Temperature
Forming and Resistive Switching of HfO₂-Based RRAM Devices at Cryogenic Temperature Open
Producción Científica
View article: On the Asymmetry of Resistive Switching Transitions
On the Asymmetry of Resistive Switching Transitions Open
In this study, the resistive switching phenomena in TiN/Ti/HfO2/Ti metal–insulator–metal stacks is investigated, mainly focusing on the analysis of set and reset transitions. The electrical measurements in a wide temperature range reveal t…
View article: Thermal dependence of the current in TiN/Ti/HfO2/W memristors at different intermediate conduction states
Thermal dependence of the current in TiN/Ti/HfO2/W memristors at different intermediate conduction states Open
We acknowledge grants PID2022-139586NB-C42, PID2022-139586NB-C43, PID2022-139586NB-C44 funded by MICIU/AEI/10.13039/501100011033 and FEDER, UE. IMB authors thank the CSIC funding through project 20225AT012 and the Generalitat de Catalunya-…
View article: Reset Transition in Hfo2-Based Memristors Using a Constant Power Signal
Reset Transition in Hfo2-Based Memristors Using a Constant Power Signal Open
View article: Impact of the temperature on the conductive filament morphology in HfO2-based RRAM
Impact of the temperature on the conductive filament morphology in HfO2-based RRAM Open
View article: A thorough investigation of the switching dynamics of TiN/Ti/10 nm-HfO2/W resistive memories
A thorough investigation of the switching dynamics of TiN/Ti/10 nm-HfO2/W resistive memories Open
The switching dynamics of TiN/Ti/HfO2/W-based resistive memories is investigated. The analysis consisted in
\nthe systematic application of voltage sweeps with different ramp rates and temperatures. The obtained results
\ngive clear insigh…
View article: Thermal Dependence of the Resistance of TiN/Ti/HfO<sub>2</sub>/Pt Memristors
Thermal Dependence of the Resistance of TiN/Ti/HfO<sub>2</sub>/Pt Memristors Open
Producción Científica
View article: Effects of the voltage ramp rate on the conduction characteristics of HfO<sub>2</sub>-based resistive switching devices
Effects of the voltage ramp rate on the conduction characteristics of HfO<sub>2</sub>-based resistive switching devices Open
Memristive devices have shown a great potential for non-volatile memory circuits and neuromorphic computing. For both applications it is essential to know the physical mechanisms behind resistive switching; in particular, the time response…
View article: Variability and power enhancement of current controlled resistive switching devices
Variability and power enhancement of current controlled resistive switching devices Open
characterized using both current and voltage sweeps, with the device resistance and its cycle-to-cycle variability
\nbeing analysed in each case. Experimental measurements indicate a clear improvement on resistance states
\nstability when …
View article: Thermal effects on TiN/Ti/HfO2/Pt memristors charge conduction
Thermal effects on TiN/Ti/HfO2/Pt memristors charge conduction Open
TiN/Ti/HfO2/Pt resistive switching devices have been fabricated, measured, and modeled. After programming the devices in the low resistance state, the current–voltage characteristic below the reset switching voltage was measured at differe…
View article: Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition
Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition Open
HfO2 and Fe2O3 thin films and laminated stacks were grown by atomic layer deposition at 350 °C from hafnium tetrachloride, ferrocene, and ozone. Nonlinear, saturating, and hysteretic magnetization was recorded in the films. Magnetization w…
View article: An experimental and simulation study of the role of thermal effects on variability in TiN/Ti/HfO2/W resistive switching nonlinear devices
An experimental and simulation study of the role of thermal effects on variability in TiN/Ti/HfO2/W resistive switching nonlinear devices Open
An in-depth simulation and experimental study has been performed to analyze thermal effects on the variability of resistive memories. Kinetic Monte Carlo (kMC) simulations, that reproduce well the nonlinearity and stochasticity of resistiv…
View article: Empirical Characterization of ReRAM Devices Using Memory Maps and a Dynamic Route Map
Empirical Characterization of ReRAM Devices Using Memory Maps and a Dynamic Route Map Open
Memristors were proposed in the early 1970s by Leon Chua as a new electrical element linking charge to flux. Since that first introduction, these devices have positioned themselves to be considered as possible fundamental ones for the gene…
View article: Study of TiN/Ti/HfO2/W resistive switching devices: characterization and modeling of the set and reset transitions using an external capacitor discharge
Study of TiN/Ti/HfO2/W resistive switching devices: characterization and modeling of the set and reset transitions using an external capacitor discharge Open
Producción Científica
View article: Empirical Characterization of ReRAM devices using Memory Maps and Dynamic Route Map
Empirical Characterization of ReRAM devices using Memory Maps and Dynamic Route Map Open
Memristors were proposed in the early ’70s of the XXth century by Leon Chua as a new electrical element linking the charge and the flux. Since that first introduction, these devices have positioned themselves to be considered as possibly f…
