Zehao Lin
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View article: Chloride Modulation Doping in Dual-Channel InGaZnO Synaptic Transistors: Location-Selective Strategy for Synaptic Plasticity Enhancement
Chloride Modulation Doping in Dual-Channel InGaZnO Synaptic Transistors: Location-Selective Strategy for Synaptic Plasticity Enhancement Open
View article: Study on the Preparation of Diamond Film Substrates on AlN Ceramic and Their Performance in LED Packaging
Study on the Preparation of Diamond Film Substrates on AlN Ceramic and Their Performance in LED Packaging Open
Aluminum nitride (AlN) ceramic materials have relatively low thermal conductivity and poor heat dissipation performance, and are increasingly unsuitable for high-power LED packaging. In this study, diamond films were deposited on AlN ceram…
View article: Ultralow Voltage Operation of p‐ and n‐FETs Enabled by Self‐Formed Gate Dielectric and Metal Contacts on 2D Tellurium
Ultralow Voltage Operation of p‐ and n‐FETs Enabled by Self‐Formed Gate Dielectric and Metal Contacts on 2D Tellurium Open
The ongoing demand for more energy‐efficient, high‐performance electronics is driving the exploration of innovative materials and device architectures, where interfaces play a crucial role due to the continuous downscaling of device dimens…
View article: Knowledge Atlas and emerging trends on the impact of mindfulness on tumors: a bibliometric analysis
Knowledge Atlas and emerging trends on the impact of mindfulness on tumors: a bibliometric analysis Open
View article: Ultralow Voltage Operation of p- and n-FETs Enabled by Self-Formed Gate Dielectric and Metal Contacts on 2D Tellurium
Ultralow Voltage Operation of p- and n-FETs Enabled by Self-Formed Gate Dielectric and Metal Contacts on 2D Tellurium Open
The ongoing demand for more energy-efficient, high-performance electronics is driving the exploration of innovative materials and device architectures, where interfaces play a crucial role due to the continuous downscaling of device dimens…
View article: Experimental Investigation of Variations in Polycrystalline Hf0.5Zr0.5O2 (HZO)-based MFIM
Experimental Investigation of Variations in Polycrystalline Hf0.5Zr0.5O2 (HZO)-based MFIM Open
Device-to-device variations in ferroelectric (FE) hafnium oxide (HfO2)-based devices pose a crucial challenge that limits the otherwise promising capabilities of this technology. Although previous simulation-based studies have identified p…
View article: Review—Extremely Thin Amorphous Indium Oxide Transistors
Review—Extremely Thin Amorphous Indium Oxide Transistors Open
Amorphous oxide semiconductor transistors have been a mature technology in display panels for upward of a decade, and have recently been considered as promising back‐end‐of‐line compatible channel materials for monolithic 3D applications. …
View article: Self-Assembled Au Nanoelectrodes: Enabling Low-Threshold-Voltage HfO<sub>2</sub>-Based Artificial Neurons
Self-Assembled Au Nanoelectrodes: Enabling Low-Threshold-Voltage HfO<sub>2</sub>-Based Artificial Neurons Open
Filamentary-type resistive switching devices, such as conductive bridge random-access memory and valence change memory, have diverse applications in memory and neuromorphic computing. However, the randomness in filament formation poses cha…
View article: Calibrating the Cepheid Period--Wesenheit Relation in the Gaia Bands using Galactic Open Cluster Cepheids
Calibrating the Cepheid Period--Wesenheit Relation in the Gaia Bands using Galactic Open Cluster Cepheids Open
Establishing the period--Wesenheit relation requires independent and accurate distance measurements of classical Cepheids (DCEPs). The precise distance provided by an associated open cluster independently calibrates the period--Wesenheit r…
View article: Characterization of Interface and Bulk Traps in Ultrathin Atomic Layer-Deposited Oxide Semiconductor MOS Capacitors With HfO2/In2O3 Gate Stack by C-V and Conductance Method
Characterization of Interface and Bulk Traps in Ultrathin Atomic Layer-Deposited Oxide Semiconductor MOS Capacitors With HfO2/In2O3 Gate Stack by C-V and Conductance Method Open
Oxide semiconductors have attracted revived interest for complementary metal–oxide–semiconductor (CMOS) back-end-of-line (BEOL) compatible devices for monolithic 3-dimensional (3D) integration. To obtain a high-quality oxide/semiconductor …
View article: A Gate-All-Around Single-Channel In2O3 Nanoribbon FET with Near 20 mA/μm Drain Current
A Gate-All-Around Single-Channel In2O3 Nanoribbon FET with Near 20 mA/μm Drain Current Open
In this work, we demonstrate atomic-layer-deposited (ALD) single-channel indium oxide (In2O3) gate-all-around (GAA) nanoribbon FETs in a back-end-of-line (BEOL) compatible process. A maximum on-state current (ION) of 19.3 mA/μm (near 20 mA…
View article: A Nanometer-Thick Oxide Semiconductor Transistor with Ultra-High Drain Current
A Nanometer-Thick Oxide Semiconductor Transistor with Ultra-High Drain Current Open
High drive current is a critical performance parameter in semiconductor devices for high-speed, low-power logic applications or high-efficiency, high-power, high-speed radio frequency (RF) analog applications. In this work, we demonstrate …
View article: Scaled indium oxide transistors fabricated using atomic layer deposition
Scaled indium oxide transistors fabricated using atomic layer deposition Open
View article: Why In<sub>2</sub>O<sub>3</sub> Can Make 0.7 nm Atomic Layer Thin Transistors
Why In<sub>2</sub>O<sub>3</sub> Can Make 0.7 nm Atomic Layer Thin Transistors Open
In this work, we demonstrate enhancement-mode field-effect transistors by an atomic-layer-deposited (ALD) amorphous In2O3 channel with thickness down to 0.7 nm. Thickness is found to be critical on the materials and e…
View article: The Impact of Channel Semiconductor on the Memory Characteristics of Ferroelectric Field-Effect Transistors
The Impact of Channel Semiconductor on the Memory Characteristics of Ferroelectric Field-Effect Transistors Open
In this work, channel semiconductor is identified and demonstrated to have significant impact on the memory characteristics of ferroelectric field-effect transistors (Fe-FETs). It is understood that, to achieve high electron density at on-…
View article: Signature of quantum Griffiths singularity state in a layered quasi-one-dimensional superconductor
Signature of quantum Griffiths singularity state in a layered quasi-one-dimensional superconductor Open
View article: Chiral Landau levels in Weyl semimetal NbAs with multiple topological carriers
Chiral Landau levels in Weyl semimetal NbAs with multiple topological carriers Open
Recently, Weyl semimetals have been experimentally discovered in both inversion-symmetry-breaking and time-reversal-symmetry-breaking crystals. The non-trivial topology in Weyl semimetals can manifest itself with exotic phenomena, which ha…