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View article: An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography
An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography Open
This paper proposes an improved algorithm based on the phase extraction of the Moiré fringe for wafer-mask alignment in nanoimprint lithography. The algorithm combines the strengths of the two-dimensional fast Fourier transform (2D-FFT) an…