Ying-Lang Wang
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View article: In-Situ Rs and Improvement in Thermal Stability of Nickel Silicides Using Different Interlayer Films
In-Situ Rs and Improvement in Thermal Stability of Nickel Silicides Using Different Interlayer Films Open
Different interlayer films (Mo, Ru, Ta, Ti and Zn) were proposed to reduce sheet resistance (Rs) and improve thermal stability for nickel (Ni) silicide formation. It was found that the Zn and Mo interlayers reduced nickel silicide Rs much …