Tomosumi Kamimura
YOU?
Author Swipe
View article: Dispersion Stability of Organic Nanoparticles Prepared by Pulsed Laser Induced Fragmentation in Protein Solution
Dispersion Stability of Organic Nanoparticles Prepared by Pulsed Laser Induced Fragmentation in Protein Solution Open
The Pulsed Laser Induced Fragmentation (PLIF) technique allows production of nanoparticle colloids by simply exposing water-suspended microcrystals of organic compounds to laser pulses without any additives or organic solvents. This techni…
View article: Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment Open
Laser induced resist stripping technique in water is interesting for both fast and environment-friendly resist removal. However, small pieces of the deposited resist still remain or reattach on the silicon (Si) wafer after laser irradiatio…
View article: Bulk laser-induced damage resistance of SrB <sub>4</sub> O <sub>7</sub> single crystals under 266 nm DUV laser irradiation
Bulk laser-induced damage resistance of SrB <sub>4</sub> O <sub>7</sub> single crystals under 266 nm DUV laser irradiation Open
The bulk laser-induced damage threshold (LIDT) of a strontium tetraborate (SrB 4 O 7 , SBO) single crystal has been measured for the first time. Single-shot and multi-shot tests are carried out using a 266 nm deep ultraviolet (DUV) laser. …
View article: High surface laser-induced damage threshold of SrB<sub>4</sub>O<sub>7</sub> single crystals under 266-nm (DUV) laser irradiation
High surface laser-induced damage threshold of SrB<sub>4</sub>O<sub>7</sub> single crystals under 266-nm (DUV) laser irradiation Open
Under 266-nm (deep ultraviolet, DUV) laser irradiation, an SrB 4 O 7 (SBO) single crystal has been found to exhibit a surface laser-induced damage threshold (LIDT) of ∼ 16.4 J/cm 2 , which is higher than those of a synthetic silica glass (…
View article: A Comparison of Removal Phenomena in Photoresist Materials Using Laser Irradiation
A Comparison of Removal Phenomena in Photoresist Materials Using Laser Irradiation Open
Resist removal phenomena using laser irradiation were compared in the novolak resist and the PVP. Thresholds for stripping from the Si wafer and damaged at the Si wafer were evaluated for the laser irradiating condition in the normal atmos…
View article: Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation
Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation Open
Resist stripping phenomenon with laser irradiation was observed by using a time-resolved analysis. The time change of the resist stripping phenomenon by a probe laser irradiation was observed from the viewpoint of the intensity change of t…
View article: Composite Laser Ceramics by Advanced Bonding Technology
Composite Laser Ceramics by Advanced Bonding Technology Open
Composites obtained by bonding materials with the same crystal structure and different chemical compositions can create new functions that do not exist in conventional concepts. We have succeeded in bonding polycrystalline YAG and Nd:YAG c…
View article: Analysis of Resist Removal Phenomenon Using Laser Irradiation
Analysis of Resist Removal Phenomenon Using Laser Irradiation Open
Resist removal phenomenon with laser irradiation was analyzed by using a finite element (FE) method.Laser irradiation in the water can improve the resist removal effect as compared with that of normal atmosphere irradiation.A two-dimension…
View article: Decomposition Process of PMMA-based Polymer Using Atomic Hydrogen Generated by a Tungsten Hot-Wire Catalyst
Decomposition Process of PMMA-based Polymer Using Atomic Hydrogen Generated by a Tungsten Hot-Wire Catalyst Open
We investigated the formation of microstructure on the surface of Poly(methyl methacrylate) - based polymer (PMMA - based polymer), which is a polymer for the ArF photoresist, in decomposition process by using atomic hydrogen generated by …
View article: Removal Technology of Poly-Vinyl Phenol Using Laser Irradiation
Removal Technology of Poly-Vinyl Phenol Using Laser Irradiation Open
Removal by using laser irradiation was investigated in Poly-Vinyl Phenol (PVP). The laser irradiation in the water can improve the PVP stripping effect as compared with that of normal atmosphere irradiation. The surface laser damage thresh…
View article: Effect of Temperature on Degradation of Polymers for Photoresist Using Ozone Microbubbles
Effect of Temperature on Degradation of Polymers for Photoresist Using Ozone Microbubbles Open
We studied about an effect of temperature on degradation of polymers for photoresist using ozone microbubbles as an environmentally friendly cleaning technique. The dissolved ozone concentration of ozone microbubbles was decreased with the…
View article: Dependence on Resist Stripping Efficiency to Irradiating Beam Size in Advanced Laser Resist Stripping Method
Dependence on Resist Stripping Efficiency to Irradiating Beam Size in Advanced Laser Resist Stripping Method Open
Dependence on the stripping efficiency to irradiating beam size was investigated in an advanced laser resist stripping method. The beam size on the resist surface was changed from 0.3 mm to 3.0 mm. An intensity shape of the laser beam was …