Zuwei Liu
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Profile simulation model for sub-50 nm cryogenic etching of silicon using SF6/O2 inductively coupled plasma Open
Cryogenic etching of silicon is a route to high aspect ratio silicon features with high mask selectivity and smooth sidewalls. These benefits have been realized even down to 10 nm half-pitch features. In this work, we develop a semi-empiri…
Electrical, thermal, catalytic and magnetic properties of nano-structured materials and their applications Open
Nanotechnology is a subject that studies the fabrication, properties, and applications of materials on the nanometer-scale. Top-down and bottom-up approaches are commonly used in nano-structure fabrication. The top-down approach is used to…
Formation of nanoscale structures by inductively coupled plasma etching Open
This paper will review the top down technique of ICP etching for the formation of nanometer scale structures. The increased difficulties of nanoscale etching will be described. However it will be shown and discussed that inductively couple…
Pronounced electron-phonon interactions in ultraclean suspended carbon nanotubes Open
We report pronounced electron-phonon interactions in suspended, nearly defect-free metallic carbon nanotubes, observed through a Kohn anomaly (KA) of greater strength than theoretically predicted. This KA is accompanied by a gate-induced m…
Extreme Nano Etching Open
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(Invited) Anomalous Current-Voltage Characteristics and Non-Adiabatic/Adiabatic Phase Transitions in Ultra-Clean Suspended Carbon Nanotubes Open
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Plasmon Resonant Enhancement of Photocatalytic Solar Fuel Production Open
not Available.