View article: Effect of Dielectric Thickness on Resistive Switching Polarity in TiN/Ti/HfO2/Pt Stacks
Effect of Dielectric Thickness on Resistive Switching Polarity in TiN/Ti/HfO2/Pt Stacks Open
In recent years, several materials and metal-insulator-metal devices are being intensively studied as prospective non-volatile memories due to their resistive switching effect. In this work, thickness-dependent resistive switching polarity…
View article: Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition
Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition Open
Crystal structure and electrical properties of hafnium-praseodymium oxide thin films grown by atomic layer deposition on ruthenium substrate electrodes were characterized and compared with those of undoped HfO2 films. The HfO2 reference fi…
View article: Influences of the Temperature on the Electrical Properties of HfO2-Based Resistive Switching Devices
Influences of the Temperature on the Electrical Properties of HfO2-Based Resistive Switching Devices Open
In the attempt to understand the behavior of HfO2-based resistive switching devices at low temperatures, TiN/Ti/HfO2/W metal–insulator–metal devices were fabricated; the atomic layer deposition technique was used to grow the high-k layer. …
View article: Standards for the Characterization of Endurance in Resistive Switching Devices
Standards for the Characterization of Endurance in Resistive Switching Devices Open
Resistive switching (RS) devices are emerging electronic components that could have applications in multiple types of integrated circuits, including electronic memories, true random number generators, radiofrequency switches, neuromorphic …
View article: Performance Assessment of Amorphous HfO <sub>2</sub> -Based RRAM Devices for Neuromorphic Applications
Performance Assessment of Amorphous HfO <sub>2</sub> -Based RRAM Devices for Neuromorphic Applications Open
The use of thin layers of amorphous hafnium oxide has been shown to be suitable for the manufacture of Resistive Random-Access memories (RRAM). These memories are of great interest because of their simple structure and non-volatile charact…
View article: Analysis of the performance of Nb2O5-doped SiO2-based MIM devices for memory and neural computation applications
Analysis of the performance of Nb2O5-doped SiO2-based MIM devices for memory and neural computation applications Open
View article: Fabrication, characterization and modeling of TiN/Ti/HfO<sub>2</sub>/W memristors: programming based on an external capacitor discharge
Fabrication, characterization and modeling of TiN/Ti/HfO<sub>2</sub>/W memristors: programming based on an external capacitor discharge Open
Hafnium oxide based memristors were fabricated and multilevel programming driven by a capacitor discharge current through the device was performed. Furthermore, the dynamic memdiode model was used for modeling and analyzing the experimenta…
View article: Semiempirical Memdiode Model for Resistive Switching Devices in Dynamic Regimes
Semiempirical Memdiode Model for Resistive Switching Devices in Dynamic Regimes Open
Producción Científica
View article: Effective control of filament efficiency by means of spacer HfAlOx layers and growth temperature in HfO2 based ReRAM devices
Effective control of filament efficiency by means of spacer HfAlOx layers and growth temperature in HfO2 based ReRAM devices Open
View article: Study of the set and reset transitions in HfO2-based ReRAM devices using a capacitor discharge
Study of the set and reset transitions in HfO2-based ReRAM devices using a capacitor discharge Open
Producción Científica
View article: Hafnium Oxide/Graphene/Hafnium Oxide-Stacked Nanostructures as Resistive Switching Media
Hafnium Oxide/Graphene/Hafnium Oxide-Stacked Nanostructures as Resistive Switching Media Open
Producción Científica
View article: Thermoelectrical Characterization of Piezoelectric Diaphragms: Towards a Better Understanding of Ferroelectrics for Future Memory Applications
Thermoelectrical Characterization of Piezoelectric Diaphragms: Towards a Better Understanding of Ferroelectrics for Future Memory Applications Open
This work deals with the thermoelectric characterization of commercial lead zirconate titanate (PZT) based piezoelectric diaphragms. An in-depth analysis of the piezo- and ferroelectric behavior of the samples was carried out by measuring …
View article: Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone
Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone Open
Atomic layer deposition method was used to grow thin films consisting of ZrO 2 and MnO x layers. Magnetic and electric properties were studied of films deposited at 300 °C. Some deposition characteristics of the manganese(III)acetylacetona…
View article: Performance Assessment of Amorphous HfO<sub>2</sub>-Based RRAM Devices for Neuromorphic Applications
Performance Assessment of Amorphous HfO<sub>2</sub>-Based RRAM Devices for Neuromorphic Applications Open
The use of thin layers of amorphous hafnium oxide has been shown to be suitable for the manufacture of Resistive Random-Access memories (RRAM). These memories are of great interest because of their simple structure and non-volatile charact…